Flash memory cell with tunnel oxide layer protected from thermal cycling

Claim 2

A flash memory EEPROM transistor comprising: a semiconductor substrate, a doped source region in the surface of said substrate, said doped source region had been doped with arsenic at about 1E14 atoms/cm 2 to about 9E15 atoms/cm 2 , plus said doped source region had been additionally doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, a thick gate oxide layer formed over the portion of said surface of said substrate over said doped source region, said gate oxide lays: having been formed over said doped source region, a tunnel dielectric layer thinner then said gate oxide layer formed on the surface of laid semiconductor substrate aside from the portion of said surface over said doped source region, a stacked-gate structure for said transistor including a floating gate layer, an interelectrode dielectric layer, and a control gate layer formed over said tunnel dielectric layer and said stacked-gate structure overlapping said source region on one side of said stacked gate structure; a doped drain region formed in the surface of said substrate beneath said tunnel dielectric layer at another side of said stacked gate structure opposite from said one side of said stacked gate structure with one edge of said doped drain region overlapping said gate structure, said drain region had been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said doped drain region being shallower than said doped source region.

Claim 3

A transistor in accordance with claim 1 wherein said gate oxide layer provides an overlap dielectric thickness between said floating gate and said source region having a thickness between about 100Å and about 400Å.

Claim 4

A transistor in accordance with claim 1 wherein said tunnelling dielectric layer has a thickness between about 60Å and about 130Å.

Claim 5

A transistor in accordance with claim 1 wherein said gate oxide layer provides an overlap dielectric thickness between said floating gate and said source region having a thickness between about 100Å and about 400Å, and said tunneling dielectric layer has a thickness between about 60Å and about 130Å.

Claim 6

A transistor in accordance with claim 1 wherein said tunneling dielectric layer provides an overlap dielectric thickness between said floating gate and said drain region which has a thickness between about 60Å and about 130Å.

Claim 7

A transistor in accordance with claim 1 wherein said doped source region doped had been doped with the combination a material selected from arsenic or phosphorus at about 1E14 atoms/cm 2 to about 9E15 atoms/cm 2 initially, plus said doped source region had been additionally doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said drain region also had been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus.

Claim 8

A transistor in accordance with claim 1 wherein said doped source region doped had been doped with arsenic at about 1E14 atoms/cm 2 to about 9E15 atoms/cm 2 , plus said doped source region had been additionally doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said drain region had been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus.

Claim 9

A flash memory EEPROM transistor comprising: a semiconductor substrate, a doped source region located in a portion of the surface of said substrate, a gate oxide layer formed over said said surface of said substrate over said doped source region, a tunnel dielectric layer formed on the surface of said semiconductor substrate aside from the portion of said surface over said doped source region, a stacked-gate structure for said transistor including a floating gate layer, an interelectrode dielectric layer, and a control gate layer formed over said tunnel dielectric layer and overlapping said doped source region, and a doped drain region in the surface of said substrate at another side of said stacked gate structure opposite from said one side of said stacked gate structure with one edge of said doped drain region overlapping said gate structure, said doped drain region being doped to a substantially lesser degree than said doped source region, said floating gate layer comprising polysilicon material with a thickness from about 1,200Å to about 4,000Å doped with phosphorus dopant, said interelectrode dielectric layer being composed of a material selected from the group consisting of silicon oxide and Oxide/Nitride/Oxide, and said control gate layer having a thickness from about 3,500Å to about 4,700Å of composed of a material selected from the group consisting of tungsten polycide and polysilicon which was ion implanted with phosphorus dopant from about 2E14 atoms/cm 2 to about 9E15 atoms/cm 2 , said device having been thermally cycled after formation of said gate oxide layer over said doped source region and before formation of said tunnel dielectric layer over said doped drain region whereby said device has been protected from thermal damage to said device and retaining a high charge to breakdown Q BD of said tunnel dielectric layer, said doped source region doped having been doped with an initial amount of dopant comprising a material selected from the group consisting of arsenic and phosphorus at about 1E14 atoms/cm 2 to about 9E15 atoms/cm 2 , plus said doped source region having been doped with an additional amount of dopant from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said drain region having been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus.

Claim 10

A flash memory EEPROM transistor comprising: a semiconductor substrate, a doped source region located in a portion of the surface of said substrate, a gate oxide layer formed over said said surface of said substrate over said doped source region, a tunnel dielectric layer formed on the surface of said semiconductor substrate aside from the portion of said surface over said doped source region, a stacked-gate structure for said transistor including a floating gate layer, an interelectrode dielectric layer, and a control gate layer formed over said tunnel dielectric layer and overlapping said doped source region, and a doped drain region in the surface of said substrate at another side of said stacked gate structure opposite from said one side of said stacked gate structure with one edge of said doped drain region overlapping said gate structure, said doped drain region being doped to a substantially lesser degree than said doped source region, said floating gate layer comprising polysilicon material with a thickness from about 1,200Å to about 4,000Å doped with phosphorus dopant, said interelectrode dielectric layer being composed of a material selected from the group consisting of silicon oxide and Oxide/Nitride/Oxide, and said control gate layer having a thickness from about 3,500Å to about 4,700Å of composed of a material selected from the group consisting of tungsten polycide and polysilicon which was ion implanted with phosphorus dopant from about 2E14 atoms/cm 2 to about 9E15 atoms/cm 2 , said device having been thermally cycled after formation of said gate oxide layer over said doped source region and before formation of said tunnel dielectric layer over said doped drain region whereby said device has been protected from thermal damage to said device and retaining a high charge to breakdown Q BD of said tunnel dielectric layer, said doped source region doped having been doped with an initial amount of dopant comprising a material selected from the group consisting of arsenic and phosphorus at about 1E14 atoms/cm 2 to about 9E15 atoms/cm 2 , plus said doped source region having been doped with an additional amount of dopant from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said drain region having been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus.

Claim 11

A transistor in accordance with claim 8 wherein said gate oxide layer provides an overlap dielectric thickness between said floating gate and said source region having a thickness between about 100Å and about 400Å.

Claim 12

A transistor in accordance with claim 8 wherein said tunnelling dielectric layer has a thickness between about 60Å and about 130Å.

Claim 13

A transistor in accordance with claim 9 wherein the said tunneling dielectric layer has a thickness between about 60Å and about 130Å.

Claim 14

A transistor in accordance with claim 9 wherein said tunneling dielectric layer provides an overlap dielectric thickness between said floating gate and said drain region which has a thickness between about 60Å and about 130Å.

Claim 15

A flash memory EEPROM transistor comprising: a semiconductor substrate, a doped source region in the surface of said substrate, a gate oxide layer formed over the portion of said surface of said substrate over said doped source region, said gate oxide layer having been formed after doping said source region with an initial dopant, a tunnel oxide layer thinner than said gate oxide layer formed on the surface of said semiconductor substrate aside from the portion of said surface over said doped source region, a stacked-gate structure for said transistor including a floating gate layer, an interelectrode dielectric layer, and a control gate layer formed over said tunnel oxide layer and overlapping said source region, and a doped drain region formed in the surface of said substrate beneath said tunnel oxide layer at another side of said stacked gate structure opposite from said one side of said stacked gate structure with one edge of said doped drain region overlapping said gate structure, said doped drain region being shallower than said source region, said floating gate layer comprising polysilicon material with a thickness from about 1,200Å to about 4,000Å doped with phosphorus dopant, said interelectrode dielectric layer being composed of a material selected from the group consisting of silicon oxide and ONO, and said control gate layer with a thickness from about 3,500Å to about 4,700Å of composed of a material selected from the group consisting of tungsten polycide and polysilicon doped with phosphorus dopant from about 2E14 atoms/cm 2 to about 9E15 atoms/cm 2 , said device having been thermally cycled after formation of said gate oxide layer over said doped source region and before formation of said tunnel dielectric layer over said doped drain region whereby said device has been protected from thermal damage to said device and retaining a high charge to breakdown Q BD of said tunnel oxide layer, said doped source region having been doped with said initial dopant amount consisting of a material selected from the group consisting of arsenic and phosphorus at about 1E14 atoms/cm 2 to about 9E15 atoms/cm = , plus said doped source region having been doped with a secondary dopant amount from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said drain region also having been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus.

Claim 16

A flash memory EEPROM transistor comprising: a semiconductor substrate, a doped source region in the surface of said substrate, a gate oxide layer formed over the portion of said surface of said substrate over said doped source region, said gate oxide layer having been formed after doping said source region with an initial dopant, a tunnel oxide layer thinner than said gate oxide layer formed on the surface of said semiconductor substrate aside from the portion of said surface over said doped source region, a stacked-gate structure for said transistor including a floating gate layer, an interelectrode dielectric layer, and a control gate layer formed over said tunnel oxide layer and overlapping said source region, and a doped drain region formed in the surface of said substrate beneath said tunnel oxide layer at another side of said stacked gate structure opposite from said one side of said stacked gate structure with one edge of said doped drain region overlapping said gate structure, said doped drain region being shallower than said source region, said floating gate layer comprising polysilicon material with a thickness from about 1,200Å to about 4,000Å doped with phosphorus dopant, said interelectrode dielectric layer being composed of a material selected from the group consisting of silicon oxide and ONO, and said control gate layer with a thickness from about 3,500Å to about 4,700Å of composed of a material selected from the group consisting of tungsten polycide and polysilicon doped with phosphorus dopant from about 2E14 atoms/cm 2 to about 9E15 atoms/cm 2 , said device having been thermally cycled after formation of said gate oxide layer over said doped source region and before formation of said tunnel dielectric layer over said doped drain region whereby said device has been protected from thermal damage to said device and retaining a high charge to breakdown Q BD of said tunnel oxide layer, said doped source region having been doped with said initial dopant amount consisting of a material selected from the group consisting of arsenic and phosphorus at about 1E14 atoms/cm 2 to about 9E15 atoms/cm = , plus said doped source region having been doped with a secondary dopant amount from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said drain region also having been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus.

Claim 17

A transistor in accordance with claim 13 wherein said gate oxide layer provides an overlap dielectric thickness between said floating gate and said source region having a thickness between about 100Å and about 400Å.

Claim 18

A transistor in accordance with claim 13 wherein said tunnelling dielectric layer has a thickness between about 60Å and about 130Å.

Claim 19

A transistor An accordance with claim 13 wherein said gate oxide layer provides an overlap dielectric thickness between said floating gate and said source region having a thickness between about 100Å and about 400Å, and said tunneling dielectric layer has a thickness between about 60Å and about 130Å.

Claim 20

A transistor in accordance with claim 13 wherein said tunneling dielectric layer provides an overlap dielectric thickness between said floating gate and said drain region which has a thickness between about 60Å and about 130Å.

Claim 21

A transistor in accordance with claim 13 wherein said gate oxide layer, which is thicker than said tunnel dielectric layer, is suitable for use with a source voltage of 12 V.

Claim 22

A transistor in accordance with claim 13 wherein said doped source region doped had been doped with arsenic at about 1E14 atoms/cm 2 to about 9E15 atoms/cm 2 , plus said doped source region had been additionally doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus, and said drain region had been doped with from about 1E15 atoms/cm 2 to about 1E16 atoms/cm 2 of phosphorus.

Claim 23

A transistor in accordance with claim 13 wherein said gate oxide layer, which is thicker than said tunnel oxide layer, is suitable for use with a source voltage of 12 V and there had been reduced thermal stress placed on said tunnel dielectric layer.