Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
196 words
A light emitting device comprising: (a) a conductive sapphire substrate having a resistivity of less than 1 Ω-cm; (b) a buffer layer formed of a first conductivity type In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.5, 0.5≦y≦1, x+y≦1 formed on the top surface of said conductive sapphire substrate; (c) a first cladding layer formed of said first conductivity type In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.3, 0.1≦y≦1.0 and x+y≦1 formed on said buffer layer; (d) an active layer formed of substantially intrinsic In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.6, 0≦y≦0.5, and x+y≦1 formed on said first cladding layer; (e) a second cladding layer formed of a second conductivity type In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.3, 0.1≦y≦1.0 and x+y≦1 formed on said active layer, said second conductivity type being opposite to said first conductivity type; (f) a transparent electrode layer formed on said second cladding layer; (g) a metal electrode layer formed beneath the bottom surface of said conductive sapphire substrate.
Claim 2
Dependent Claim
196 words
A light emitting device comprising: (a) a conductive sapphire substrate having a resistivity of less than 1 Ω-cm; (b) a buffer layer formed of a first conductivity type In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.5, 0.5≦y≦1, x+y≦1 formed on the top surface of said conductive sapphire substrate; (c) a first cladding layer formed of said first conductivity type In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.3, 0.1≦y≦1.0 and x+y≦1 formed on said buffer layer; (d) an active layer formed of substantially intrinsic In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.6, 0≦y≦0.5, and x+y≦1 formed on said first cladding layer; (e) a second cladding layer formed of a second conductivity type In x Al y Ga 1-x-y N having mole fraction values x, y selected as 0≦x≦0.3, 0.1≦y≦1.0 and x+y≦1 formed on said active layer, said second conductivity type being opposite to said first conductivity type; (f) a transparent electrode layer formed on said second cladding layer; (g) a metal electrode layer formed beneath the bottom surface of said conductive sapphire substrate.
Claim 3
Dependent Claim
29 words
The device of claim 1, wherein said conductive sapphire substrate is doped with at least an impurity selected from the group consisting of C, Si, Ge, Sn and Pb.
Claim 4
Dependent Claim
32 words
The device of claim 1, further comprising: a contact layer formed of a second conductivity type In x Al y Ga 1-x-y N layer (0.5≦x≦1.0, 0.0≦y≦0.1) formed on said second cladding layer.
Claim 5
Dependent Claim
31 words
The device of claim 1, further comprising: a contact layer formed of a first conductivity type In x Al y Ga 1-x-y N layer (0.5≦x≦1.0, 0.0≦y≦0.1) formed beneath said conductive substrate.
Claim 6
Dependent Claim
20 words
The device of claim 2, wherein said impurity is an element doped during epitaxial growth of the conductive sapphire substrate.
Claim 7
Dependent Claim
14 words
The device of claim 1, wherein said transparent electrode layer is an ITO film.
Claim 8
Dependent Claim
15 words
The device of claim 1, wherein said transparent electrode layer is a thin metal film.
Claim 9
Dependent Claim
34 words
The device of claim 6, further comprising: a contact layer formed of a second conductivity type In x Al y Ga 1-x-y N layer formed between said second cladding layer and said ITO film.
Claim 10
Dependent Claim
35 words
The device of claim 7, further comprising: a contact layer formed of a second conductivity type In x Al y Ga 1-x-y N layer formed between said second cladding layer and said thin metal film.
Claim 11
Dependent Claim
17 words
The device of claim 1, wherein said buffer layer is metallurgically contacted with said conductive sapphire substrate.
Claim 12
Dependent Claim
33 words
The device of claim 1, wherein said conductive sapphire substrate is doped with at least an impurity selected from the group consisting of Be, Mg, Ca, Sr, Ba, Ra, Zn, Cd and Hg.
Claim 13
Dependent Claim
18 words
The device of claim 11, wherein the conductive sapphire substrate is doped with said impurity during epitaxial growth.
Claim 14
Dependent Claim
51 words
The device of claim 1, wherein respective mole fraction values x, y in said In x Al y Ga 1-x-y N are selected as 0<x≦0.5, 0.5≦y≦1 in said buffer layer, 0<x≦0.3, 0.1≦y≦1 in said first cladding layer, 0<x≦0.6, 0≦y≦0.5 in said active layer, and 0<x≦0.3, 0.1≦y≦1.0 in said second cladding layer.