US5897976A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Attenuating embedded phase shift photomask blanks
Assignee: EIDP Inc
•
Filing: 1997-02-10
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Granted: 1999-04-27
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Expires: 2017-02-10
Abstract
Abstract Attenuating embedded phase shift photomask blanks capable of producing a phase shift of 180° and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm comprise at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound at selected lithographic wavelengths <400 nm and are made by depositing at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound onto a substrate.
Inventors
- 👤 Peter Francis Carcia
- 👤 Roger Harquail French
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:21
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/32
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
79 words
An attenuating embedded phase shift photomask blank capable of producing a 180° phase shift and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm, the photomask blank comprising at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound at selected lithographic wavelengths <400 nm, wherein the aluminum compound is selected from the group consisting of aluminum nitride, aluminum oxynitride and aluminum oxide.
Claim 2
Dependent Claim
79 words
An attenuating embedded phase shift photomask blank capable of producing a 180° phase shift and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm, the photomask blank comprising at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound at selected lithographic wavelengths <400 nm, wherein the aluminum compound is selected from the group consisting of aluminum nitride, aluminum oxynitride and aluminum oxide.
Claim 3
Dependent Claim
15 words
The photomask blank of claim 1, wherein the photomask blank is a cermet photomask blank.
Claim 4
Dependent Claim
15 words
The photomask blank of claim 1 wherein the photomask blank is a multilayer photomask blank.
Claim 5
Dependent Claim
17 words
The photomask blank of claim 3, comprising alternating layers of aluminum compound and more optically absorbing component.
Claim 6
Dependent Claim
15 words
The photomask blank of claim 1, wherein the photomask blank is a composite photomask blank.
Claim 7
Dependent Claim
28 words
The photomask blank of claim 1, wherein the more optically absorbing component is selected from the group consisting of elemental metals, metal oxides, metal nitrides and mixtures thereof.
Claim 8
Dependent Claim
63 words
The photomask blank of claim 1, wherein the more optically absorbing component is selected from the group consisting of (a) elemental metals, (b) oxides of Ti, Fe, In, Co, Bi, Mn, Cu, Sn, Cr, Ni, V, Nb, Ta, Mo, metals in the lanthanide series, or W; (c) nitrides of Ti, Nb, Mo, Cr, W, Ta, Zr, Hf, or V; and (d) mixtures thereof.
Claim 9
Dependent Claim
25 words
The photomask blank of claim 1, wherein the selected lithographic wavelength is selected from the group consisting of 193 nm, 248 nm, and 365 nm.
Claim 10
Dependent Claim
86 words
A process for preparing an attenuating embedded phase shift photomask blank capable of producing a 180° phase shift and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm, the process comprising depositing at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound at selected lithographic wavelengths <400 nm on a substrate, wherein the aluminum compound is selected from the group consisting of aluminum nitride, aluminum oxynitride and aluminum oxide.
Claim 11
Dependent Claim
86 words
A process for preparing an attenuating embedded phase shift photomask blank capable of producing a 180° phase shift and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm, the process comprising depositing at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound at selected lithographic wavelengths <400 nm on a substrate, wherein the aluminum compound is selected from the group consisting of aluminum nitride, aluminum oxynitride and aluminum oxide.
Claim 12
Dependent Claim
13 words
The process of claim 9, wherein the deposition step comprises physical vapor deposition.
Claim 13
Dependent Claim
21 words
The process of claim 10, wherein the physical vapor deposition step is selected from the group consisting of sputtering and evaporation.
Claim 14
Dependent Claim
27 words
The process of claim 9, wherein the more optically absorbing component is selected from the group consisting of elemental metals, metal oxides, metal nitrides and mixtures thereof.
Claim 15
Dependent Claim
62 words
The process of claim 9, wherein the more optically absorbing component is selected from the group consisting of (a) elemental metals, (b) oxides of Ti, Fe, In, Co, Bi, Mn, Cu, Sn, Cr, Ni, V, Nb, Ta, Mo, metals in the lanthanide series, or W; (c) nitrides of Ti, Nb, Mo, Cr, W, Ta, Zr, Hf, or V; and (d) mixtures thereof.
Claim 16
Dependent Claim
35 words
The process of claim 9, wherein the more optically absorbing component is an elemental metal and wherein the deposited layer comprises the elemental metal dispersed within the aluminum compound to form a cermet photomask blank.
Claim 17
Dependent Claim
26 words
The process of claim 9, wherein alternating layers of the aluminum compound and the more optically absorbing component are deposited to form a multilayer photomask blank.
Claim 18
Dependent Claim
40 words
The process of claim 9 wherein the more optically absorbing component is not an elemental metal and wherein the layer deposited comprises a mixture of the aluminum compound and the more optically absorbing component to form a composite photomask blank.
Claim 19
Dependent Claim
24 words
The process of claim 9, wherein the selected lithographic wavelength is selected from the group consisting of 193 nm, 248 nm, and 365 nm.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-04-26 | 2002-10-26 | 2003-04-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-04-26 | 2006-10-26 | 2007-04-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-04-26 | 2010-10-26 | 2011-04-27 | $7700.00 | Window Closed / Lapsed |