Gridless ion source for the vacuum processing of materials

Claim 2

A gridless ion source for the vacuum processing of materials comprising: (a) a housing; (b) at least one anode discharge region within said housing for the formation and acceleration of a plasma beam, said anode discharge region having an opening at a first end adjacent the exterior of said housing and at least one anode at a second end having at least one gap therein, said anode being electrically insulated from said housing in such a manner to prohibit the formation of plasma migrating into the interior of said housing behind said anode; (c) cooling means for thermally cooling said anode other than by radiative thermal emission; (d) at least one self-sustaining cathode; (e) power supply means connected to said anode for supplying a voltage between said anode and said cathode for the breakdown of working gases to form a gaseous discharge and to drive an anode discharge current from said anode through said anode discharge region to said cathode; (f) injection means for introducing the working gases through the gap in said anode and into said anode discharge region; and (g) electromagnetic means mounted in said housing for establishing and for at least partially driving a magnetic field within said anode discharge region.

Claim 3

An ion source as defined in claim 1 wherein said anode discharge region and the magnetic field are so disposed to allow the formation of a closed Hall-effect drift current path driven by means of a Hall-effect force within said anode discharge region.

Claim 4

An ion source as defined in claim 2 wherein the anode discharge current flowing between said anode and said cathode at least partially drives said electromagnetic means.

Claim 5

An ion source as defined in claim 1 including alternating current circuit means for periodically reversing the direction of the lines of flux of the magnetic field of said electromagnetic means.

Claim 6

An ion source as defined in claim 2 wherein the direction of the lines of flux of the magnetic field established by said electromagnetic means are substantially parallel to the surface of said anode at the second end of said anode discharge region.

Claim 7

An ion source as defined in claim 2 wherein the direction of the lines of flux of the magnetic field established by said electromagnetic means diverge in a direction substantially the same as that of the plasma beam exiting said anode discharge region.

Claim 8

An ion source as defined in claim 2 wherein said discharge region and the gap in said anode is substantially circular and said anode discharge region forms a plasma beam that is directed substantially axially outward with respect to the opening of said anode discharge region.

Claim 9

An ion source as defined in claim 2 wherein said discharge region and the gap in said anode is substantially rectangular and said anode discharge region forms a plasma beam that is directed substantially axially outward with respect to the opening of said anode discharge region.

Claim 10

An ion source as defined in claim 2 wherein said discharge region and the gap in said anode is substantially circular or rectangular and said anode discharge region forms a plasma beam that is directed substantially radially outward with respect to the opening of said anode discharge region.

Claim 11

An ion source as defined in claim 2 wherein said cathode is disposed axi-symmetrically with respect to said anode discharge region.

Claim 12

An ion source as defined in claim 2 wherein said cooling means comprises an injector means for directly contacting said anode with a cooling fluid.

Claim 13

An ion source as defined in claim 2 wherein said injection means having holes or gaps for substantially uniformly distributing the working gases into said anode discharge region and for substantially uniformly distributing the resulting anode discharge current adjacent to the gap.

Claim 14

An ion source as defined in claim 2 wherein said electromagnetic means comprises an electromagnetic combined with a material selected from the group consisting of permanent magnets, ferromagnetics, and magnets having a permeability greater than unity are combined for establishing the magnetic field and shaping the direction and strength of the magnetic field within said anode discharge region.

Claim 15

An ion source as defined in claim 2 for depositing materials onto substrates wherein the dimensions of the gap within said anode being at least greater than the characteristic Debye length of the local plasma formed near the gap in said anode and the shape of the gap being configured so as to substantially restrict line-of-sight deposition of coating onto said anode within said gap such that said anode discharge current is substantially maintained at said anode within the gap near a localized region of the working gases passing into said anode discharge region.

Claim 16

An ion source as defined in claim 14 wherein a distributor means is included in said housing for introducing deposition gases directly into the plasma beam and separately from that of said injection means for introducing working gases through the gap.

Claim 17

An ion source as defined in claim 15 wherein said distributor means comprises at least one tube having a nozzle at one end for directing the deposition gases into said anode discharge region.

Claim 18

An ion source as defined in claim 15 wherein said distributor means comprises at least one distributor ring for directing the deposition gas into said anode discharge region.

Claim 19

An ion source as defined in claim 15 wherein said distributor means comprises at least one tube having a nozzle at one end for directing the deposition gases outside said anode discharge region.

Claim 20

An ion source as defined in claim 15 wherein said distributor means comprises at least one distributor ring for directing the deposition gases outside said anode discharge region.

Claim 21

An ion source as defined in claim 15 wherein the deposition gases are selected from the group consisting of a hydrocarbon, siloxane, silazane, silane and mixtures thereof.

Claim 22

An ion source as defined in claim 2 is combined with at least an additional ion source to form an array of ion sources to process large area workpieces.

Claim 23

An ion source as defined in claim 2 is combined with at least an additional ion source to process at least two sides of a single workpiece.

Claim 24

An ion source as defined in claim 2 wherein at least two anode discharge regions are disposed within at least one housing and wherein the anode discharge current from said anode discharge regions share a common self-sustaining cathode.

Claim 25

An ion source as defined in claim 2 wherein said power supply means supplies a voltage selected from the group consisting of DC, AC, pulsed, RF voltage wave forms and combinations thereof.

Claim 26

An ion source as defined in claim 2 wherein said housing comprises metal walls and said anode is electrically insulated from said metal housing with a high temperature electrical insulator selected from the group consisting of alumina, aluminum nitride, quartz, boron nitride, glass-bonded mica, zirconia and mixtures thereof.

Claim 27

An ion source as defined in claim 3 wherein said electromagnetic means is connected in series with the anode discharge current and in the discharge current path between said anode and a positive lead of said power supply means.

Claim 28

An ion source as defined in claim 3 wherein said electromagnetic means is connected in series with the anode discharge current and in the discharge current path between said self-sustaining cathode and a negative lead of said power supply means.

Claim 29

An ion source as defined in claim 5 wherein the anode discharge current is periodically reversed through said electromagnetic means to periodically reverse the direction of the magnetic flux by a current switching circuit means.

Claim 30

An ion source as defined in claim 6 wherein the anode discharge current is periodically reversed through said electromagnetic means to periodically reverse the direction of the magnetic flux by a current switching circuit means.

Claim 31

An ion source as defined in claim 5 wherein the anode discharge current is periodically reversed through said electromagnetic means to periodically reverse the direction of the magnetic flux and to at least partially drive said electromagnetic means.

Claim 32

An ion source defined in claim 5 wherein said electromagnetic means is driven by a periodically reversing or alternating current supply means.

Claim 33

An ion source as defined in claim 6 wherein the anode discharge current is periodically reversed through said electromagnetic means to periodically reverse the direction of the magnetic flux and to at least partial drive said electromagnetic means.

Claim 34

An ion source defined in claim 6 wherein said electromagnetic means is driven by a periodically reversing or alternating current supply means.

Claim 35

A gridless ion source for the vacuum processing of materials comprising: (a) a housing; (b) at least one anode discharge region within said housing for the formation and acceleration of a plasma beam, said anode discharge region having an opening at a first end adjacent the exterior of said housing and at least one anode at a second end at least one gap therein, said anode being electrically insulated from said housing in such a manner to prohibit the formation of plasma migrating into the interior of said housing behind said anode; (c) cooling means for thermally cooling said anode other than by radiative thermal emission; (d) at least one self-sustaining cathode; (e) power supply means connected to said anode for supplying a voltage between said anode and said cathode for the breakdown of working gases to form a gaseous discharge and to drive an anode discharge current from said anode through said anode discharge region to said cathode; (f) injection means for introducing the working gases through the gap in said anode and into said anode discharge region; and (g) electromagnetic means mounted in said housing for establishing and for at least partially driving a magnetic field within said anode discharge region, wherein the direction of flux of said magnetic field is periodically reversed and wherein said anode discharge region and the magnetic field are so disposed to allow the formation of a non-closed Hall-effect electron drift current path driven by means of a Hall-effect force within said anode discharge region.

Claim 36

A gridless ion source for the vacuum processing of materials comprising: (a) a housing; (b) at least one anode discharge region within said housing for the formation and acceleration of a plasma beam, said anode discharge region having an opening at a first end adjacent the exterior of said housing and at least one anode at a second end at least one gap therein, said anode being electrically insulated from said housing in such a manner to prohibit the formation of plasma migrating into the interior of said housing behind said anode; (c) cooling means for thermally cooling said anode other than by radiative thermal emission; (d) at least one self-sustaining cathode; (e) power supply means connected to said anode for supplying a voltage between said anode and said cathode for the breakdown of working gases to form a gaseous discharge and to drive an anode discharge current from said anode through said anode discharge region to said cathode; (f) injection means for introducing the working gases through the gap in said anode and into said anode discharge region; and (g) electromagnetic means mounted in said housing for establishing and for at least partially driving a magnetic field within said anode discharge region, wherein the direction of flux of said magnetic field is periodically reversed and wherein said anode discharge region and the magnetic field are so disposed to allow the formation of a non-closed Hall-effect electron drift current path driven by means of a Hall-effect force within said anode discharge region.

Claim 37

An ion source as defined in claim 34 wherein a separate power supply means supplying an AC voltage wave form drives said electromagnetic means and periodically reverses the direction of flux.

Claim 38

An ion source as defined in claim 34 wherein the anode discharge current is periodically reversed through said electromagnetic means to periodically reverse the direction of the flux by a current switching circuit means.

Claim 39

An ion source as defined in claim 34 with said anode discharge region forming a channel to produce a plasma beam that substantially is directed axially outward with respect to said ion source and with the magnetic field at the ends of said channel forming a cusp extending inwardly towards said anode discharge region.

Claim 40

An ion source as defined in claim 34 wherein the direction of the lines of flux of the magnetic field established by said electromagnetic means are substantially parallel to the surface of said anode at the second end of said anode discharge region.

Claim 41

An ion source as defined in claim 34 wherein the direction of the lines of flux of the magnetic field established by said electromagnetic means diverge in a direction substantially the same as that of the plasma beam exiting said anode discharge region.

Claim 42

An ion source as defined in claim 34 wherein said discharge region and the gap in said anode is substantially circular and said anode discharge region forms a plasma beam that is directed substantially axially outward with respect to the opening of said anode discharge region.

Claim 43

An ion source as defined in claim 34 wherein said discharge region and the gap in said anode is substantially linear and said anode discharge region forms a plasma beam that is directed substantially axially outward with respect to the opening of said anode discharge region.

Claim 44

An ion source as defined in claim 34 wherein said discharge region and the gap in said anode is substantially circular or linear and said anode discharge region forms a plasma beam that is directed substantially radially outward with respect to the opening of said anode discharge region.

Claim 45

An ion source as defined in claim 34 wherein said cathode is disposed axi-symmetrically with respect to said anode discharge region.

Claim 46

An ion source as defined in claim 34 wherein said cooling means comprises an injector means for directly contacting said anode with a cooling fluid.

Claim 47

An ion source as defined in claim 34 wherein said injection means having holes or gaps for substantially uniformly distributing the working gases into said anode discharge region and for substantially uniformly distributing the resulting anode discharge current adjacent to the gap.

Claim 48

An ion source as defined in claim 34 wherein said housing comprises metal walls and said anode is electrically insulated from said metal housing with a high temperature electrical insulator selected from the group consisting of alumina, aluminum nitride, quartz, boron nitride, glass-bonded mica, zirconia and mixtures thereof.

Claim 49

An ion source as defined in claim 34 wherein said electromagnetic means comprises an electromagnetic combined with a material selected from the group consisting of permanent magnets, ferromagnetics, and magnets having a permeability greater than unity are combined for establishing the magnetic field and shaping the direction and strength of the magnetic field within said anode discharge region.

Claim 50

An ion source as defined in claim 34 for depositing materials onto substrates wherein the dimensions of the gap within said anode being at least greater than the characteristic Debye length of the local plasma formed near the gap in said anode and the shape of the gap being configured so as to substantially restrict line-of-sight deposition of coating onto said anode within said gap such that said anode discharge current is substantially maintained at said anode within the gap near a localized region of the working gases passing into said anode discharge region.

Claim 51

An ion source as defined in claim 48 wherein a distributor means is included in said housing for introducing deposition gases directly into the plasma beam and separately from that of said injection means for introducing working gases through the gap.

Claim 52

An ion source as defined in claim 49 wherein said distributor means comprises at least one tube having a nozzle at one end for directing the deposition gases into said anode discharge region.

Claim 53

An ion source as defined in claim 49 wherein said distributor means comprises at least one distributor ring for directing the deposition gas into said anode discharge region.

Claim 54

An ion source as defined in claim 49 wherein said distributor means comprises at least one tube having a nozzle at one end for directing the deposition gases outside said anode discharge region.

Claim 55

An ion source as defined in claim 49 wherein said distributor means comprises at least one distributor ring for directing the deposition gases outside said anode discharge region.

Claim 56

An ion source as defined in claim 49 wherein the deposition gases are selected from the group consisting of a hydrocarbon, siloxane, silazane, silane and mixtures thereof.

Claim 57

An ion source as defined in claim 34 is combined with at least an additional ion source to form an array of ion sources to process large area workpieces.

Claim 58

An ion source as defined in claim 34 is combined with at least an additional ion source to process at least two sides of a single workpiece.

Claim 59

An ion source as defined in claim 34 wherein at least two anode discharge regions are disposed within at least one housing and wherein the anode discharge current from said anode discharge regions share a common self-sustaining cathode.

Claim 60

An ion source as defined in claim 34 wherein said power supply means supplies a voltage selected from the group consisting of DC, AC, pulsed, RF voltage wave forms and combinations thereof.

Claim 61

An ion source as defined in claim 34 wherein said electromagnetic means is connected in series with the anode discharge current and in the discharge current path between said anode and a positive lead of said power supply means.

Claim 62

An ion source as defined in claim 36 wherein said electromagnetic means is connected in series with the anode discharge current and in the discharge current path between said self-sustaining cathode and a negative lead of said power supply means.

Claim 63

An ion source as defined in claim 36 wherein said electromagnet in series with the anode discharge current and in said discharge current path between said anode and positive lead of a power supply for said voltage and means of establishing said periodic wave form with an electronic current switching network so disposed to alter the current direction or amplitude or combination thereof within said electromagnet.

Claim 64

A gridless ion source for the deposition of materials onto substrates comprising: (a) a housing; (b) at least one anode discharge region within said housing for the formation and acceleration of a plasma beam, said anode discharge region having an opening at a first end adjacent the exterior of said housing and at least one anode at a second end, said anode being electrically insulated from said housing in such a manner to prohibit the formation of plasma migrating into the interior of said housing behind said anode; (c) cooling means for thermally cooling said anode other than by radiative thermal emission; (d) at least one self-sustaining cathode disposed outside anode discharge region and substantially outside the plasma beam; (e) power supply means connected to said anode for supplying a voltage between said anode and said cathode for the breakdown of working gases to form a gaseous discharge and to drive a anode discharge current from said anode through said anode discharge region to said cathode; (f) injection means for introducing the working gases through at least one gap within said anode and into said anode discharge region, the dimensions of the gap within said anode being at least greater than the characteristic Debye length of the local plasma formed near the gap in said anode and the shape of the gap being configured so as to substantially restrict line-of-sight deposition of coating onto said anode within said gap such that said anode discharge current is substantially maintained at said anode within the gap near a localized region of the working gases passing into said anode discharge region; and (g) electromagnetic means mounted in said housing for establishing and for at least partially driving a magnetic field within said anode discharge region, wherein the direction of flux of said magnetic field is periodically reversed and wherein said anode discharge region and the magnetic field are so disposed to allow the formation of a non-closed Hall-effect electron drift current path driven by means of a Hall-effect force within said anode discharge region.

Claim 65

A gridless ion source for the deposition of materials onto substrates comprising: (a) a housing; (b) at least one anode discharge region within said housing for the formation and acceleration of a plasma beam, said anode discharge region having an opening at a first end adjacent the exterior of said housing and at least one anode at a second end, said anode being electrically insulated from said housing in such a manner to prohibit the formation of plasma migrating into the interior of said housing behind said anode; (c) cooling means for thermally cooling said anode other than by radiative thermal emission; (d) at least one self-sustaining cathode disposed outside anode discharge region and substantially outside the plasma beam; (e) power supply means connected to said anode for supplying a voltage between said anode and said cathode for the breakdown of working gases to form a gaseous discharge and to drive a anode discharge current from said anode through said anode discharge region to said cathode; (f) injection means for introducing the working gases through at least one gap within said anode and into said anode discharge region, the dimensions of the gap within said anode being at least greater than the characteristic Debye length of the local plasma formed near the gap in said anode and the shape of the gap being configured so as to substantially restrict line-of-sight deposition of coating onto said anode within said gap such that said anode discharge current is substantially maintained at said anode within the gap near a localized region of the working gases passing into said anode discharge region; and (g) electromagnetic means mounted in said housing for establishing and for at least partially driving a magnetic field within said anode discharge region, wherein the direction of flux of said magnetic field is periodically reversed and wherein said anode discharge region and the magnetic field are so disposed to allow the formation of a non-closed Hall-effect electron drift current path driven by means of a Hall-effect force within said anode discharge region.

Claim 66

A gridless ion source for the vacuum processing of materials comprising: (a) a housing; (b) at least one anode discharge region within said housing for the formation and acceleration of a plasma beam, said anode discharge region having an opening at a first end adjacent the exterior of said housing and at least one anode at a second end having at least one gap therein, said anode being electrically insulated from said housing in such a manner to prohibit the formation of plasma migrating into the interior of said housing behind said anode; (c) cooling means for thermally cooling said anode other than by radiative thermal emission; (d) at least one self-sustaining cathode; (e) power supply means connected to said anode for supplying a voltage between said anode and said cathode for the breakdown of working gases to form a gaseous discharge and to drive an anode discharge current from said anode through said anode discharge region to said cathode; (f) injection means for introducing the working gases through at least one gap within said anode and into said anode discharge region; the dimensions of the gap within said anode being at least greater than the characteristic Debye length of the local plasma formed near the gap in said anode and the shape of the gap being configured so as to substantially restrict line-of-sight deposition of coating onto said anode within said gap such that said anode discharge current is substantially maintained at said anode within the gap near a localized region of the working gases passing into said anode discharge region; (g) electromagnetic means mounted in said housing for establishing and for at least partially driving a magnetic field within said anode discharge region. (h) at least one electrically isolating gap between said anode and an adjacent portion of said housing bounding said anode discharge region disposed in such a manner to prohibit formation of conductive paths within said electrically isolating gap and between said anode and said adjacent portion of said housing.

Claim 67

A gridless ion source for the vacuum processing of materials comprising: (a) a housing; (b) at least one anode discharge region within said housing for the formation and acceleration of a plasma beam, said anode discharge region having an opening at a first end adjacent the exterior of said housing and at least one anode at a second end having at least one gap therein, said anode being electrically insulated from said housing in such a manner to prohibit the formation of plasma migrating into the interior of said housing behind said anode; (c) cooling means for thermally cooling said anode other than by radiative thermal emission; (d) at least one self-sustaining cathode; (e) power supply means connected to said anode for supplying a voltage between said anode and said cathode for the breakdown of working gases to form a gaseous discharge and to drive an anode discharge current from said anode through said anode discharge region to said cathode; (f) injection means for introducing the working gases through at least one gap within said anode and into said anode discharge region; the dimensions of the gap within said anode being at least greater than the characteristic Debye length of the local plasma formed near the gap in said anode and the shape of the gap being configured so as to substantially restrict line-of-sight deposition of coating onto said anode within said gap such that said anode discharge current is substantially maintained at said anode within the gap near a localized region of the working gases passing into said anode discharge region; (g) electromagnetic means mounted in said housing for establishing and for at least partially driving a magnetic field within said anode discharge region. (h) at least one electrically isolating gap between said anode and an adjacent portion of said housing bounding said anode discharge region disposed in such a manner to prohibit formation of conductive paths within said electrically isolating gap and between said anode and said adjacent portion of said housing.

Claim 68

An ion source as defined in claim 63 wherein said electrically isolating gap is purged with a non-depositing working gas.