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light emitting semiconductor device and its manufacturing method

Assignee: NEC Corp
•
Filing: 1996-06-21
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Granted: 1998-09-29
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Expires: 2016-06-21
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Abstract

Abstract The present invention discloses a highly bright short wavelength light emitting semiconductor device with high reliance having improved crystallinity and surface smoothness. The device comprises at least one layer of In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) formed on a sapphire substrate or a Si substrate, wherein a ZnO buffer layer (2) which can lattice match In x Ga y Al 1-x-y N is formed on the substrate (1) and a manufacturing method thereof.

Inventors

  • 👤 Yuji Furushima

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 19:16
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/01; H10H20/011; H10H20/013; H10H20/0133; H10H20/01335

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 42 words
A light emitting semiconductor device comprising a sapphire substrate having a ZnO buffer layer formed on a surface of said sapphire substrate, and a layer of In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) formed on said ZnO buffer layer.
Claim 2
Dependent Claim 42 words
A light emitting semiconductor device comprising a sapphire substrate having a ZnO buffer layer formed on a surface of said sapphire substrate, and a layer of In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) formed on said ZnO buffer layer.
Claim 3
Dependent Claim 25 words
The light emitting semiconductor device according to claim 1 wherein said ZnO buffer layer is epitaxially formed on a (0001) surface of said sapphire substrate.
Claim 4
Dependent Claim 43 words
The light emitting semiconductor device according to claim 1, wherein an In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) epitaxial buffer layer grown at a temperature less than or equal to 1000° C. is formed directly on said ZnO buffer layer.
Claim 5
Dependent Claim 51 words
The light emitting semiconductor device according to claim 1, wherein an In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) epitaxial buffer layer is formed directly on said ZnO buffer layer, said In x Ga y Al 1-x-y N epitaxial buffer layer having a thickness of 5 to 200 nm.
Claim 6
Dependent Claim 44 words
The light emitting semiconductor device according to claim 1, wherein an In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) epitaxial buffer layer is formed directly on said ZnO buffer layer, said ZnO buffer layer having a thickness of 10 to 500 nm.
Claim 7
Dependent Claim 63 words
A light emitting semiconductor device comprising a Si substrate having a (0001) ZnO buffer layer formed on a (111) surface of said Si substrate, and a layer of In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) formed on said ZnO buffer layer, wherein said ZnO buffer layer is in lattice match with said In x Ga y Al 1-x-y N layer.
Claim 8
Dependent Claim 63 words
A light emitting semiconductor device comprising a Si substrate having a (0001) ZnO buffer layer formed on a (111) surface of said Si substrate, and a layer of In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) formed on said ZnO buffer layer, wherein said ZnO buffer layer is in lattice match with said In x Ga y Al 1-x-y N layer.
Claim 9
Dependent Claim 43 words
The light emitting semiconductor device according to claim 6, wherein an In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) epitaxial buffer layer grown at a temperature less than or equal to 1000° C. is formed directly on said ZnO buffer layer.
Claim 10
Dependent Claim 51 words
The light emitting semiconductor device according to claim 6, wherein an In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y≦1) epitaxial buffer layer is formed directly on said ZnO buffer layer, said In x Ga y Al 1-x-y N epitaxial buffer layer having a thickness of 5 to 200 nm.
Claim 11
Dependent Claim 44 words
The light emitting semiconductor device according to claim 6, wherein an In x Ga y Al 1-x-y N (where, 0≦x≦1, 0≦x+y<1) epitaxial buffer layer is formed directly on said ZnO buffer layer, said ZnO buffer layer having a thickness of 10 to 500 nm.

References Cited (Backward Citations)

JPH02229476A Cited
JPH04209577A Cited
JPH04236478A Cited
JPH04297023A Cited
JPH05283744A Cited
US5602418A Cited
US5604763A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-09-28 2002-03-30 2002-09-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-09-28 2006-03-30 2006-09-29 $3760.00 Window Closed / Lapsed
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