US5725975A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Gradation mask and process for producing the same
Assignee: Dai Nippon Printing Co Ltd
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Filing: 1996-07-02
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Granted: 1998-03-10
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Expires: 2016-07-02
Abstract
Abstract A gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, the transmittance being regulated stepwise by varying the thickness of a homogeneous film of a chromium compound provided on a transparent substrate sheet. A process for producing a gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, including the steps of: forming on a transparent substrate sheet a homogeneous film of a chromium compound in a thickness enough to have a transmittance of at least 0%; removing the chromium compound film in predetermined areas by etching; and reducing the thickness of the remaining chromium compound film in predetermined areas by etching to such an extent that the transmittance is a predetermined intermediate value. A gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, wherein the area having a transmittance of at least substantially 0% has a predetermined transmittance other than 0% and 100% and includes a semitransparent film provided in a fine repeating pattern on a transparent substrate sheet. The semitransparent film in a fine repeating pattern is provided in such a manner that the phase difference is substantially the half-wavelength of a wavelength used or a value obtained by multiplying the half-wavelength by an odd number.
Inventors
- 👤 Hiroyuki Nakamura
- 👤 Naoya Hayashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 15:26
CPC Classifications
G; G02; G02B; G02B5/00; G03; G03F; G03F1/00; G03F1/50; G03F1/26
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
134 words
A gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including a first step having substantially 0% transmittance, a second step having substantially 100% transmittance, and at least one additional step having a transmittance between 0% and 100%, said mask comprising: a transparent substrate sheet; and a film of a chromium compound formed on said transparent substrate sheet, said chromium compound film having at least two regions of varying thickness to provide, respectively, said first step having substantially 0% transmittance and said at least one additional step having a transmittance between 0% and 100%, wherein at least one of said at least one additional step is positioned on said transparent substrate sheet adjacent said first and/or second steps.
Claim 2
Dependent Claim
134 words
A gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including a first step having substantially 0% transmittance, a second step having substantially 100% transmittance, and at least one additional step having a transmittance between 0% and 100%, said mask comprising: a transparent substrate sheet; and a film of a chromium compound formed on said transparent substrate sheet, said chromium compound film having at least two regions of varying thickness to provide, respectively, said first step having substantially 0% transmittance and said at least one additional step having a transmittance between 0% and 100%, wherein at least one of said at least one additional step is positioned on said transparent substrate sheet adjacent said first and/or second steps.
Claim 3
Dependent Claim
117 words
A process for producing a gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, comprising the steps of: forming on a transparent substrate sheet a homogeneous film of a chromium compound to a thickness large enough to have a transmittance of 0%; removing a first portion of said homogeneous film in first predetermined areas by etching; and reducing the thickness of a portion of the remaining homogeneous film in second predetermined areas by etching to such an extent that the transmittance of said second predetermined areas is a predetermined intermediate value between 0% and 100%.
Claim 4
Dependent Claim
117 words
A process for producing a gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, comprising the steps of: forming on a transparent substrate sheet a homogeneous film of a chromium compound to a thickness large enough to have a transmittance of 0%; removing a first portion of said homogeneous film in first predetermined areas by etching; and reducing the thickness of a portion of the remaining homogeneous film in second predetermined areas by etching to such an extent that the transmittance of said second predetermined areas is a predetermined intermediate value between 0% and 100%.
Claim 5
Dependent Claim
160 words
A gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including a first step having substantially 0% transmittance, a second step having substantially 100% transmittance, and at least one additional step having a transmittance between 0% and 100%, comprising: a transparent substrate sheet; and a semitransparent film formed on said transparent substrate sheet, said semitransparent film having (i) a first area defining said first step having substantially 0% transmittance, said first area being arranged in a fine repeating pattern on said transparent substrate sheet, said fine repeating pattern being provided in such a manner that the phase difference is substantially the half-wavelength of a wavelength of light used with said mask or a value obtained by multiplying the half-wavelength by an odd number, and (ii) at least one second area defining said at least one additional step having a transmittance between 0% and 100%.
Claim 6
Dependent Claim
160 words
A gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including a first step having substantially 0% transmittance, a second step having substantially 100% transmittance, and at least one additional step having a transmittance between 0% and 100%, comprising: a transparent substrate sheet; and a semitransparent film formed on said transparent substrate sheet, said semitransparent film having (i) a first area defining said first step having substantially 0% transmittance, said first area being arranged in a fine repeating pattern on said transparent substrate sheet, said fine repeating pattern being provided in such a manner that the phase difference is substantially the half-wavelength of a wavelength of light used with said mask or a value obtained by multiplying the half-wavelength by an odd number, and (ii) at least one second area defining said at least one additional step having a transmittance between 0% and 100%.
Claim 7
Dependent Claim
142 words
A process for producing a gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, comprising the steps of: forming on a transparent substrate sheet a homogeneous film of a chromium compound to a thickness large enough to have a transmittance of 0%; removing a first portion of said homogeneous film in first predetermined areas by etching to form said step having substantially 100% transmittance; and removing select areas of a portion of the remaining homogeneous film in second predetermined areas by etching to form a fine repeating pattern such that the transmittance of said second predetermined areas as a whole is substantially 0%, and the transmittance of the remaining homogeneous film is a predetermined intermediate value between 0% and 100%.
Claim 8
Dependent Claim
142 words
A process for producing a gradation mask for forming a color filter having a plurality of colored pixels, said gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, comprising the steps of: forming on a transparent substrate sheet a homogeneous film of a chromium compound to a thickness large enough to have a transmittance of 0%; removing a first portion of said homogeneous film in first predetermined areas by etching to form said step having substantially 100% transmittance; and removing select areas of a portion of the remaining homogeneous film in second predetermined areas by etching to form a fine repeating pattern such that the transmittance of said second predetermined areas as a whole is substantially 0%, and the transmittance of the remaining homogeneous film is a predetermined intermediate value between 0% and 100%.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-03-09 | 2001-09-08 | 2002-03-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-03-09 | 2005-09-08 | 2006-03-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-03-09 | 2009-09-08 | 2010-03-10 | $7700.00 | Window Closed / Lapsed |