Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
171 words
A laminate which is obtained by conducting a surface treatment to deposit an oxide of at least one metal selected from the group consisting of metals in groups 2, 8, 9, 10 and 11 of the periodic table on at least one surface of a polymeric molded article, wherein the amount of metal oxide deposited on the surface of the polymeric molded article is in the range of 5×10 14 atoms/cm 2 to 3×10 16 atoms/cm 2 in terms of the amount of the metal atoms per unit area that has been surface treated, and then forming a gas barrier layer on the surface which has been surface treated, wherein the gas barrier layer is constituted of any of a layer mainly comprising an oxide of silicon, a layer mainly comprising a nitride of silicon or a layer mainly comprising a carbide of silicon, and the gas barrier layer is not peeled off from the polymeric molded article, even after being immersed in an alkali solution of pH 12 or more.
Claim 2
Dependent Claim
171 words
A laminate which is obtained by conducting a surface treatment to deposit an oxide of at least one metal selected from the group consisting of metals in groups 2, 8, 9, 10 and 11 of the periodic table on at least one surface of a polymeric molded article, wherein the amount of metal oxide deposited on the surface of the polymeric molded article is in the range of 5×10 14 atoms/cm 2 to 3×10 16 atoms/cm 2 in terms of the amount of the metal atoms per unit area that has been surface treated, and then forming a gas barrier layer on the surface which has been surface treated, wherein the gas barrier layer is constituted of any of a layer mainly comprising an oxide of silicon, a layer mainly comprising a nitride of silicon or a layer mainly comprising a carbide of silicon, and the gas barrier layer is not peeled off from the polymeric molded article, even after being immersed in an alkali solution of pH 12 or more.
Claim 3
Dependent Claim
16 words
The laminate according to claim 1 wherein the metal is magnesium, iron, cobalt, nickel or copper.
Claim 4
Dependent Claim
17 words
The laminate according to claim 1 wherein the gas barrier layer mainly comprises an oxide of silicon.
Claim 5
Dependent Claim
17 words
The laminate according to claim 3 wherein the polymeric molded article is a transparent polymeric molded article.
Claim 6
Dependent Claim
17 words
The laminate according to claim 1 wherein the polymeric molded article is a transparent polymeric molded article.
Claim 7
Dependent Claim
157 words
A method for preparing a laminate described in claim 5 which comprises a step of depositing at least one metal selected from the group consisting of metals in groups 2, 8, 9, 10 and 11 of the periodic table on at least one surface of a polymeric molded article, and then treating it under an oxidizing atmosphere, whereby said at least one surface becomes a metal oxide treated surface wherein the amount of metal oxide deposited on the surface of the polymeric molded article is in the range of 5×10 14 atoms/cm 2 to 3×10 16 atoms/cm 2 in terms of the amount of the metal atoms per unit area that has been surface treated, and a step of forming a gas barrier layer constituted of any of a layer mainly comprising an oxide of silicon, a layer mainly comprising a nitride of silicon or a layer mainly comprising a carbide of silicon on the treated surface.
Claim 8
Dependent Claim
48 words
The method according to claim 6 wherein the any one of the layer mainly comprising the oxide of silicon, the layer mainly comprising the nitride of silicon or the layer mainly comprising the carbide of silicon is formed by a plasma CVD method of an organic silicon compound.
Claim 9
Dependent Claim
42 words
The method according to claim 6 wherein the any one of the layer mainly comprising the oxide of silicon, the layer mainly comprising the nitride of silicon or the layer mainly comprising the carbide of silicon is formed by a sputtering process.
Claim 10
Dependent Claim
18 words
The method according to claim 6 wherein the treatment under the oxidizing atmosphere is an oxygen plasma treatment.
Claim 11
Dependent Claim
150 words
A method for preparing a laminate described in claim 2 which comprises a step of depositing at least one metal selected from the group consisting of magnesium, iron, cobalt, nickel, and copper on at least one surface of a polymeric molded article, and then treating it under an oxidizing atmosphere, whereby said at least one surface becomes a metal oxide treated surface wherein the amount of metal oxide deposited on the surface of the polymeric molded article is in the range of 5×10 14 atoms/cm 2 to 3×10 16 atoms/cm 2 in terms of the amount of the metal atoms per unit area that has been surface treated, and a step of forming a gas barrier layer constituted of any of a layer mainly comprising an oxide of silicon, a layer mainly comprising a nitride of silicon or a layer mainly comprising a carbide of silicon on the treated surface.
Claim 12
Dependent Claim
27 words
The method according to claim 10 wherein the any one of the layer mainly comprising the oxide of silicon, the layer mainly comprising the nitride of silicon.
Claim 13
Dependent Claim
42 words
The method according to claim 10 wherein the any one of the layer mainly comprising the oxide of silicon, the layer mainly comprising the nitride of silicon or the layer mainly comprising the carbide of silicon is formed by a sputtering process.
Claim 14
Dependent Claim
18 words
The method according to claim 10 wherein the treatment under the oxidizing atmosphere is an oxygen plasma treatment.
Claim 15
Dependent Claim
155 words
A method for preparing a laminate described in claim 1 which comprises a step of depositing at least one metal selected from the group consisting of metals in groups 2, 8, 9, 10 and 11 of the periodic table on at least one surface of a polymeric molded article, and then treating it under an oxidizing atmosphere, whereby said at least one surface becomes a metal oxide treated surface wherein the amount of metal oxide deposited on the surface of the polymeric molded article is in the range of 5×10 14 atoms/cm 2 to 3×10 16 atoms/cm 2 in terms of the amount of the metal atoms per unit that has been treated, and a step of forming a gas barrier layer constituted of any of a layer mainly comprising an oxide of silicon, a layer mainly comprising a nitride of silicon or a layer mainly comprising a carbide of silicon on the treated surface.
Claim 16
Dependent Claim
48 words
The method according to claim 14 wherein the any one of the layer mainly comprising the oxide of silicon, the layer mainly comprising the nitride of silicon or the layer mainly comprising the carbide of silicon is formed by a plasma CVD method of an organic silicon compound.
Claim 17
Dependent Claim
42 words
The method according to claim 14 wherein the any one of the layer mainly comprising the oxide of silicon, the layer mainly comprising the nitride of silicon or the layer mainly comprising the carbide of silicon is formed by a sputtering process.
Claim 18
Dependent Claim
18 words
The method according to claim 14 wherein the treatment under the oxidizing atmosphere is an oxygen plasma treatment.