Patent US5882534A successfully refreshed from Google Patents.
US5882534A
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Method for fabricating a multistage phase shift mask
Assignee: SK Hynix Inc
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Filing: 1995-05-17
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Granted: 1999-03-16
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Expires: 2015-05-17
Abstract
Abstract A multistage phase shift mask includes a light transmissive substrate having light shielding regions and light transmissive regions. A shielding layer is disposed on the shielding regions of the substrate and a phase shifter layer extends over the light transmissive regions between a pair of the shielding regions. A first etched portion on the substrate is adjacent to the phase shifter layer that contacts with the substrate and a second etched portion on the substrate is between the phase shifter layer and the first etched portion of the substrate. The second etched portion consists of a gradual concave slope allowing a phase shift from approximately 0 to 180 degrees.
Inventors
- 👤 Young Jin Song
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 12:22
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/28; G03F1/30
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
127 words
A method for fabricating a multistage phase shift mask comprising the steps of: defining a transmissive substrate into shielding regions and transmissive regions; forming a shielding layer on the shielding regions of the substrate; forming a phase shifter layer extending over the transmissive regions between a pair of the shielding regions; first etching the substrate at an adjacent region of the phase shifter layer that contacts with the substrate; and second etching the substrate between the phase shifter layer and the first etched substrate, wherein the second etching step consists of isotropically etching the substrate to have a concave shape to allow a gradual phase shift from approximately 0° to 180°, and wherein the first and second etching steps complete the formation of the phase shift layer.
Claim 2
Independent Claim
127 words
A method for fabricating a multistage phase shift mask comprising the steps of: defining a transmissive substrate into shielding regions and transmissive regions; forming a shielding layer on the shielding regions of the substrate; forming a phase shifter layer extending over the transmissive regions between a pair of the shielding regions; first etching the substrate at an adjacent region of the phase shifter layer that contacts with the substrate; and second etching the substrate between the phase shifter layer and the first etched substrate, wherein the second etching step consists of isotropically etching the substrate to have a concave shape to allow a gradual phase shift from approximately 0° to 180°, and wherein the first and second etching steps complete the formation of the phase shift layer.
Claim 3
Dependent Claim
33 words
A method for fabricating a multistage phase shift mask as claimed in claim 1, wherein the first etching step includes etching the substrate to a depth allowing a phase shift approximately to 180°.
Claim 4
Dependent Claim
24 words
A method for fabricating a multistage phase shift mask as claimed in claim 1, wherein the first etching step uses an anisotropic etching method.
Claim 5
Dependent Claim
68 words
A method for fabricating a multistage phase shift mask as claimed in claim 1, wherein the first etching step includes the steps of: depositing a photosensitive layer on the shielding layer, the phase shifter layer, and the substrate; exposing the substrate where the shielding layer is not formed at an adjacent region of the phase shifter layer that directly contacts the substrate; and anisotropically etching the exposed region.
Claim 6
Independent Claim
160 words
A method for fabricating a multistage phase shift mask comprising the steps of: defining a transmissive substrate into shielding regions and transmissive regions; forming a shielding layer on the shielding regions of the substrate; forming a phase shifter layer extending over the transmissive regions between a pair of the shielding regions; first etching the substrate at an adjacent region of the phase shifter layer that contacts with the substrate; and second etching the substrate between the phase shifter layer and the first etched substrate, wherein the second etching step consists of: depositing a photosensitive layer on the substrate containing a shielding layer, the phase shifter, and the first etched portion; exposing the substrate between the phase shifter and the first etched portion; and isotropically etching the exposed substrate to have a concave shape to allow a gradual phase shift from approximately 0° to 180°, and wherein the first and second etching steps complete the formation of the phase shift layer.
Claim 7
Independent Claim
160 words
A method for fabricating a multistage phase shift mask comprising the steps of: defining a transmissive substrate into shielding regions and transmissive regions; forming a shielding layer on the shielding regions of the substrate; forming a phase shifter layer extending over the transmissive regions between a pair of the shielding regions; first etching the substrate at an adjacent region of the phase shifter layer that contacts with the substrate; and second etching the substrate between the phase shifter layer and the first etched substrate, wherein the second etching step consists of: depositing a photosensitive layer on the substrate containing a shielding layer, the phase shifter, and the first etched portion; exposing the substrate between the phase shifter and the first etched portion; and isotropically etching the exposed substrate to have a concave shape to allow a gradual phase shift from approximately 0° to 180°, and wherein the first and second etching steps complete the formation of the phase shift layer.
Claim 8
Dependent Claim
40 words
A method for fabricating a multistage phase shift mask as claimed in claim 1, wherein the pair of the shielding regions in the step of forming the phase shifter layer extending over the transmissive regions are adjacent to each other.
Claim 9
Dependent Claim
108 words
A multistage phase shift mask comprising: a light transmissive substrate having light shielding regions and light transmissive regions; a shielding layer disposed on the light shielding regions of the substrate; a phase shifter layer extending over the light transmissive regions between a pair of the light shielding regions; a first etched portion on the substrate adjacent to the phase shifter layer that contacts with the substrate; and a second etched portion on the substrate between the phase shifter layer and the first etched portion of the substrate, wherein the second etched portion consists of a gradual concave slope allowing a phase shift from approximately 0 to 180 degrees.
Claim 10
Dependent Claim
108 words
A multistage phase shift mask comprising: a light transmissive substrate having light shielding regions and light transmissive regions; a shielding layer disposed on the light shielding regions of the substrate; a phase shifter layer extending over the light transmissive regions between a pair of the light shielding regions; a first etched portion on the substrate adjacent to the phase shifter layer that contacts with the substrate; and a second etched portion on the substrate between the phase shifter layer and the first etched portion of the substrate, wherein the second etched portion consists of a gradual concave slope allowing a phase shift from approximately 0 to 180 degrees.
Claim 11
Dependent Claim
26 words
A multistage phase shift mask as claimed in claim 7, wherein the first etched portion has a depth allowing a phase shift of approximately 180 degrees.
Claim 12
Dependent Claim
23 words
A multistage phase shift mask as claimed in claim 7, wherein the pair of the light shielding regions are adjacent to each other.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-03-15 | 2002-09-14 | 2003-03-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-15 | 2006-09-14 | 2007-03-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-15 | 2010-09-14 | 2011-03-16 | $7700.00 | Window Closed / Lapsed |