US4985722A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for coating a photo-resist film and/or developing it after being exposed
Assignee: Tokyo Electron Ltd
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Filing: 1989-02-10
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Granted: 1991-01-15
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Expires: 2009-02-10
Abstract
Abstract An apparatus is disclosed which forms a photo-resist film on a substrate surface and/or develops it. A passage provided such that it extends in a predetermined direction to allow conveying of a substrate having a surface on which a photoresist film is to be formed or a substrate having a photo-resist film to be developed, a plurality of treating units necessary for forming a photo-resist film and/or a plurality of treating units necessary for developing the photo-resist film, these units being provided along the passage, conveying means movable along a predetermined course for conveying the substrate in a predetermined direction, substrate handling means provided on the conveying means for holding a substrate and for setting a substrate into the treating unit, said substrate handling means being movable and rotatable in any direction, and control means for selecting said plurality of treating units in any combination and for controlling operations of the conveying means and substrate handling means so that the substrate undergoes predetermined treatments at the selected units in any sequence.
Inventors
- 👤 Mitsuru Ushijima
- 👤 Masami Akimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 22:23
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/34; H10P72/3402; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70733; G03F7/7075; B; B29; B29C; B29C31/00; G03F7/16; G03F7/162; G03F7/26; G03F7/30; G03F7/3021; H10P72/04; H10P72/0451; H10P72/0452; H10P72/0456; H10P72/0458; H10P72/33; H10P72/3302; Y; Y10; Y10S; Y10S134/00; Y10S134/902; Y10S414/00; Y10S414/135; Y10S414/136
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
173 words
A photo-resist processing apparatus comprising: a passage provided such that it extends in a predetermined direction to allow conveyance of a substrate to be treated; a plurality of treating units necessary for photo-resist processing, these units being provided along said passage; at least one conveying means for conveying the substrate along said passage in a selective manner according to a predetermined program; at least two handling means provided on said at least one conveying means for loading the substrate into the treating unit and for unloading the substrate from the treating unit, said at least two handling means being transferred together along said passage by said at least one conveying means and being movable independently of each other on said at least one conveying means for handling the substrate; controlling means for selecting said plurality of treating units in any combination and for controlling operations of said at least one conveying means and said at least two handling means so that the substrate undergoes predetermined treatments at the selected units in any sequence.
Claim 2
Dependent Claim
173 words
A photo-resist processing apparatus comprising: a passage provided such that it extends in a predetermined direction to allow conveyance of a substrate to be treated; a plurality of treating units necessary for photo-resist processing, these units being provided along said passage; at least one conveying means for conveying the substrate along said passage in a selective manner according to a predetermined program; at least two handling means provided on said at least one conveying means for loading the substrate into the treating unit and for unloading the substrate from the treating unit, said at least two handling means being transferred together along said passage by said at least one conveying means and being movable independently of each other on said at least one conveying means for handling the substrate; controlling means for selecting said plurality of treating units in any combination and for controlling operations of said at least one conveying means and said at least two handling means so that the substrate undergoes predetermined treatments at the selected units in any sequence.
Claim 3
Dependent Claim
27 words
The apparatus according to claim 1, wherein said plurality of treating units are provided at each side of said passage, in a face-to-face relation across the passage.
Claim 4
Dependent Claim
13 words
The apparatus according to claim 1, wherein said handling means are vacuum-suction tweezers.
Claim 5
Dependent Claim
21 words
The apparatus according to claim 1, wherein, of said plurality of treating units, at least two are provided one over another.
Claim 6
Dependent Claim
58 words
The apparatus according to claim 1, further comprising a loading/unloading mechanism for picking up substrates one by one from a cassette holding a plurality of substrates to be treated and delivering it to the handling means and for receiving a substrate which has undergone all treatments from said handling means and storing it into a substrate holding cassette.
Claim 7
Dependent Claim
34 words
The apparatus according to claim 1, wherein the treating units comprise a unit for applying a photoresist solution, a unit for applying developing solution, a heating unit, a waiting unit and a cassette unit.
Claim 8
Dependent Claim
30 words
The apparatus according to claim 1, wherein the substrate is held on one of said at least two handling means while being conveyed by said at least one conveying means.
Claim 9
Dependent Claim
18 words
The apparatus according to claim 1 wherein the number of said at least two handling means is two.
Claim 10
Dependent Claim
18 words
The apparatus according to claim 1, wherein the number of said at least one conveying means is one.
Claim 11
Dependent Claim
36 words
The apparatus according to claim 8, wherein said at least two handling means are two pairs of tweezers which are arranged one at the upper side and one at the lower side in an overlapping fashion.
Claim 12
Dependent Claim
157 words
A photo-resist processing apparatus comprising: a passage provided such that it extends in a predetermined direction to allow conveying of a substrate to be treated; a plurality of treating units necessary for photo-resist processing, these units being provided along the passage; conveying means for conveying the substrate along the passage in a selective manner according to a predetermined program; at least two handling means each employing vacuum suction tweezers, provided on said conveying means for loading the substrate into the treating unit and for unloading the substrate from the treating unit, with one of said handling means loading the substrate into a certain treating unit, when the other handling means unloads the substrate from the same treatment unit; controlling means for selectively controlling said plurality of treating units in any combination and for controlling operations of the conveying means and the handling means such that the substrate undergoes predetermined treatments at the selected units in any sequence.
Claim 13
Dependent Claim
157 words
A photo-resist processing apparatus comprising: a passage provided such that it extends in a predetermined direction to allow conveying of a substrate to be treated; a plurality of treating units necessary for photo-resist processing, these units being provided along the passage; conveying means for conveying the substrate along the passage in a selective manner according to a predetermined program; at least two handling means each employing vacuum suction tweezers, provided on said conveying means for loading the substrate into the treating unit and for unloading the substrate from the treating unit, with one of said handling means loading the substrate into a certain treating unit, when the other handling means unloads the substrate from the same treatment unit; controlling means for selectively controlling said plurality of treating units in any combination and for controlling operations of the conveying means and the handling means such that the substrate undergoes predetermined treatments at the selected units in any sequence.
References Cited (Backward Citations)
US4764076A
Cited
US4917556A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-01-14 | 1994-07-16 | 1995-01-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-14 | 1998-07-16 | 1999-01-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-14 | 2002-07-16 | 2003-01-15 | $7700.00 | Window Closed / Lapsed |