US5798005A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Titanium target for sputtering and production method for same
Assignee: Proterial Ltd
•
Filing: 1996-03-29
•
Granted: 1998-08-25
•
Expires: 2016-03-29
Abstract
Abstract Provided are a titanium target material which can easily form a film in a narrow and deep contact hole and reduce the generation of PARTICLES. The present invention relates to a titanium target for sputtering, wherein X-ray diffraction intensity ratios on a sputtering plane are (0002)/(1011)≧0.8, (0002)/(1010)≧6; a recrystallized structure which has an average crystal grain size of 20 μm or less and in which the proportion of crystal grains in which an acicular structure is present is 20% or less in terms of an area rate is formed.
Inventors
- 👤 Hideo Murata
- 👤 Shigeru Taniguchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 03:49
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3414; H01J37/3426; C23C14/3407; C23C14/3414
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
37 words
A titanium target for sputtering, wherein X-ray diffraction intensity ratios on a sputtering plane of the target are (0002)/(1011)≧0.8 and (0002)/(1010)≧6, and having a recrystallized structure having an average crystal grain size of 20 μm or less.
Claim 2
Dependent Claim
37 words
A titanium target for sputtering, wherein X-ray diffraction intensity ratios on a sputtering plane of the target are (0002)/(1011)≧0.8 and (0002)/(1010)≧6, and having a recrystallized structure having an average crystal grain size of 20 μm or less.
Claim 3
Dependent Claim
16 words
A titanium target according to claim 1, wherein an oxygen concentration is 600 ppm or less.
Claim 4
Dependent Claim
25 words
A titanium target according to claim 1, wherein the crystal grain size of the recrystallized structure falls in a range of 3 to 15 μm.
Claim 5
Dependent Claim
16 words
A titanium target according to claim 3, wherein an oxygen concentration is 600 ppm or less.
Claim 6
Dependent Claim
70 words
A titanium target for sputtering, wherein crystal orientations on a sputtering plane of the target by X-ray diffraction are (0002)/(1011)≧0.8 and (0002)/(1010)≧6 in terms of an X-ray diffraction intensity ratio; a recrystallized structure of the target has an average crystal grain size of 20 μm or less; and the proportion of crystal grains in which an acicular structure is present is 20% or less in terms of an area ratio.
Claim 7
Dependent Claim
70 words
A titanium target for sputtering, wherein crystal orientations on a sputtering plane of the target by X-ray diffraction are (0002)/(1011)≧0.8 and (0002)/(1010)≧6 in terms of an X-ray diffraction intensity ratio; a recrystallized structure of the target has an average crystal grain size of 20 μm or less; and the proportion of crystal grains in which an acicular structure is present is 20% or less in terms of an area ratio.
Claim 8
Dependent Claim
16 words
A titanium target according to claim 5, wherein an oxygen concentration is 600 ppm or less.
Claim 9
Dependent Claim
25 words
A titanium target according to claim 5, wherein the crystal grain size of the recrystallized structure falls in a range of 3 to 15 μm.
Claim 10
Dependent Claim
16 words
A titanium target according to claim 7, wherein an oxygen concentration is 600 ppm or less.
Claim 11
Dependent Claim
83 words
A method for producing the titanium target for sputtering as claimed in claim 1, comprising: subjecting a plate titanium material to cold working at a working rate of 75% or more in terms of integration, and then heating the titanium material at temperatures of 300° to 480° C. to orient the X-ray diffraction intensity ratios on a sputtering plane of the target to (0002)/(1011)≧0.8 and (0002)/(1010)≧6, wherein a recrystallized structure having an average crystal grain size of 20 μm or less is formed.
References Cited (Backward Citations)
US4793854A
Cited
US4891066A
Cited
US4793854B1
Cited
US4678506A
Cited
EP0408383A1
Cited
US5204057A
Cited
US5196916A
Cited
JPH05214521A
Cited
JPH0610107A
Cited
JPH06280009A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-08-24 | 2002-02-23 | 2002-08-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-08-24 | 2006-02-23 | 2006-08-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-08-24 | 2010-02-23 | 2010-08-25 | $7700.00 | Window Closed / Lapsed |