US5998250A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Compound electrode stack capacitor
Assignee: GlobalFoundries Inc
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Filing: 1998-04-17
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Granted: 1999-12-07
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Expires: 2018-04-17
Abstract
Abstract This invention is directed to a semiconductor memory device including a storage element comprising a ferroelectric material or a capacitor dielectric material between a top (plate) electrode and a bottom (stack) electrode. In particular, the invention pertains to the design and fabrication of the stack electrode, which is described as compound because it is comprised of two or more materials which are either patterned separately (with at least one material being deposited and patterned prior to the deposition of the others), or arranged so that each of the component materials significantly contributes to the area over which the ferroelectric or capacitor dielectric is initially deposited. These compound stack electrodes may offer ease in processing, more economical use of noble metal materials, and potentially increased mechanical stability (e.g., resistance to hillocking) relative to solid, single-material electrodes of the same dimensions.
Inventors
- 👤 Panayotis Constantinou Andricacos
- 👤 David Edward Kotecki
- 👤 Katherine Lynn Saenger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:27
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/60; H10D1/68; H10D1/692; H10D1/711; H10D1/696; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/03; H10B12/033; H10B12/0335; H10B53/00; H10D1/01; H10D1/041; H10D1/042; H10D1/682; H10D1/716; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/032; H10W20/033; H10W20/037; H10W20/046
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
138 words
A method of fabricating a compound stack electrode structure comprising the steps of: a) blanket depositing a layered stack onto a substrate comprising a layer of first dielectric material having a conductive plug formed therethrough, said layered stack comprising a plurality of horizontal layers, the bottom layer of said layered stack being conductive, the remaining layers of said layered stack being conductive or nonconductive, b) anisotropically etching all but the bottom layer of said layered stack to form a substantially vertical-walled patterned infrastructure of the compound stack electrode structure, said infrastructure substantially residing directly above and in electrical contact with the conductive plug, and c) blanket sputter etching for removing the exposed bottom layer of the electrode stack while simultaneously forming a conductive sidewall spacer on surrounding sides of said patterned infrastructure from redeposits of the sputtered material.
Claim 2
Independent Claim
138 words
A method of fabricating a compound stack electrode structure comprising the steps of: a) blanket depositing a layered stack onto a substrate comprising a layer of first dielectric material having a conductive plug formed therethrough, said layered stack comprising a plurality of horizontal layers, the bottom layer of said layered stack being conductive, the remaining layers of said layered stack being conductive or nonconductive, b) anisotropically etching all but the bottom layer of said layered stack to form a substantially vertical-walled patterned infrastructure of the compound stack electrode structure, said infrastructure substantially residing directly above and in electrical contact with the conductive plug, and c) blanket sputter etching for removing the exposed bottom layer of the electrode stack while simultaneously forming a conductive sidewall spacer on surrounding sides of said patterned infrastructure from redeposits of the sputtered material.
Claim 3
Dependent Claim
41 words
The method of claim 1 further including the steps of: blanket depositing a layer of a second dielectric material over the electrode structure; and blanket depositing a layer of conductive material on said second dielectric material to form a top electrode.
Claim 4
Dependent Claim
45 words
The method of claim 1 further including the steps of: depositing a layer of a second dielectric material over said conductive sidewall spacer; and depositing a layer of conductive material on said second dielectric material to form a top electrode isolated from said stack electrode.
Claim 5
Independent Claim
128 words
A method of fabricating a self-aligned compound stack electrode structure comprising the steps of: a) filling a via hole embedded in a dielectric with a plug material and layers of a stack electrode infrastructure, each layer preferably conformally deposited to fill remaining via volume, polished back by chemical mechanical polishing to make a fill level with the top of the via hole, and then controllably etched back to leave room in the via hole for subsequent layer, b) recessing the dielectric to expose the stack electrode infrastructure, c) blanket depositing a thin, conformal layer of conductive material over the recessed dielectric and patterned stack electrode infrastructure, d) anisotropically etching the conformal layer of conductive material to form conductive sidewall spacers, and e) optionally removing any exposed filler material.
Claim 6
Independent Claim
128 words
A method of fabricating a self-aligned compound stack electrode structure comprising the steps of: a) filling a via hole embedded in a dielectric with a plug material and layers of a stack electrode infrastructure, each layer preferably conformally deposited to fill remaining via volume, polished back by chemical mechanical polishing to make a fill level with the top of the via hole, and then controllably etched back to leave room in the via hole for subsequent layer, b) recessing the dielectric to expose the stack electrode infrastructure, c) blanket depositing a thin, conformal layer of conductive material over the recessed dielectric and patterned stack electrode infrastructure, d) anisotropically etching the conformal layer of conductive material to form conductive sidewall spacers, and e) optionally removing any exposed filler material.
Claim 7
Dependent Claim
41 words
The method of claim 4 further including the steps of: blanket depositing a layer of a second dielectric material over the electrode structure; and blanket depositing a layer of conductive material on said second dielectric material to form a top electrode.
Claim 8
Dependent Claim
45 words
The method of claim 4 further including the steps of: depositing a layer of a second dielectric material over said conductive sidewall spacer; and depositing at layer of conductive material on said second dielectric material to form a top electrode isolated from said stack electrode.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-06 | 2003-06-07 | 2003-12-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-06 | 2007-06-07 | 2007-12-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-06 | 2011-06-07 | 2011-12-07 | $7700.00 | Window Closed / Lapsed |