Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
86 words
A wafer holder for semiconductor applications comprising: a support structure having a patterned surface, a vacuum opening, and a vacuum wand slot extending into the support structure, the patterned surface having a recessed area and a vacuum groove intersecting the vacuum opening; and a ring that attaches to the support structure such that at least a portion of the ring is overlying at least a portion of the patterned surface of the support structure and at least a central portion of the support structure is exposed.
Claim 2
Dependent Claim
86 words
A wafer holder for semiconductor applications comprising: a support structure having a patterned surface, a vacuum opening, and a vacuum wand slot extending into the support structure, the patterned surface having a recessed area and a vacuum groove intersecting the vacuum opening; and a ring that attaches to the support structure such that at least a portion of the ring is overlying at least a portion of the patterned surface of the support structure and at least a central portion of the support structure is exposed.
Claim 3
Dependent Claim
30 words
The wafer holder for semiconductor applications of claim 1, wherein the support structure and the ring have a combined thickness of 1.2 mm (50 mils) to 3.5 mm (140 mils).
Claim 4
Dependent Claim
36 words
The wafer holder for semiconductor applications of claim 1, wherein the support structure is formed from a material selected from the group consisting of aluminum, aluminum alloy, nickel, quartz, platinum, stainless steel, titanium, copper, and gold.
Claim 5
Dependent Claim
40 words
The wafer holder for semiconductor applications of claim 1, wherein the patterned surface of the support structure is plated with a material selected from the group consisting of aluminum, aluminum alloy, nickel, quartz, platinum, stainless steel, titanium, copper, and gold.
Claim 6
Dependent Claim
37 words
The wafer holder for semiconductor applications of claim 1, wherein the ring is formed from a material selected from the group consisting of "Delrin", "Teflon", aluminum, aluminum alloy, nickel, quartz, platinum, stainless steel, titanium, copper, and gold.
Claim 7
Dependent Claim
16 words
The wafer holder for semiconductor applications of claim 1, wherein the support structure has a flat.
Claim 8
Independent Claim
71 words
A method for probing a semiconductor substrate comprising the steps of: providing the semiconductor substrate; placing the semiconductor substrate into a support structure, the support structure having at least one vacuum opening; placing a ring on the support structure such that the semiconductor substrate is held in contact with the support structure; applying a vacuum through the at least one vacuum opening of the support structure; and probing the semiconductor substrate.
Claim 9
Independent Claim
71 words
A method for probing a semiconductor substrate comprising the steps of: providing the semiconductor substrate; placing the semiconductor substrate into a support structure, the support structure having at least one vacuum opening; placing a ring on the support structure such that the semiconductor substrate is held in contact with the support structure; applying a vacuum through the at least one vacuum opening of the support structure; and probing the semiconductor substrate.
Claim 10
Dependent Claim
30 words
The method for probing the semiconductor substrate of claim 7, further comprising the step of electrically testing a semiconductor device on the semiconductor substrate through an opening in the ring.
Claim 11
Dependent Claim
37 words
The method for probing the semiconductor substrate of claim 7, wherein the step of providing a semiconductor substrate includes providing a semiconductor substrate that has a thickness of 25 μm (1 mil) to 250 μm (10 mils).
Claim 12
Dependent Claim
49 words
The method for probing the semiconductor substrate of claim 7, wherein the step of placing the semiconductor substrate into the support structure further comprises placing the semiconductor substrate into support structure with a vacuum wand and removing the vacuum wand through a vacuum wand slot in the support structure.
Claim 13
Dependent Claim
37 words
The method for probing the semiconductor substrate of claim 7, wherein the step of placing the semiconductor substrate into the support structure includes aligning a flat on the semiconductor substrate to a flat on the support structure.
Claim 14
Dependent Claim
33 words
The method for probing the semiconductor substrate of claim 7, wherein the step of placing a ring on the support structure forms a wafer holder that is 1.2 mm to 3.5 mm thick.
Claim 15
Dependent Claim
62 words
A semiconductor wafer holder comprising a first portion and a second portion, the first portion having a recessed area for containing a semiconductor substrate and at least one vacuum opening to apply a vacuum to the semiconductor substrate, and the second portion attaches to the first portion to hold the semiconductor substrate in place and expose a portion of the semiconductor substrate.
Claim 16
Dependent Claim
62 words
A semiconductor wafer holder comprising a first portion and a second portion, the first portion having a recessed area for containing a semiconductor substrate and at least one vacuum opening to apply a vacuum to the semiconductor substrate, and the second portion attaches to the first portion to hold the semiconductor substrate in place and expose a portion of the semiconductor substrate.
Claim 17
Dependent Claim
27 words
The semiconductor wafer holder of claim 13, wherein the first portion and the second portion form a wafer holder that is 1.2 mm to 3.5 mm thick.
Claim 18
Dependent Claim
39 words
The semiconductor wafer holder of claim 13, wherein at least a portion of the first portion is plated with a material selected from the group consisting of aluminum, aluminum alloy, nickel, quartz, platinum, stainless steel, titanium, copper, and gold.
Claim 19
Dependent Claim
39 words
The semiconductor wafer holder of claim 13, wherein the first portion and the second portion are formed from materials selected from the group consisting of "Delrin", "Teflon", aluminum, aluminum alloy, nickel, quartz, platinum, stainless steel, titanium, copper, and gold.
Claim 20
Dependent Claim
23 words
The semiconductor wafer holder of claim 13, wherein the second portion further comprises a plurality of tabs used to hold the esmiconductor substrate.