Patent US5961362A successfully refreshed from Google Patents.
US5961362A
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US
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Method for in situ cleaning of electron emitters in a field emission device
Assignee: Motorola Solutions Inc
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Filing: 1997-09-09
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Granted: 1999-10-05
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Expires: 2017-09-09
Abstract
Abstract A method for in situ cleaning of electron emitters (126, 226, 326, 526) in a field emission device (100, 200, 300, 400, 500) includes the steps of controllably providing hydrogen gas (142, 242, 342, 542) within the field emission device (100, 200, 300, 400, 500) at a time during the operational life of the field emission device (100, 200, 300, 400, 500) and, thereafter, emitting electrons from the electron emitters (126, 226, 326, 526), thereby forming hydrogen free radicals, which decontaminate and condition the emissive surfaces of the electron emitters (126, 226, 326, 526).
Inventors
- 👤 Babu Chalamala
- 👤 Arthur J. Ingle
- 👤 Charles Rowell
- 👤 Thomas L. Credelle
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 12:28
CPC Classifications
H; H01; H01J; H01J9/00; H01J9/02; H01J9/022; H01J9/025
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
47 words
A method for in situ cleaning of electron emitters in a field emission device comprising the steps of: introducing hydrogen gas into the field emission device at a time subsequent to sealing of the field emission device; and thereafter, forming hydrogen free radicals from the hydrogen gas.
Claim 2
Independent Claim
47 words
A method for in situ cleaning of electron emitters in a field emission device comprising the steps of: introducing hydrogen gas into the field emission device at a time subsequent to sealing of the field emission device; and thereafter, forming hydrogen free radicals from the hydrogen gas.
Claim 3
Dependent Claim
39 words
The method for in situ cleaning of electron emitters as claimed in claim 1, wherein the step of introducing hydrogen gas into the field emission device includes the step of controllably introducing hydrogen gas within the field emission device.
Claim 4
Dependent Claim
40 words
The method for in situ cleaning of electron emitters as claimed in claim 2, wherein the step of controllably introducing hydrogen gas into the field emission device includes the step of periodically introducing hydrogen gas within the field emission device.
Claim 5
Dependent Claim
36 words
The method for in situ cleaning of electron emitters as claimed in claim 1, wherein the step of forming hydrogen free radicals from the hydrogen gas includes the step of emitting electrons from the electron emitters.
Claim 6
Dependent Claim
37 words
The method for in situ cleaning of electron emitters as claimed in claim 1, wherein the step of introducing hydrogen gas into the field emission device includes the step of diffusing hydrogen gas through a hydrogen-selective membrane.
Claim 7
Dependent Claim
47 words
The method for in situ cleaning of electron emitters as claimed in claim 5, wherein the step of diffusing hydrogen gas through a hydrogen-selective membrane includes the step of diffusing hydrogen gas through a hydrogen-selective membrane disposed in registration with a hole defined by the device package.
Claim 8
Independent Claim
56 words
A method for in situ cleaning of electron emitters in a field emission device having an evacuated interspace region, the method comprising the steps of: providing a hydrogen source within the evacuated interspace region of the field emission device; releasing hydrogen gas from the hydrogen source; and thereafter, forming hydrogen free radicals from the hydrogen gas.
Claim 9
Independent Claim
56 words
A method for in situ cleaning of electron emitters in a field emission device having an evacuated interspace region, the method comprising the steps of: providing a hydrogen source within the evacuated interspace region of the field emission device; releasing hydrogen gas from the hydrogen source; and thereafter, forming hydrogen free radicals from the hydrogen gas.
Claim 10
Dependent Claim
52 words
The method for in situ cleaning of electron emitters as claimed in claim 7, wherein the step of providing a hydrogen source includes the steps of providing a member made from a refractory metal, heating the member in a hydrogen atmosphere, and thereafter cooling the member, thereby entrapping hydrogen within the member.
Claim 11
Dependent Claim
36 words
The method for in situ cleaning of electron emitters as claimed in claim 8, wherein the step of providing a member made from a refractory metal includes the step of providing a member made from palladium.
Claim 12
Dependent Claim
35 words
The method for in situ cleaning of electron emitters as claimed in claim 7, wherein the step of releasing hydrogen gas from the hydrogen source includes the step of impinging electrons onto the hydrogen source.
Claim 13
Dependent Claim
43 words
The method for in situ cleaning of electron emitters as claimed in claim 10, wherein the step of impinging electrons onto the hydrogen source includes the step of impinging onto the hydrogen source electrons emitted by at least one of the electron emitters.
Claim 14
Dependent Claim
33 words
The method for in situ cleaning of electron emitters as claimed in claim 7, wherein the step of releasing hydrogen gas from the hydrogen source includes the step of heating the hydrogen source.
Claim 15
Dependent Claim
36 words
The method for in situ cleaning of electron emitters as claimed in claim 7, wherein the step of forming hydrogen free radicals from the hydrogen gas includes the step of emitting electrons from the electron emitters.
Claim 16
Dependent Claim
37 words
The method for in situ cleaning of electron emitters as claimed in claim 7, wherein the step of releasing hydrogen gas from the hydrogen source includes the step of controllably releasing hydrogen gas from the hydrogen source.
Claim 17
Dependent Claim
46 words
The method for in situ cleaning of electron emitters as claimed in claim 14, wherein the step of controllably releasing hydrogen gas from the hydrogen source includes the step of releasing hydrogen gas from the hydrogen source in response to activation of the field emission device.
Claim 18
Dependent Claim
38 words
The method for in situ cleaning of electron emitters as claimed in claim 14, wherein the step of controllably releasing hydrogen gas from the hydrogen source includes the step of periodically releasing hydrogen gas from the hydrogen source.
Claim 19
Dependent Claim
62 words
The method for in situ cleaning of electron emitters as claimed in claim 14, wherein the step of controllably releasing hydrogen gas from the hydrogen source includes the step of releasing hydrogen gas from the hydrogen source in response to the drop below a predetermined value of a test emission current measured at a test electron emitter in the field emission device.
Claim 20
Dependent Claim
63 words
The method for in situ cleaning of electron emitters as claimed in claim 14, wherein the step of controllably releasing hydrogen gas from the hydrogen source includes the step of releasing hydrogen gas from the hydrogen source at a rate sufficient to clean the electron emitters and thereby maintain stable electron emission for a given set of conditions within the field emission device.
Claim 21
Independent Claim
52 words
A method for in situ cleaning of electron emitters in a field emission device comprising the steps of: sealing the field emission device; and thereafter, adjusting a partial pressure of hydrogen gas within the field emission device in a manner sufficient to maintain stable electron emission having fluctuations within a tolerable range.
Claim 22
Independent Claim
52 words
A method for in situ cleaning of electron emitters in a field emission device comprising the steps of: sealing the field emission device; and thereafter, adjusting a partial pressure of hydrogen gas within the field emission device in a manner sufficient to maintain stable electron emission having fluctuations within a tolerable range.
Claim 23
Dependent Claim
45 words
The method for in situ cleaning of electron emitters as claimed in claim 19, wherein the step of adjusting a partial pressure of hydrogen gas includes the step of maintaining within the field emission device a partial pressure of hydrogen greater than 10 -8 Torr.
Claim 24
Dependent Claim
50 words
The method for in situ cleaning of electron emitters as claimed in claim 20, wherein the step of adjusting a partial pressure of hydrogen gas includes the step of maintaining within the field emission device a partial pressure of hydrogen within a range of 10 -8 to 10 -5 Torr.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-10-04 | 2003-04-05 | 2003-10-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-10-04 | 2007-04-05 | 2007-10-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-10-04 | 2011-04-05 | 2011-10-05 | $7700.00 | Window Closed / Lapsed |