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Thin film tantalum oxide capacitors and resulting product

Assignee: Nokia of America Corp
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Filing: 1997-03-06
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Granted: 1999-08-10
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Expires: 2017-03-06
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Abstract

Abstract In accordance with the invention, a thin film capacitor including a dielectric of nitrogen or silicon-doped tantalum oxide and at least one electrode including chromium. Preferably the capacitor is fabricated by anodically oxidizing TaN x or Ta 2 Si and forming a Cr counterelectrode. The method is fully compatible with MCM processing. It produces anodic Ta 2 O 5 capacitors having exceptionally low leakage currents (<1 nA/cm 2 at 10 V), high breakdown fields (>4 MV/cm) and high capacitance densities (70 nF/cm 2 ). The devices are stable at 350° C. with excellent capacitor properties and are particularly useful as thin film capacitors of large area (>1 mm 2 ).

Inventors

  • 👤 Ratnaji Rao Kola
  • 👤 King Lien Tai

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 22:24
CPC Classifications
H; H01; H01G; H01G4/00; H01G4/002; H01G4/018; H01G4/06; H01G4/08; H01G4/12; H01G4/1209; H01G4/1254; H10; H10D; H10D1/00; H10D1/60; H10D1/68; H01G4/005; H01G4/008; H01G4/228; H10D1/682; H10D1/684; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6302; H10P14/6304; H10P14/6314; H10P14/69; H10P14/692; H10P14/6938; H10P14/6939; H10P14/69393

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 69 words
A thin film tantalum oxide capacitor comprising: a substrate-supported first electrode comprising TaN x , where x denotes the atomic ratio of N; a dielectric layer comprising Ta 2 O 5 N y , where y denotes the atomic ratio of N, having an N content of at least 20 atomic % disposed on said TaN x ; and a second electrode comprising chromium disposed on said dielectric layer.
Claim 2
Dependent Claim 69 words
A thin film tantalum oxide capacitor comprising: a substrate-supported first electrode comprising TaN x , where x denotes the atomic ratio of N; a dielectric layer comprising Ta 2 O 5 N y , where y denotes the atomic ratio of N, having an N content of at least 20 atomic % disposed on said TaN x ; and a second electrode comprising chromium disposed on said dielectric layer.
Claim 3
Dependent Claim 15 words
The capacitor of claim 1 wherein said substrate comprises silicon having a silicon oxide surface.
Claim 4
Dependent Claim 13 words
The capacitor of claim 1 wherein said substrate comprises an insulating ceramic material.
Claim 5
Dependent Claim 20 words
The capacitor of claim 1 wherein said first electrode is a composite layer comprising aluminum and said TaN x .
Claim 6
Dependent Claim 15 words
The capacitor of claim 1 wherein said dielectric layer comprises anodically oxidized TaN x .
Claim 7
Dependent Claim 26 words
The capacitor of claim 1 wherein said second electrode is a composite layer comprising chromium and copper, said chromium disposed between said copper and said dielectric.
Claim 8
Dependent Claim 26 words
The capacitor of claim 1 wherein said second electrode is a composite layer comprising chromium and aluminum, said chromium disposed between said aluminum and said dielectric.
Claim 9
Dependent Claim 18 words
The capacitor of claim 1 wherein said capacitor has an area in excess of 1 mm 2 .

References Cited (Backward Citations)

US5264728A Cited
US5696017A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2002-08-09 2003-02-08 2003-08-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2006-08-09 2007-02-08 2007-08-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2010-08-09 2011-02-08 2011-08-10 $7700.00 Window Closed / Lapsed

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