Patent US5733819A successfully refreshed from Google Patents.
US5733819A
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US
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Polishing composition
Assignee: Fujimi Inc
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Filing: 1997-01-27
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Granted: 1998-03-31
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Expires: 2017-01-27
Abstract
Abstract A polishing composition comprising silicon nitride fine powder, water and an acid.
Inventors
- 👤 Hitoshi Kodama
- 👤 Satoshi Suzumura
- 👤 Noritaka Yokomichi
- 👤 Shirou Miura
- 👤 Hideki Otake
- 👤 Atsunori Kawamura
- 👤 Masatoki Ito
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 21:28
CPC Classifications
C; C09; C09G; C09G1/00; C09G1/02
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
35 words
A method comprising planarization polishing of an outer film of silicon dioxide adjacent and on top of a film of silicon nitride with a polishing composition comprising silicon nitride fine powder, water and an acid.
Claim 2
Independent Claim
35 words
A method comprising planarization polishing of an outer film of silicon dioxide adjacent and on top of a film of silicon nitride with a polishing composition comprising silicon nitride fine powder, water and an acid.
Claim 3
Dependent Claim
30 words
The method of claim 1, whereto the polishing composition further contains at least one member selected from the group consisting of fumed titania, fumed zirconia, fumed alumina and fumed silica.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-03-30 | 2001-09-29 | 2002-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-03-30 | 2005-09-29 | 2006-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-03-30 | 2009-09-29 | 2010-03-31 | $7700.00 | Window Closed / Lapsed |