Patent US5958635A successfully refreshed from Google Patents.
US5958635A
Expired / Lapsed
US
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Lithographic proximity correction through subset feature modification
Assignee: NXP USA Inc
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Filing: 1997-10-20
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Granted: 1999-09-28
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Expires: 2017-10-20
Abstract
Abstract Lithographic Proximity Correction (LPC) shapes are added (503) to a layer of a layout database file (501). Geometric criteria such as feature width are then used to filter the added LPC shapes (502). The LPC shapes are then modified (505) by determining which LPC shapes are within a predetermined distance from a shape in a layer of the second data base (504). The database file, including the modified LPC shapes, is then used to manufacture a set of lithographic masks (506). The lithographic masks are then used to pattern a set of wafers in the manufacture of integrated circuits (507).
Inventors
- 👤 Alfred John Reich
- 👤 Hak-Lay Chuang
- 👤 Michael E. Kling
- 👤 Paul G. Y. Tsui
- 👤 Kevin Lucas
- 👤 James N. Conner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 11:33
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/36; G03F7/00; G03F7/70; G03F7/70425; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
83 words
A method for modifying a set of lithographic proximity shapes in a design with a plurality of layers and containing the set of lithographic proximity shapes associated with a first set of shapes in the design, said method comprising: selecting a second set of shapes in the design; and modifying a subset of the lithographic proximity shapes in the first set of shapes based on the relationship of said lithographic proximity shapes to the second set of shapes to form a modified design.
Claim 2
Independent Claim
83 words
A method for modifying a set of lithographic proximity shapes in a design with a plurality of layers and containing the set of lithographic proximity shapes associated with a first set of shapes in the design, said method comprising: selecting a second set of shapes in the design; and modifying a subset of the lithographic proximity shapes in the first set of shapes based on the relationship of said lithographic proximity shapes to the second set of shapes to form a modified design.
Claim 3
Dependent Claim
32 words
The method in claim 1 wherein: the first set of shapes are in a first layer of the design, the second set of shapes are in a second layer of the design.
Claim 4
Dependent Claim
65 words
The method in claim 1 wherein: the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes, and removing a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 5
Dependent Claim
65 words
The method in claim 1 wherein: the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes, and downsizing a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 6
Dependent Claim
64 words
The method in claim 1 wherein: the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes, and upsizing a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is within a predetermined distance from at least one in the set of interconnect locations.
Claim 7
Dependent Claim
65 words
The method in claim 1 wherein: the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes, and moving a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 8
Dependent Claim
75 words
The method in claim 1 wherein: the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes, and altering a first geometric shape of a selected lithographic proximity shape from the subset of lithographic proximity shapes into a second geometric shape when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 9
Dependent Claim
33 words
The method in claim 1 wherein: the set of lithographic proximity shapes are stored separately from the first set of shapes in the design in a database stored in a Non-Volatile Storage Medium.
Claim 10
Dependent Claim
25 words
The method in claim 1 which further comprises: manufacturing a lithographic reticle using the modified design, and patterning a semiconductor wafer utilizing the lithographic reticle.
Claim 11
Dependent Claim
33 words
The method in claim 1 which further comprises: filtering a third set of shapes in the design for a set of predetermined criteria to form the first set of shapes in the design.
Claim 12
Independent Claim
119 words
A method for modifying a design including a plurality of layers, the method comprising: receiving an initial design representation including a plurality of layers; filtering the initial design representation using a first set of predetermined criteria to form a filtered design representation; applying a set of lithographic proximity shapes associated with a first set of shapes in the filtered design representation; selecting a second set of shapes in the filtered design representation; modifying a subset of the lithographic proximity shapes in the first set of shapes based on the relationship of the lithographic proximity shapes to the second set of shapes to form a modified filtered design representation; and forming a modified design using said modified filtered design representation.
Claim 13
Independent Claim
119 words
A method for modifying a design including a plurality of layers, the method comprising: receiving an initial design representation including a plurality of layers; filtering the initial design representation using a first set of predetermined criteria to form a filtered design representation; applying a set of lithographic proximity shapes associated with a first set of shapes in the filtered design representation; selecting a second set of shapes in the filtered design representation; modifying a subset of the lithographic proximity shapes in the first set of shapes based on the relationship of the lithographic proximity shapes to the second set of shapes to form a modified filtered design representation; and forming a modified design using said modified filtered design representation.
Claim 14
Dependent Claim
39 words
The method, as recited in claim 11, wherein: the first set of shapes is in a first layer of the filtered design representation; and the second set of shapes is in a second layer of the filtered design representation.
Claim 15
Dependent Claim
67 words
The method, as recited in claim 11, wherein the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes; and removing a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 16
Dependent Claim
67 words
The method, as recited in claim 11, wherein the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes; and downsizing a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 17
Dependent Claim
66 words
The method, as recited in claim 11, wherein the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes; and upsizing a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is within a predetermined distance from at least one in the set of interconnect locations.
Claim 18
Dependent Claim
67 words
The method, as recited in claim 11, wherein the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes; and moving a selected lithographic proximity shape from the subset of lithographic proximity shapes when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 19
Dependent Claim
77 words
The method, as recited in claim 11, wherein the step of modifying comprises: identifying a set of interconnect locations between the first set of shapes and the second set of shapes; and altering a first geometric shape of a selected lithographic proximity shape from the subset of lithographic proximity shapes into a second geometric shape when the selected lithographic proximity shape is not within a predetermined distance from at least one in the set of interconnect locations.
Claim 20
Dependent Claim
21 words
The method, as recited in claim 11, wherein: the filtered design representation is a database stored in a non-volatile storage medium.
Claim 21
Dependent Claim
25 words
The method, as recited in claim 18, wherein: the set of lithographic proximity shapes is stored separately from the first set shapes in said database.
Claim 22
Dependent Claim
26 words
The method, as recited in claim 11, further comprising: manufacturing a lithographic reticle using the modified design; and patterning a semiconductor wafer utilizing the lithographic reticle.
Claim 23
Dependent Claim
34 words
The method, as recited in claim 11, further comprising: filtering a third set of shapes in the filtered design representation using a second set of predetermined criteria to form the first set of shapes.
References Cited (Backward Citations)
US4895780A
Cited
US5242770A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-09-27 | 2003-03-29 | 2003-09-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-09-27 | 2007-03-29 | 2007-09-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-09-27 | 2011-03-29 | 2011-09-28 | $7700.00 | Window Closed / Lapsed |