US5728223A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Reactant gas ejector head and thin-film vapor deposition apparatus
Assignee: Ebara Corp
•
Filing: 1996-06-10
•
Granted: 1998-03-17
•
Expires: 2016-06-10
Abstract
Abstract A reactant gas ejector head in a thin-film vapor deposition apparatus includes at least two reactant gas inlet passages for introducing reactant gases, a gas mixing chamber for mixing reactant gases introduced from the reactant gas inlet passages, and a nozzle disposed downstream of the gas mixing chamber for rectifying the mixed gases from the gas mixing chamber into a uniform flow and applying the uniform flow to a substrate.
Inventors
- 👤 Takeshi Murakami
- 👤 Noriyuki Takeuchi
- 👤 Hiroyuki Shinozaki
- 👤 Kiwamu Tsukamoto
- 👤 Yukio Fukunaga
- 👤 Akihisa Hongo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:27
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45512; C23C16/45563; C23C16/45565; C23C16/4557; C30; C30B; C30B25/00; C30B25/02; C30B25/14
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
111 words
A reactant gas ejector head for use in providing a reactant gas flow toward a substrate to be arranged in a reaction chamber for depositing a thin film thereon, said head comprising: a plurality of gas mixing chambers distributed in a plane to extend substantially parallel to the substrate for mixing reactant gases; each said gas mixing chamber having connected thereto respective at least two reactant gas inlet passages capable of introducing different types of reactant gases to said each gas mixing chamber individually; and each said gas mixing chamber having connected thereto a respective ejection nozzle for ejecting reactant gases mixed in said each gas mixing chamber onto the substrate.
Claim 2
Dependent Claim
111 words
A reactant gas ejector head for use in providing a reactant gas flow toward a substrate to be arranged in a reaction chamber for depositing a thin film thereon, said head comprising: a plurality of gas mixing chambers distributed in a plane to extend substantially parallel to the substrate for mixing reactant gases; each said gas mixing chamber having connected thereto respective at least two reactant gas inlet passages capable of introducing different types of reactant gases to said each gas mixing chamber individually; and each said gas mixing chamber having connected thereto a respective ejection nozzle for ejecting reactant gases mixed in said each gas mixing chamber onto the substrate.
Claim 3
Dependent Claim
20 words
A reactant gas ejector head according to claim 1, wherein said gas mixing chambers are uniformly distributed in said plane.
Claim 4
Dependent Claim
22 words
A reactant gas ejector head according to claim 1, wherein said gas mixing chambers are distributed in said plane in a pattern.
Claim 5
Dependent Claim
41 words
A reactant gas ejector head according to claim 1, wherein each said nozzle comprises a constricted passage connected to said gas mixing chamber, and a diffuser connected to said constricted passage and diverging in a direction away from said constricted passage.
Claim 6
Dependent Claim
53 words
A reactant gas ejector head according to claim 4, wherein each said gas mixing chamber has a deflecting surface positioned in confronting relation to open ends of said respective reactant gas inlet passages thereof for deflecting the reactant gases introduced from said respective reactant gas inlet passages into said each gas mixing chamber.
Claim 7
Dependent Claim
27 words
A reactant gas ejector head according to claim 5, wherein said deflecting surface has a cross-sectional area which is progressively smaller toward the respective said constricted passage.
Claim 8
Dependent Claim
17 words
A reactant gas ejector head according to claim 6, wherein said deflecting surface comprises a conical surface.
Claim 9
Dependent Claim
17 words
A reactant gas ejector head according to claim 6, wherein said deflecting surface comprises a pyramid-shaped surface.
Claim 10
Dependent Claim
18 words
A reactant gas ejector head according to claim 6, wherein said deflecting surface comprises a partially spherical surface.
Claim 11
Dependent Claim
28 words
A reactant gas ejector head according to claim 1, wherein each said gas mixing chamber and said respective ejection nozzle are constructed as a unitary, one-piece nozzle body.
Claim 12
Dependent Claim
32 words
A reactant gas ejector head according to claim 10, wherein plural unitary nozzle bodies of said plurality of gas mixing chambers and respective ejection nozzles are incorporated in a single nozzle base.
Claim 13
Dependent Claim
26 words
A reactant gas ejector head according to claim 11, further comprising a distribution base mounted on said nozzle base and defining said reactant gas inlet passages.
Claim 14
Dependent Claim
30 words
A reactant gas ejector head according to claim 12, wherein said distribution base comprises a plate having grooves formed in a surface thereof, and another plate having passages extending therethrough.
Claim 15
Dependent Claim
38 words
A reactant gas ejector head according to claim 1, further comprising a heat medium passage for passage of a heat medium to maintain at least one of said nozzle and said gas mixing chamber at a predetermined temperature.
Claim 16
Dependent Claim
133 words
A thin-film vapor deposition apparatus comprising: a reaction chamber; a substrate holder for supporting a substrate in said reaction chamber; and a reaction gas ejector head for providing a reactant gas flow toward the substrate supported by said substrate holder, said reaction gas ejector head comprising: a plurality of gas mixing chambers distributed in a plane extending substantially parallel to a plane of the substrate when supported by said substrate holder for mixing reactant gases; each said gas mixing chamber having connected thereto respective at least two reactant gas inlet passages capable of introducing different types of reactant gases to said each gas mixing chamber individually; and each said gas mixing chamber having connected thereto a respective ejection nozzle for ejecting reactant gases mixed in said each gas mixing chamber onto the substrate.
Claim 17
Dependent Claim
133 words
A thin-film vapor deposition apparatus comprising: a reaction chamber; a substrate holder for supporting a substrate in said reaction chamber; and a reaction gas ejector head for providing a reactant gas flow toward the substrate supported by said substrate holder, said reaction gas ejector head comprising: a plurality of gas mixing chambers distributed in a plane extending substantially parallel to a plane of the substrate when supported by said substrate holder for mixing reactant gases; each said gas mixing chamber having connected thereto respective at least two reactant gas inlet passages capable of introducing different types of reactant gases to said each gas mixing chamber individually; and each said gas mixing chamber having connected thereto a respective ejection nozzle for ejecting reactant gases mixed in said each gas mixing chamber onto the substrate.
Claim 18
Dependent Claim
20 words
A thin-film vapor deposition apparatus according to claim 15, wherein said gas mixing chambers are uniformly distributed in said plane.
Claim 19
Dependent Claim
22 words
A thin-film vapor deposition apparatus according to claim 15, wherein said gas mixing chambers are distributed in said plane in a pattern.
Claim 20
Dependent Claim
43 words
A thin-film vapor deposition apparatus according to claim 15, wherein each said nozzle comprises a constricted passage connected to the respective said gas mixing chamber, and a diffuser connected to said constricted passage and diverging in a direction away from said constricted passage.
Claim 21
Dependent Claim
53 words
A thin-film vapor deposition apparatus according to claim 18, wherein each said gas mixing chamber has a deflecting surface positioned in confronting relation to open ends of said respective reactant gas inlet passages thereof for deflecting the reactant gases introduced from said respective reactant gas inlet passages into said each gas mixing chamber.
Claim 22
Dependent Claim
27 words
A thin-film vapor deposition apparatus according to claim 19, wherein said deflecting surface has a cross-sectional area which is progressively smaller toward the respective said constricted passage.
Claim 23
Dependent Claim
17 words
A thin-film vapor deposition apparatus according to claim 20, wherein said deflecting surface comprises a conical surface.
Claim 24
Dependent Claim
17 words
A thin-film vapor deposition apparatus according to claim 20, wherein said deflecting surface comprises a pyramid-shaped surface.
Claim 25
Dependent Claim
18 words
A thin-film vapor deposition apparatus according to claim 20, wherein said deflecting surface comprises a partially spherical surface.
Claim 26
Dependent Claim
27 words
A thin-film vapor deposition apparatus according to claim 15, wherein each said gas mixing chamber and said respective ejection nozzle are constructed as a unitary nozzle body.
Claim 27
Dependent Claim
32 words
A thin-film vapor deposition apparatus according to claim 24, wherein plural unitary nozzle bodies of said plurality of gas mixing chambers and respective ejection nozzles are incorporated in a single nozzle base.
Claim 28
Dependent Claim
26 words
A thin-film vapor deposition apparatus according to claim 24, further comprising a distribution base mounted on said nozzle base and defining said reactant gas inlet passages.
Claim 29
Dependent Claim
30 words
A thin-film vapor deposition apparatus according to claim 26, wherein said distribution base comprises a plate having grooves formed in a surface thereof, and another plate having passages extending therethrough.
Claim 30
Dependent Claim
38 words
A thin-film vapor deposition apparatus according to claim 15, further comprising a heat medium passage for passage of a heat medium to maintain at least one of said nozzle and said gas mixing chamber at a predetermined temperature.
References Cited (Backward Citations)
US3381114A
Cited
US4401052A
Cited
US4625678A
Cited
JPS6027690A
Cited
JPS60189928A
Cited
JPS60192323A
Cited
JPS62158317A
Cited
US4748135A
Cited
DE3715644A1
Cited
EP0303508A2
Cited
US4980204A
Cited
GB2219311A
Cited
JPH01283375A
Cited
WO1990010092A1
Cited
JPH0344470A
Cited
US4993358A
Cited
US5284519A
Cited
JPH0610138A
Cited
JPH0590169A
Cited
JPH05299351A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-03-16 | 2001-09-15 | 2002-03-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-03-16 | 2005-09-15 | 2006-03-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-03-16 | 2009-09-15 | 2010-03-17 | $7700.00 | Window Closed / Lapsed |