Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
77 words
A microelectronics fabrication facility comprising: a central hub; a plurality of processing areas which radiate outwardly from said central hub; at least some of said processing areas having multiple microelectronic device processing tools; a hub building placed over the central hub and a processing area building placed over each of said plurality of processing areas, wherein said buildings are capable of human habitation; and wherein spaces located between adjacent processing areas are not enclosed by any building.
Claim 2
Dependent Claim
77 words
A microelectronics fabrication facility comprising: a central hub; a plurality of processing areas which radiate outwardly from said central hub; at least some of said processing areas having multiple microelectronic device processing tools; a hub building placed over the central hub and a processing area building placed over each of said plurality of processing areas, wherein said buildings are capable of human habitation; and wherein spaces located between adjacent processing areas are not enclosed by any building.
Claim 3
Dependent Claim
39 words
The facility of claim 1 wherein: at least some of said processing areas with said multiple microelectronic device processing tools can perform at least one of the processes of chemical vapor deposition, ion implantation, sputtering, etching, diffusion, and lithography.
Claim 4
Dependent Claim
21 words
The facility of claim 2 wherein: each processing area has said multiple microelectronic device processing tools which perform only one process.
Claim 5
Dependent Claim
23 words
The facility of claim 1 wherein: the processing areas radiate outwardly from the central hub in the configuration of a plurality of spokes.
Claim 6
Dependent Claim
16 words
The facility of claim 1 wherein: adjacent said processing areas are not parallel to each other.
Claim 7
Dependent Claim
27 words
The facility of claim 1 wherein: the capacity of the facility can be increased by adding on to one or more of said plurality of processing areas.
Claim 8
Dependent Claim
49 words
The facility of claim 1 wherein: each processing area has a proximal end and a distal end, with the proximal end placed adjacent to the central hub, and the capacity of said facility can be increased by adding on to the distal end of at least one processing area.
Claim 9
Dependent Claim
19 words
The facility of claim 1 wherein: at least some said processing areas which use common services are arranged together.
Claim 10
Dependent Claim
49 words
The facility of claim 1 wherein said multiple microelectronic device processing tools extend from the central hub to a point located distally from the central hub, and the capacity of the facility can be increased by adding new processing tools at the point located distally from the central hub.
Claim 11
Dependent Claim
34 words
The facility of claim 1 including: an automation stocker which is adapted to transport work pieces from the central hub along the processing area, back to the central hub and along another processing area.
Claim 12
Independent Claim
171 words
A method of fabricating a microelectronic device comprising the steps of: first processing a work piece with a first process in a first processing area, which processing area radiates outwardly from a central hub, wherein the processing area is covered by a first housing connected to a hub housing which covers the central hub, and wherein the first processing area has multiple microelectronic device processing tools; first transporting the work piece along the first processing area to said central hub; second transporting the work piece from the central hub and along a second processing area for processing the work piece in a second process, which second processing area radiates outwardly from the central hub, wherein the second processing area is covered by a second housing connected to said hub housing which said second housing is spaced from said first housing, wherein said buildings are capable of human habitation, and wherein said second processing area has multiple microelectronic device processing tools; and second processing the work piece in the second processing area.
Claim 13
Independent Claim
171 words
A method of fabricating a microelectronic device comprising the steps of: first processing a work piece with a first process in a first processing area, which processing area radiates outwardly from a central hub, wherein the processing area is covered by a first housing connected to a hub housing which covers the central hub, and wherein the first processing area has multiple microelectronic device processing tools; first transporting the work piece along the first processing area to said central hub; second transporting the work piece from the central hub and along a second processing area for processing the work piece in a second process, which second processing area radiates outwardly from the central hub, wherein the second processing area is covered by a second housing connected to said hub housing which said second housing is spaced from said first housing, wherein said buildings are capable of human habitation, and wherein said second processing area has multiple microelectronic device processing tools; and second processing the work piece in the second processing area.
Claim 14
Dependent Claim
47 words
The method of claim 11 including: said step of first transporting said work piece to said central hub occurs along a path which is generally non-parallel to a path along which the step of second transporting said work piece from the central hub to said second process.
Claim 15
Dependent Claim
32 words
The method of claim 11 including: said step of first transporting and said step of second transporting occur along first and second processing areas which are elongated and non-parallel to each other.
Claim 16
Dependent Claim
70 words
The method of claim 11 including: in said first processing area the first process is selected from the group consisting of chemical vapor deposition, ion implantation, sputtering, etching, diffusion, and lithography; and in said second processing area the second process is different from the first process performed in the first processing area and is selected from the group consisting of chemical vapor deposition, ion implantation, sputtering, etching, diffusion, and lithography.
Claim 17
Independent Claim
95 words
A method of constructing a microelectronics fabrication facility including the steps of: constructing a central hub with a hub building enclosing said central hub; and constructing a plurality of processing areas radiating outwardly from the central hub, each of said processing area having another building enclosing each said processing area, which another building is connected to said hub building, wherein said buildings are capable of human habitation, and at least some of said processing area having multiple microelectronic device processing tools; and wherein spaces located between the processing areas are not enclosed by any building.
Claim 18
Independent Claim
95 words
A method of constructing a microelectronics fabrication facility including the steps of: constructing a central hub with a hub building enclosing said central hub; and constructing a plurality of processing areas radiating outwardly from the central hub, each of said processing area having another building enclosing each said processing area, which another building is connected to said hub building, wherein said buildings are capable of human habitation, and at least some of said processing area having multiple microelectronic device processing tools; and wherein spaces located between the processing areas are not enclosed by any building.
Claim 19
Dependent Claim
45 words
The method of claim 15 including the step of: installing in at least some of said processing areas multiple microelectronic devices processing tools selected from the group consisting of chemical vapor deposition tools, ion implantation tools, sputtering tools, etching tools, diffusion tools, and lithography tools.
Claim 20
Dependent Claim
55 words
The method of claim 15 wherein each processing area has a proximal end located adjacent to the central hub and a distal end and the capacity of the microelectronics fabrication facility can be increased by the step of: adding additional processing equipment outwardly of the distal end of at least one of the processing areas.
Claim 21
Dependent Claim
39 words
The method of claim 15 including: constructing an automated stocker to transport a work piece from the central hub, along a processing area and back to the central hub, and then transporting the work piece to another processing area.
Claim 22
Dependent Claim
15 words
The method of claim 15 including: providing emergency exits for personnel along the processing areas.
Claim 23
Dependent Claim
53 words
The method of claim 15 wherein said processing areas are elongated and have elongated walls extending outwardly from said central hub, the method including: modifying the facility by installing additional processing equipment by moving the additional processing equipment through an opening in one of the elongated walls in one of the processing areas.
Claim 24
Dependent Claim
18 words
The facility of claim 1 including: emergency exits for personnel located along walls of said processing area building.
Claim 25
Dependent Claim
21 words
The facility of claim 1 wherein: said central hub is in the shape of one of a circle, and a polygon.
Claim 26
Dependent Claim
22 words
The method of claim 15 including the step of: constructing a central hub in the shape of a circle, and a polygon.