Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
71 words
Method of pre-fabricating contact tip structures for joining to ends of elongate interconnection elements, comprising: depositing at least one layer of at least one conductive material on a surface of a silicon wafer; depositing a layer of masking material atop the at least one conductive layer; patterning openings in the masking material; depositing at least one layer of at least one conductive material into the openings; and removing the masking material.
Claim 2
Dependent Claim
71 words
Method of pre-fabricating contact tip structures for joining to ends of elongate interconnection elements, comprising: depositing at least one layer of at least one conductive material on a surface of a silicon wafer; depositing a layer of masking material atop the at least one conductive layer; patterning openings in the masking material; depositing at least one layer of at least one conductive material into the openings; and removing the masking material.
Claim 3
Dependent Claim
28 words
Method, according to claim 1, further comprising: depositing a joining material on the at least one layer of at least one conductive material previously deposited in the openings.
Claim 4
Dependent Claim
16 words
Method, according to claim 2, further comprising: joining the tip structures to ends of contact structures.
Claim 5
Dependent Claim
13 words
Method, according to claim 3, wherein: the contact structures are resilient contact structures.
Claim 6
Dependent Claim
13 words
Method, according to claim 3, wherein: the contact structures are composite interconnection elements.
Claim 7
Dependent Claim
19 words
Method, according to claim 3, wherein: the contact structures are resilient contact structures permanently mounted to unsingulated semiconductor devices.
Claim 8
Dependent Claim
17 words
Method, according to claim 1, wherein: the elongate interconnection elements extend from at least one semiconductor die.
Claim 9
Dependent Claim
22 words
Method, according to claim 1, wherein: the elongate interconnection elements extend from a plurality of semiconductor dies resident on a semiconductor wafer.
Claim 10
Dependent Claim
24 words
Method, according to claim 3, further comprising: after joining the tip structures to the ends of the elongate interconnection elements, removing the silicon wafer.
Claim 11
Dependent Claim
19 words
Method, according to claim 1, wherein: the contact tip structures comprise at least one layer of a conductive material.
Claim 12
Dependent Claim
68 words
Method, according to claim 1, wherein: each elongate interconnection elements comprises a relatively soft core and a relatively hard overcoat; and the core is formed of a material selected from the group consisting of: gold, aluminum, copper, and their alloys; silver, palladium, platinum; metals or alloys such as metals of the platinum group of elements; and solder constituted from lead, tin, indium, bismuth, cadmium, antimony and their alloys.
Claim 13
Dependent Claim
79 words
Method, according to claim 1, wherein: each elongate interconnection element comprises a relatively soft core and a relatively hard overcoat; and the overcoat is at least one layer of a material selected from the group consisting of: nickel, and its alloys; copper, cobalt, iron, and their alloys; gold; silver; elements of the platinum group; noble metals; semi-noble metals and their alloys, elements of the platinum group and their alloys; tungsten and molybdenum; tin, lead, bismuth, indium and their alloys.