US5801954A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for designing and checking a mask layout
Assignee: Micron Technology Inc
•
Filing: 1996-04-24
•
Granted: 1998-09-01
•
Expires: 2016-04-24
Abstract
Abstract A process for designing and checking a mask layout is provided. A mask layout is generated from a binary mask layout design. An aerial image of the mask layout is then calculated using simulation software. The simulated aerial image is then compared to the binary mask layout design and modifications are made to the mask layout if necessary.
Inventors
- 👤 Chin Aik Le
- 👤 Christophe Pierrat
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 01:44
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G06; G06F; G06F30/00; G06F30/30; G06F30/39; G06F30/398; G01; G01N; G01N21/00; G01N21/84; G01N21/88; G01N21/95; G01N21/956; G01N2021/95676
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
60 words
A process for checking a mask layout comprising: obtaining a binary mask layout design; generating a phase shifting mask layout having multiple layers that are printed using a voting technique to correspond to said binary mask layout design; calculating an aerial image of said mask layout using simulation software; and comparing said aerial image to said binary mask layout design.
Claim 2
Dependent Claim
60 words
A process for checking a mask layout comprising: obtaining a binary mask layout design; generating a phase shifting mask layout having multiple layers that are printed using a voting technique to correspond to said binary mask layout design; calculating an aerial image of said mask layout using simulation software; and comparing said aerial image to said binary mask layout design.
Claim 3
Dependent Claim
31 words
A process for checking a mask layout as defined in claim 1 wherein said aerial image is calculated and compared at both best focus and best focus ± a focus margin.
Claim 4
Dependent Claim
29 words
A process for checking a mask layout as defined in claim 1 wherein said aerial image is compared to said binary mask layout design using a design rule checker.
Claim 5
Dependent Claim
47 words
A process for checking a mask layout as defined in claim 1 further comprising generating a modified mask layout to correspond to said binary mask layout design if said comparison of said aerial image to said binary mask layout design does not fall with predetermined design rules.
Claim 6
Dependent Claim
99 words
A process for designing a mask layout comprising: obtaining a binary mask layout design; generating a phase shifting mask layout having multiple layers that are printed using a voting technique to correspond to said binary mask layout design; calculating an aerial image of said mask layout using simulation software; comparing said aerial image to said binary mask layout design using a design rule checker; and modifying said mask layout to more closely correspond to said binary mask layout design if said comparison of said aerial image to said binary mask layout design does not fall within predetermined design rules.
Claim 7
Dependent Claim
99 words
A process for designing a mask layout comprising: obtaining a binary mask layout design; generating a phase shifting mask layout having multiple layers that are printed using a voting technique to correspond to said binary mask layout design; calculating an aerial image of said mask layout using simulation software; comparing said aerial image to said binary mask layout design using a design rule checker; and modifying said mask layout to more closely correspond to said binary mask layout design if said comparison of said aerial image to said binary mask layout design does not fall within predetermined design rules.
Claim 8
Dependent Claim
31 words
A process for designing a mask layout as defined in claim 5 wherein said aerial image is calculated and compared at both best focus and best focus ± a focus margin.
References Cited (Backward Citations)
US5046109A
Cited
JPH02140743A
Cited
US5572598A
Cited
US5442714A
Cited
US5326659A
Cited
US5379348A
Cited
US5481624A
Cited
US5441834A
Cited
US5308722A
Cited
US5376483A
Cited
US5686208A
Cited
US5695896A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-08-31 | 2002-03-02 | 2002-09-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-08-31 | 2006-03-02 | 2006-09-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-08-31 | 2010-03-02 | 2010-09-01 | $7700.00 | Window Closed / Lapsed |