Back-biasing in asymmetric MOS devices

Claim 2

An asymmetric MOS device provided in a semiconductor substrate and having an adjustable threshold voltage, the MOS device comprising: a bulk region of a first conductivity type, the bulk region having a concentration of dopant atoms of the first conductivity type; source and drain regions positioned within said bulk region and separated by a channel region, the source and drain regions being of a second conductivity type; a gate positioned over the channel region; a pocket region of the first conductivity type, the pocket region abutting one of said source or drain regions and proximate said channel region, the pocket region also having a concentration of dopant atoms of the first conductivity type which concentration is greater than the bulk region's concentration of dopant atoms and the channel region's concentration of dopant atoms; and a tie electrically connecting the pocket region to a conductive line, whereby the device's threshold voltage can be adjusted by applying a potential to the conductive line to adjust the pocket region's potential.

Claim 3

The asymmetric MOS device of claim 1 wherein the MOS device has an on current and an off current, and wherein the ratio of on current to off current in the MOS device is not greater than about 10 5 .

Claim 4

The asymmetric MOS device of claim 2 wherein the device has a gate threshold voltage of at most about±150 mV.

Claim 5

The asymmetric MOS device of claim 1 wherein the pocket region extends into a portion of the channel region.

Claim 6

The asymmetric MOS device of claim 4 wherein the portion of the channel region outside the pocket region has a concentration of dopant atoms of the first conductivity type of at most about 1×10 16 cm -3 .

Claim 7

The asymmetric MOS device of claim 5 wherein the concentration of dopant atoms of the first conductivity type in the channel region outside the pocket region is between about 1×10 14 and 1×10 16 cm -3 .

Claim 8

The asymmetric MOS device of claim 1 wherein the channel region includes counterdopant of the second conductivity type.

Claim 9

The asymmetric MOS device of claim 7 wherein the counterdopant is provided in a concentration of between about 10 16 and 10 18 cm -3 .

Claim 10

The asymmetric MOS device of claim 7 wherein at least a portion of the channel region is of the second conductivity type.

Claim 11

The asymmetric MOS device of claim 1 wherein the dopant concentration in the pocket region is at least about 1×10 16 cm -3 .

Claim 12

The asymmetric MOS device of claim 10 wherein the dopant concentration in the pocket region is between about 1×10 17 and 1×10 18 cm -3 .

Claim 13

The asymmetric MOS device of claim 1 wherein said pocket region is located under at least part of one of said source and drain regions, and said pocket region does not extend into or under said channel region.

Claim 14

The asymmetric MOS device of claim 1 wherein said pocket region is located under at least part of one of said source and drain regions, and said pocket region extends under a part of said channel region adjacent said source or drain region.

Claim 15

A connected group of asymmetric MOS devices provided in a semiconductor substrate and having adjustable threshold voltages, the connected group comprising: (a) a plurality of asymmetric MOS devices, each including: a bulk region of a first conductivity type, the bulk region having a concentration of dopant atoms of the first conductivity type, source and drain regions positioned within said bulk region and separated by a channel region, the source and drain regions being of a second conductivity type, a gate positioned over the channel region, and a pocket region of the first conductivity type, the pocket region abutting one of said source or drain regions and proximate said channel region, the pocket region also having a concentration of dopant atoms of the first conductivity type which concentration is greater than the bulk region's concentration of dopant atoms; and (b) a conductive path of the first conductivity type electrically connecting pocket regions of each asymmetric MOS device in the connected group, whereby the devices' threshold voltages can be simultaneously adjusted by applying a potential to the conductive path to adjust the pocket regions' potentials.

Claim 16

A connected group of asymmetric MOS devices provided in a semiconductor substrate and having adjustable threshold voltages, the connected group comprising: (a) a plurality of asymmetric MOS devices, each including: a bulk region of a first conductivity type, the bulk region having a concentration of dopant atoms of the first conductivity type, source and drain regions positioned within said bulk region and separated by a channel region, the source and drain regions being of a second conductivity type, a gate positioned over the channel region, and a pocket region of the first conductivity type, the pocket region abutting one of said source or drain regions and proximate said channel region, the pocket region also having a concentration of dopant atoms of the first conductivity type which concentration is greater than the bulk region's concentration of dopant atoms; and (b) a conductive path of the first conductivity type electrically connecting pocket regions of each asymmetric MOS device in the connected group, whereby the devices' threshold voltages can be simultaneously adjusted by applying a potential to the conductive path to adjust the pocket regions' potentials.

Claim 17

The connected group of asymmetric MOS devices of claim 14 wherein the conductive path is provided in the semiconductor substrate.

Claim 18

The connected group of asymmetric MOS devices of claim 15 wherein the conductive path has a concentration of dopant atoms of the first conductivity type which concentration is greater than the bulk region's concentration of dopant atoms.

Claim 19

The connected group of asymmetric MOS devices of claim 15 further comprising a tie electrically connecting the conductive path to a conductive line disposed above the pocket region.

Claim 20

The connected group of asymmetric MOS devices of claim 14 wherein each MOS device has an on current and an off current, and wherein the ratio of on current to off current in the MOS devices is not greater than about 10 5 .

Claim 21

The connected group of asymmetric MOS devices of claim 15 wherein the device has a gate threshold voltage of at most about±150 mV.

Claim 22

The connected group of asymmetric MOS devices of claim 14 wherein the pocket region extends into a portion of the channel region.

Claim 23

The connected group of asymmetric MOS devices of claim 14 wherein the channel region includes counterdopant of the second conductivity type.

Claim 24

The connected group of asymmetric MOS devices of claim 21 wherein at least a portion of the channel region is of the second conductivity type.

Claim 25

The asymmetric MOS device of claim 1 further comprising circuitry coupled to said tie, said circuitry configured to independently control potential between said pocket region and said source region, and thereby adjust the threshold voltage of said MOS by back-biasing.