Patent US5900637A successfully refreshed from Google Patents.
US5900637A
Expired / Lapsed
US
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Maskless lithography using a multiplexed array of fresnel zone plates
Assignee: Massachusetts Institute of Technology
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Filing: 1997-05-30
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Granted: 1999-05-04
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Expires: 2017-05-30
Abstract
Abstract An array of Fresnel zone plates is illuminated by parallel beamlets of narrow-band electromagnetic radiation. The individual zone plates focus a significant fraction of the incident radiation to foci on a substrate located at least several micrometers distant. The beamlets are capable of being individually turned on or off by shutters, or by deflecting small mirrors that would otherwise direct a beamlet to its Fresnel zone plate. Pattern generation is accomplished by moving the substrate while multiplexing the individual beamlets on or off.
Inventors
- 👤 Henry I. Smith
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 09:27
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70383; G03F7/70216; G03F7/70283; G03F7/70291; G03F7/704
Claims Analysis
Total Claims: 34
Claim 1
Independent Claim
32 words
A maskless lithography system comprising an array of Fresnel zone plates which focus an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate.
Claim 2
Dependent Claim
32 words
A maskless lithography system comprising an array of Fresnel zone plates which focus an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate.
Claim 3
Dependent Claim
16 words
The system of claim 1, wherein said array of images comprise an array of focal points.
Claim 4
Dependent Claim
18 words
The system of claim 2 further comprising means for modulating individual ones of said array of focal points.
Claim 5
Dependent Claim
19 words
The system of claim 3, wherein said modulating means operates to selectively shut off and on said focal points.
Claim 6
Dependent Claim
25 words
The system of claim 3, wherein said modulating means are positioned between a source of said energy beam and said array of Fresnel zone plates.
Claim 7
Dependent Claim
21 words
The system of claim 3, wherein said modulating means are positioned between said array of Fresnel zone plates and said substrate.
Claim 8
Dependent Claim
12 words
The system of claim 3, wherein said modulating means comprises micromechanical shutters.
Claim 9
Dependent Claim
12 words
The system of claim 3, wherein said modulating means comprises micromechanical mirrors.
Claim 10
Dependent Claim
22 words
The system of claim 2, wherein said focal points are directed to said substrate adjacent to said array of Fresnel zone plates.
Claim 11
Dependent Claim
12 words
The system of claim 9, wherein said substrate comprises a silicon wafer.
Claim 12
Dependent Claim
12 words
The system of claim 1, wherein said energy beam comprises electromagnetic radiation.
Claim 13
Dependent Claim
12 words
The system of claim 1, wherein said energy beam comprises atomic particles.
Claim 14
Dependent Claim
18 words
The system of claim 1, wherein said array of Fresnel zone plates are arranged on a carbonaceous membrane.
Claim 15
Dependent Claim
18 words
The system of claim 13, wherein said membrane is supported by support members that extend from said membrane.
Claim 16
Dependent Claim
18 words
The system of claim 1, wherein said array of Fresnel zone plates are arranged on a glass membrane.
Claim 17
Dependent Claim
42 words
A maskless lithography system comprising: a source of an energy beam; and an array of Fresnel zone plates which focus said energy beam into an array of focal points on a substrate to create an image corresponding to a permanent pattern thereon.
Claim 18
Dependent Claim
42 words
A maskless lithography system comprising: a source of an energy beam; and an array of Fresnel zone plates which focus said energy beam into an array of focal points on a substrate to create an image corresponding to a permanent pattern thereon.
Claim 19
Dependent Claim
18 words
The system of claim 16 further comprising means for modulating individual ones of said array of focal points.
Claim 20
Dependent Claim
19 words
The system of claim 17, wherein said modulating means operates to selectively shut off and on said focal points.
Claim 21
Dependent Claim
25 words
The system of claim 17, wherein said modulating means are positioned between a source of said energy beam and said array of Fresnel zone plates.
Claim 22
Dependent Claim
21 words
The system of claim 17, wherein said modulating means are positioned between said array of Fresnel zone plates and said substrate.
Claim 23
Dependent Claim
12 words
The system of claim 17, wherein said modulating means comprises micromechanical shutters.
Claim 24
Dependent Claim
12 words
The system of claim 17, wherein said modulating means comprises micromechanical mirrors.
Claim 25
Dependent Claim
12 words
The system of claim 16, wherein said energy beam comprises electromagnetic radiation.
Claim 26
Dependent Claim
12 words
The system of claim 16, wherein said energy beam comprises atomic particles.
Claim 27
Dependent Claim
12 words
The system of claim 16, wherein said substrate comprises a silicon wafer.
Claim 28
Dependent Claim
18 words
The system of claim 16, wherein said array of Fresnel zone plates are arranged on a carbonaceous membrane.
Claim 29
Dependent Claim
18 words
The system of claim 26, wherein said membrane is supported by support members that extend from said membrane.
Claim 30
Dependent Claim
18 words
The system of claim 16, wherein said array of Fresnel zone plates are arranged on a glass membrane.
Claim 31
Independent Claim
57 words
A method of maskless lithography comprising: providing an energy beam which creates an image on a substrate; focusing said energy beam with an array of Fresnel zone plates which focus said energy beam into an array of focal points on said substrate to create said image thereon; and modulating individual ones of said array of focal points.
Claim 32
Independent Claim
57 words
A method of maskless lithography comprising: providing an energy beam which creates an image on a substrate; focusing said energy beam with an array of Fresnel zone plates which focus said energy beam into an array of focal points on said substrate to create said image thereon; and modulating individual ones of said array of focal points.
Claim 33
Dependent Claim
46 words
An array of Fresnel zone plates for use in maskless lithography, said array of Fresnel zone plates being arranged on a membrane and operable for focusing an energy beam into an array of focal points on a substrate in order to create a permanent pattern thereon.
Claim 34
Dependent Claim
46 words
An array of Fresnel zone plates for use in maskless lithography, said array of Fresnel zone plates being arranged on a membrane and operable for focusing an energy beam into an array of focal points on a substrate in order to create a permanent pattern thereon.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-05-03 | 2002-11-02 | 2003-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-05-03 | 2006-11-02 | 2007-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-05-03 | 2010-11-02 | 2011-05-04 | $7700.00 | Window Closed / Lapsed |