US5747221A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photolithography method and photolithography system for performing the method
Assignee: SK Hynix Inc
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Filing: 1995-10-31
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Granted: 1998-05-05
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Expires: 2015-10-31
Abstract
Abstract A system and method for imaging a wafer in the producation of integrated circuits is disclosed. A plurality of reticles are used between a condenser lens and a projection lens to project integrated circuit mask pattern on a wafer. The transparent area of the mask patterns on the reticles, respectively, are different from each other in order to prevent the decrease of the resolution due to a change in the optical path while light passes through the reticles and the projection lens. Additionally, in at least one position between reticles, there is disposed at least one condenser lens to enhance both the straightness of light and the uniformity of exposure energy of the light.
Inventors
- 👤 Chong-hoe Kim
- 👤 Myong-gun Kil
- 👤 Won-t'aek Kwon
- 👤 Kwang-chol Kim
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 18:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70283
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
186 words
A photolithography method for imaging a wafer in the production of integrated circuits, the method comprising: (a) providing a plurality of reticles each comprising an integrated circuit mask pattern, wherein each of said reticles includes a transparent substrate and an opaque area on said transparent substrate, and said integrated circuit mask patterns on said plurality of reticles are the same with respect to the shape of said integrated circuit mask patterns; (b) providing a projection stepper apparatus which is adapted to receive said reticles and is further adapted to project light through said reticles; (c) inserting said reticles into said stepper apparatus such that said reticles are positioned separately from one another along an optical path; and (d) projecting light through said reticles to project said integrated circuit mask patterns of said reticles onto said wafer to form an image, wherein a scattered portion of light, generated while passing though one of said reticles in the optical path, is filtered out by a subsequent one of said reticles such that an image of said integrated circuit mask pattern is projected onto the wafer with high resolution.
Claim 2
Dependent Claim
186 words
A photolithography method for imaging a wafer in the production of integrated circuits, the method comprising: (a) providing a plurality of reticles each comprising an integrated circuit mask pattern, wherein each of said reticles includes a transparent substrate and an opaque area on said transparent substrate, and said integrated circuit mask patterns on said plurality of reticles are the same with respect to the shape of said integrated circuit mask patterns; (b) providing a projection stepper apparatus which is adapted to receive said reticles and is further adapted to project light through said reticles; (c) inserting said reticles into said stepper apparatus such that said reticles are positioned separately from one another along an optical path; and (d) projecting light through said reticles to project said integrated circuit mask patterns of said reticles onto said wafer to form an image, wherein a scattered portion of light, generated while passing though one of said reticles in the optical path, is filtered out by a subsequent one of said reticles such that an image of said integrated circuit mask pattern is projected onto the wafer with high resolution.
Claim 3
Dependent Claim
37 words
The photolithography method for imaging a wafer in the production of integrated circuits as claimed in claim 1, wherein the size of each of said integrated circuit mask patterns on said reticles are different from each other.
Claim 4
Dependent Claim
49 words
The photolithography method for imaging a wafer in the production of integrated circuits as claimed in claim 2, wherein the size of said opaque area on said reticles decreases in size sequentially along the optical path with respect to said opaque area on a preceding one of said reticles.
Claim 5
Dependent Claim
29 words
The photolithography method for imaging a wafer in the production of integrated circuits as claimed in claim 1, wherein said plurality of reticles comprise two or more in number.
Claim 6
Dependent Claim
52 words
The photolithography method for imaging a wafer in the production of integrated circuits as claimed in claim 1, further comprising providing at least one condenser lens between two of said reticles disposed adjacent to each other, and providing a lens support structure adapted for holding said condenser lens between said adjacent reticles.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-05-04 | 2001-11-03 | 2002-05-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-05-04 | 2005-11-03 | 2006-05-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-05-04 | 2009-11-03 | 2010-05-05 | $7700.00 | Window Closed / Lapsed |