US5685959A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Cathode assembly having rotating magnetic-field shunt and method of making magnetic recording media
Assignee: WD Media LLC
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Filing: 1996-10-25
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Granted: 1997-11-11
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Expires: 2016-10-25
Abstract
Abstract A cathode assembly having a magnetic-field shunt for use in a magnetron sputtering apparatus is described. The magnetic-field shunt disposed between a sputtering target and a source of magnetic flux, and the shunt is moveable between first and second positions to effect preferential target erosion at first and second target regions, respectively. A method of using the assembly for preparation of a magnetic recording medium is also described.
Inventors
- 👤 Allen J. Bourez
- 👤 Brij Bihari Lal
- 👤 Michael A. Russak
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 17:31
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/345; H01J37/3458; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; H01J37/3402; H01J37/3405; H01J37/3408
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
116 words
A cathode assembly for use in a magnetron sputtering apparatus, comprising: a sputtering target having a planar sputtering surface; north and south magnetic poles disposed with respect to the target to produce a magnetic field over the target surface for magnetron sputtering; a magnetic-field shunt disposed between the target and said magnetic poles; and means for moving the shunt relative to the poles between first and second positions at which the magnetic field on the target surface causes preferential target erosion at first and second target regions, respectively, whereby repeated movement of the shunt between such first and second positions during target sputtering is effective to produce preferential erosion over said first and second regions, respectively.
Claim 2
Dependent Claim
116 words
A cathode assembly for use in a magnetron sputtering apparatus, comprising: a sputtering target having a planar sputtering surface; north and south magnetic poles disposed with respect to the target to produce a magnetic field over the target surface for magnetron sputtering; a magnetic-field shunt disposed between the target and said magnetic poles; and means for moving the shunt relative to the poles between first and second positions at which the magnetic field on the target surface causes preferential target erosion at first and second target regions, respectively, whereby repeated movement of the shunt between such first and second positions during target sputtering is effective to produce preferential erosion over said first and second regions, respectively.
Claim 3
Dependent Claim
88 words
The assembly of claim 1, wherein said shunt includes a center region disposed over one of said north or south magnetic poles; a first shunt portion extending radially out from said center region to function as a radial extension of said one pole; a second shunt portion attached to, but spaced from, said center region to function as an extension of the other pole; and means for moving the shunt includes means for rotating said shunt about an axis substantially normal to the plane of the target surface.
Claim 4
Dependent Claim
14 words
The assembly of claim 1, wherein said target is composed of a magnetic material.
Claim 5
Dependent Claim
15 words
The assembly of claim 3, wherein said target is composed of a cobalt-based magnetic alloy.
Claim 6
Dependent Claim
18 words
The assembly of claim 1, wherein said north and south magnetic poles are produced by an electromagnetic coil.
Claim 7
Dependent Claim
18 words
The assembly of claim 1, wherein said north and south magnetic poles are produced by a permanent magnet.
Claim 8
Dependent Claim
116 words
A cathode assembly for use in a magnetron sputtering apparatus, comprising: a sputtering target having a planar sputtering surface; north and south magnetic poles disposed with respect to the target to produce a magnetic field over the target surface for magnetron sputtering; a magnetic-field shunt disposed between the target and said magnetic poles; and means for moving the shunt relative to the poles between first and second positions at which the shunt functions as an extension of the north and south poles; whereby repeated movement of the shunt between such first and second positions shifts the magnetic-field between first and second target regions, respectively, to produce preferential target erosion in said first and second target regions.
Claim 9
Dependent Claim
116 words
A cathode assembly for use in a magnetron sputtering apparatus, comprising: a sputtering target having a planar sputtering surface; north and south magnetic poles disposed with respect to the target to produce a magnetic field over the target surface for magnetron sputtering; a magnetic-field shunt disposed between the target and said magnetic poles; and means for moving the shunt relative to the poles between first and second positions at which the shunt functions as an extension of the north and south poles; whereby repeated movement of the shunt between such first and second positions shifts the magnetic-field between first and second target regions, respectively, to produce preferential target erosion in said first and second target regions.
Claim 10
Dependent Claim
87 words
The assembly of claim 7, wherein shunt includes a center region disposed over one of said north or south magnetic poles; a first shunt portion extending radially out from said center region to function as a radial extension of said one pole; a second shunt portion attached to, but spaced from, said center portion to function as an extension of the other pole; and means for moving the shunt includes means for rotating said shunt about an axis substantially normal to the plane of the target surface.
Claim 11
Dependent Claim
14 words
The assembly of claim 7, wherein said target is composed of a magnetic material.
Claim 12
Dependent Claim
15 words
The assembly of claim 9, wherein said target is composed of a cobalt-based magnetic alloy.
Claim 13
Dependent Claim
18 words
The assembly of claim 7, wherein said north and south magnetic poles are produced by an electromagnetic coil.
Claim 14
Dependent Claim
18 words
The assembly of claim 7, wherein said north and south magnetic poles are produced by a permanent magnet.
Claim 15
Independent Claim
166 words
A method of forming on a substrate by sputter deposition a thin-film layer in a magnetic recording medium, comprising placing a substrate in a sputtering chamber including a cathode assembly composed of (i) a sputtering target having a planar sputtering surface, (ii) north and south magnetic poles disposed with respect to the target to produce a magnetic field over the target surface for magnetron sputtering, (iii) a magnetic-field shunt disposed between the target and said magnetic poles, and (iv) means for moving the shunt relative to the poles between first and second positions at which the magnetic field on the target surface causes preferential target erosion at first and second target regions, respectively, whereby repeated movement of the shunt between such first and second positions during target sputtering is effective to produce preferential erosion over said first and second regions, respectively; igniting a sputtering plasma by energizing said target; moving said shunt repeatedly between said first and second positions; and sputtering said layer onto said substrate.
Claim 16
Independent Claim
166 words
A method of forming on a substrate by sputter deposition a thin-film layer in a magnetic recording medium, comprising placing a substrate in a sputtering chamber including a cathode assembly composed of (i) a sputtering target having a planar sputtering surface, (ii) north and south magnetic poles disposed with respect to the target to produce a magnetic field over the target surface for magnetron sputtering, (iii) a magnetic-field shunt disposed between the target and said magnetic poles, and (iv) means for moving the shunt relative to the poles between first and second positions at which the magnetic field on the target surface causes preferential target erosion at first and second target regions, respectively, whereby repeated movement of the shunt between such first and second positions during target sputtering is effective to produce preferential erosion over said first and second regions, respectively; igniting a sputtering plasma by energizing said target; moving said shunt repeatedly between said first and second positions; and sputtering said layer onto said substrate.
Claim 17
Dependent Claim
88 words
The method of claim 13, wherein said shunt includes a center region disposed over one of said north or south magnetic poles; a first shunt portion extending radially out from said center region to function as a radial extension of said one pole; a second shunt portion attached to, but spaced from, said center portion to function as an extension of the other pole; and means for moving the shunt includes means for rotating said shunt about an axis substantially normal to the plane of the target surface.
Claim 18
Dependent Claim
18 words
The method of claim 13, wherein said sputtering is from a target is composed of a magnetic material.
Claim 19
Dependent Claim
15 words
The method of claim 15, wherein said target is composed of a cobalt-based magnetic alloy.
Claim 20
Dependent Claim
18 words
The method of claim 13, wherein said north and south magnetic poles are produced by an electromagnetic coil.
Claim 21
Dependent Claim
18 words
The assembly of claim 13, wherein said north and south magnetic poles are produced by a permanent magnet.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-11-10 | 2001-05-12 | 2001-11-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-11-10 | 2005-05-12 | 2005-11-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-11-10 | 2009-05-12 | 2009-11-11 | $7700.00 | Window Closed / Lapsed |