Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
100 words
A capacitor comprising: a lower electrode; a first insulating film disposed on the lower electrode and comprising a silicon nitride film having an etching rate; a second insulating film disposed on the first insulating film and comprising a second silicon nitride film having an etching rate higher than the etching rate of the first insulating film, the second insulating film having an opening exposing a portion of the first insulating film on the lower electrode; and an upper electrode disposed on the first insulating film in the opening in the second insulating film and extending on the second insulating film.
Claim 2
Dependent Claim
100 words
A capacitor comprising: a lower electrode; a first insulating film disposed on the lower electrode and comprising a silicon nitride film having an etching rate; a second insulating film disposed on the first insulating film and comprising a second silicon nitride film having an etching rate higher than the etching rate of the first insulating film, the second insulating film having an opening exposing a portion of the first insulating film on the lower electrode; and an upper electrode disposed on the first insulating film in the opening in the second insulating film and extending on the second insulating film.
Claim 3
Dependent Claim
18 words
The capacitor of claim 1 wherein the second insulating film contains more hydrogen than the first insulating film.
Claim 4
Dependent Claim
20 words
The capacitor of claim 1 comprising a wiring layer disposed on the upper electrode and electrically contacting the upper electrode.
Claim 5
Dependent Claim
112 words
A capacitor comprising: a lower electrode; a first insulating film disposed on the lower electrode; a second insulating film disposed on the first insulating film and having a first opening exposing a portion of the first insulating film on the lower electrode, the first opening having a perimeter; a third insulating film disposed on the second insulating film and having a second opening exposing a portion of the second insulating film, the second opening having a second perimeter that surrounds the perimeter of the first opening on the second insulating film; and an upper electrode disposed on the first insulating film in the first opening and extending onto the second insulating film.
Claim 6
Dependent Claim
112 words
A capacitor comprising: a lower electrode; a first insulating film disposed on the lower electrode; a second insulating film disposed on the first insulating film and having a first opening exposing a portion of the first insulating film on the lower electrode, the first opening having a perimeter; a third insulating film disposed on the second insulating film and having a second opening exposing a portion of the second insulating film, the second opening having a second perimeter that surrounds the perimeter of the first opening on the second insulating film; and an upper electrode disposed on the first insulating film in the first opening and extending onto the second insulating film.
Claim 7
Dependent Claim
32 words
The capacitor of claim 1 wherein said second perimeter of the second opening in the third insulating film is larger than the perimeter of the first opening in the second insulating film.
Claim 8
Dependent Claim
52 words
The capacitor of claim 4 wherein the first insulating film is a silicon nitride film having a silicon to nitrogen composition ratio of 3:4, the second insulating film is a second silicon nitride film having a high proportion of silicon than nitrogen, and the third insulating film is a silicon oxide film.
Claim 9
Dependent Claim
25 words
The capacitor of claim 4 wherein the etching rate of the third insulating film is higher than the etching rate of the second insulating film.
Claim 10
Dependent Claim
20 words
The capacitor of claim 4 comprising a wiring layer disposed on the upper electrode and electrically contacting the upper electrode.