US5669975A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma producing method and apparatus including an inductively-coupled plasma source
Assignee: Tokyo Electron Ltd
•
Filing: 1996-03-27
•
Granted: 1997-09-23
•
Expires: 2016-03-27
Abstract
Abstract An apparatus for processing at least a surface of an article with a uniform plasma includes a processing chamber in which the article is disposed and a plasma source. The plasma source includes a dielectric plate having a first surface forming part of an inner wall of the processing chamber, and an electrical energy source, including a radiofrequency source and a substantially planar induction coil, the latter of which is disposed on a second surface of the dielectric plate, and to which energy from the radiofrequency source is preferably supplied through impedance matching circuitry. The substantially planar induction coil has at least two spiral portions which are symmetrical about at least one point of the substantially planar induction coil, and preferably forming a continuous "S-shape". The shape of the induction coil minimizes the capacitive coupling between the induction coil and the plasma, and thus the plasma sheath voltage drop, thereby improving device damage processing and plasma uniformity at the surface of the article. An impedance matching circuit connected between the substantially planar induction coil and the radiofrequency source minimizes a net voltage drop which often occurs across the leads of a prior art induction coil and thus further improves plasma uniformity at the surface of the article.
Inventors
- 👤 Kaihan Abidi Ashtiani
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 01:07
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/507; H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321; H01J37/32431; H01J37/3266; H01J37/32688
Claims Analysis
Total Claims: 47
Claim 1
Independent Claim
199 words
An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising: a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma; and, a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; an electrical energy source disposed outside said processing chamber, said electrical energy source for providing energy through said dielectric plate into said processing space to interact with said process gas to form said plasma, wherein said electrical energy source includes an induction coil having at least two spiral portions which are symmetrical about at least one point of said induction coil, and wherein said induction coil is disposed on a second surface of said dielectric plate for creating said plasma proximate said surface of said article to bombard said surface and produce a substantially uniform process rate across said article surface.
Claim 2
Independent Claim
199 words
An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising: a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma; and, a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; an electrical energy source disposed outside said processing chamber, said electrical energy source for providing energy through said dielectric plate into said processing space to interact with said process gas to form said plasma, wherein said electrical energy source includes an induction coil having at least two spiral portions which are symmetrical about at least one point of said induction coil, and wherein said induction coil is disposed on a second surface of said dielectric plate for creating said plasma proximate said surface of said article to bombard said surface and produce a substantially uniform process rate across said article surface.
Claim 3
Dependent Claim
17 words
The processing apparatus of claim 1, wherein the electrical energy source includes a first radio frequency source.
Claim 4
Dependent Claim
22 words
The processing apparatus of claim 2, wherein said first radio frequency source operates in a frequency range of 2 to 13.56 MHZ.
Claim 5
Dependent Claim
29 words
The processing apparatus of claim 2, further comprising a circuit connected to said induction coil for matching the impedance of said induction coil and said first radio frequency source.
Claim 6
Dependent Claim
15 words
The processing apparatus of claim 4, wherein said impedance matching circuit comprises an L-type circuit.
Claim 7
Dependent Claim
67 words
The processing apparatus of claim 4, wherein said induction coil has a first and second lead, and wherein said impedance matching circuit has a first terminal connected to said first radio frequency source and a second terminal connected to said first lead of said induction coil, whereby a current is caused to flow from said first lead of said coil to said second lead of said coil.
Claim 8
Dependent Claim
18 words
The processing apparatus of claim 6, wherein said second lead of said induction coil is connected to ground.
Claim 9
Dependent Claim
58 words
The processing apparatus of claim 4, wherein said induction coil has a first and second lead, and wherein said impedance matching circuit has a first terminal connected to said first radio frequency source, a second terminal connected to said first lead of said induction coil, and a third terminal connected to said second lead of said induction coil.
Claim 10
Dependent Claim
72 words
The processing apparatus of claim 8, wherein said induction coil is connected through said impedance matching circuit to ground at said point about which said at least two spiral portions of said induction coil are symmetrical, whereby a first current flows from said first lead of said induction coil towards said impedance matching circuit and a second current flows from said second lead of said induction coil towards said impedance matching circuit.
Claim 11
Dependent Claim
14 words
The processing apparatus of claim 8, wherein said impedance matching circuit includes a transformer.
Claim 12
Dependent Claim
16 words
The processing apparatus of claim 10, wherein said transformer has a center tap connected to ground.
Claim 13
Dependent Claim
33 words
The processing apparatus of claim 4, further comprising: a support disposed within said processing chamber for supporting said article; and, a second radio frequency source for biasing said article with radio frequency energy.
Claim 14
Dependent Claim
24 words
The processing apparatus of claim 12, further comprising an isolating capacitor, wherein said second radio frequency source biases said article through said isolating capacitor.
Claim 15
Dependent Claim
19 words
The processing apparatus of claim 12, wherein said second radio frequency source operates at a frequency of 13.56 MHZ.
Claim 16
Independent Claim
174 words
An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising: a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma; and, a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil having two spiral portions which are symmetrical about at least one point of said substantially planar induction coil, wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
Claim 17
Independent Claim
174 words
An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising: a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma; and, a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil having two spiral portions which are symmetrical about at least one point of said substantially planar induction coil, wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
Claim 18
Dependent Claim
21 words
The processing apparatus of claim 15, further comprising a radio frequency source for providing energy to said substantially planar induction coil.
Claim 19
Dependent Claim
32 words
The processing apparatus of claim 16, further comprising a circuit connected to said substantially planar induction coil for matching the impedance of said substantially planar induction coil and said radio frequency source.
Claim 20
Dependent Claim
70 words
The processing apparatus of claim 17, wherein said substantially planar induction coil has a first and second lead, and wherein said impedance matching circuit has a first terminal connected to said radio frequency source and a second terminal connected to said first lead of said substantially planar induction coil, whereby a current is caused to flow from said first lead of said coil to said second lead of said coil.
Claim 21
Dependent Claim
20 words
The processing apparatus of claim 18, wherein said second lead of said substantially planar induction coil is connected to ground.
Claim 22
Dependent Claim
64 words
The processing apparatus of claim 17, wherein said substantially planar induction coil has a first and second lead, and wherein said impedance matching circuit has a first terminal connected to said first radio frequency source, a second terminal connected to said first lead of said substantially planar induction coil, and a third terminal connected to said second lead of said substantially planar induction coil.
Claim 23
Dependent Claim
80 words
The processing apparatus of claim 20, wherein said substantially planar induction coil is connected through said impedance matching circuit to ground at said point about which said at least two spiral portions of said substantially planar induction coil are symmetrical, whereby a first current flows from said first lead of said substantially planar induction coil towards said impedance matching circuit and a second current flows from said second lead of said substantially planar induction coil towards said impedance matching circuit.
Claim 24
Dependent Claim
14 words
The processing apparatus of claim 17, wherein said impedance matching circuit includes a transformer.
Claim 25
Dependent Claim
151 words
A plasma source for creating a plasma inside a processing chamber, said plasma for treating at least a surface of an article disposed in said processing chamber, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; an electrical energy source disposed outside said processing chamber, said electrical energy source for providing energy through said dielectric plate into said processing space to interact with said process gas to form said plasma, wherein said electrical energy source includes an induction coil having at least two spiral portions which are symmetrical about at least one point of said induction coil, and wherein said induction coil is disposed on a second surface of said dielectric plate for creating a high density plasma proximate said surface of said article to bombard said surface and produce a substantially uniform process rate across said article surface.
Claim 26
Dependent Claim
151 words
A plasma source for creating a plasma inside a processing chamber, said plasma for treating at least a surface of an article disposed in said processing chamber, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; an electrical energy source disposed outside said processing chamber, said electrical energy source for providing energy through said dielectric plate into said processing space to interact with said process gas to form said plasma, wherein said electrical energy source includes an induction coil having at least two spiral portions which are symmetrical about at least one point of said induction coil, and wherein said induction coil is disposed on a second surface of said dielectric plate for creating a high density plasma proximate said surface of said article to bombard said surface and produce a substantially uniform process rate across said article surface.
Claim 27
Dependent Claim
17 words
The plasma source of claim 23, wherein the electrical energy source includes a first radio frequency source.
Claim 28
Dependent Claim
29 words
The plasma source of claim 24, further comprising a circuit connected to said induction coil for matching the impedance of said induction coil and said first radio frequency source.
Claim 29
Dependent Claim
46 words
The plasma source of claim 25, wherein said induction coil has a first and second lead, and wherein said impedance matching circuit has a first terminal connected to said first radio frequency source and a second terminal connected to said first lead of said induction coil.
Claim 30
Dependent Claim
18 words
The plasma source of claim 26, wherein said second lead of said induction coil is connected to ground.
Claim 31
Dependent Claim
58 words
The plasma source of claim 25, wherein said induction coil has a first and second lead, and wherein said impedance matching circuit has a first terminal connected to said first radio frequency source, a second terminal connected to said first lead of said induction coil, and a third terminal connected to said second lead of said induction coil.
Claim 32
Dependent Claim
72 words
The processing apparatus of claim 28, wherein said induction coil is connected through said impedance matching circuit to ground at said point about which said at least two spiral portions of said induction coil are symmetrical, whereby a first current flows from said first lead of said induction coil towards said impedance matching circuit and a second current flows from said second lead of said induction coil towards said impedance matching circuit.
Claim 33
Dependent Claim
14 words
The plasma source of claim 25, wherein said impedance matching circuit includes a transformer.
Claim 34
Dependent Claim
16 words
The plasma source of claim 30, wherein said transformer has a center tap connected to ground.
Claim 35
Dependent Claim
142 words
A plasma source for creating a plasma inside a processing chamber, said plasma for treating at least a surface of an article disposed in said processing chamber, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil, a first portion of which comprises a first spiral, and a second portion of which comprises a second spiral substantially identical to said first spiral, wherein said substantially planar induction coil forms an "S-shape" pattern, and wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
Claim 36
Dependent Claim
142 words
A plasma source for creating a plasma inside a processing chamber, said plasma for treating at least a surface of an article disposed in said processing chamber, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil, a first portion of which comprises a first spiral, and a second portion of which comprises a second spiral substantially identical to said first spiral, wherein said substantially planar induction coil forms an "S-shape" pattern, and wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
Claim 37
Independent Claim
175 words
A method of processing at least a surface of an article with plasma, comprising the steps of: disposing said article in a processing chamber having at least one inlet port through which a process gas may be input; introducing said process gas into said processing chamber at a controlled operating pressure; coupling a plasma source to an end of said processing chamber to seal said processing chamber and to induce the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil having at least two spiral portions which are symmetrical about at least one point of said substantially planar induction coil, wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, and wherein said induction coil couples energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
Claim 38
Independent Claim
175 words
A method of processing at least a surface of an article with plasma, comprising the steps of: disposing said article in a processing chamber having at least one inlet port through which a process gas may be input; introducing said process gas into said processing chamber at a controlled operating pressure; coupling a plasma source to an end of said processing chamber to seal said processing chamber and to induce the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil having at least two spiral portions which are symmetrical about at least one point of said substantially planar induction coil, wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, and wherein said induction coil couples energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
Claim 39
Dependent Claim
24 words
The method of claim 33, further comprising the step of connecting an energy source to said substantially planar induction coil for providing energy thereto.
Claim 40
Dependent Claim
14 words
The method of claim 34, wherein said energy source is a radiofrequency energy source.
Claim 41
Dependent Claim
20 words
The method of claim 35, wherein said radiofrequency energy source operates in a frequency range of 2 to 13.56 MHZ.
Claim 42
Dependent Claim
64 words
The method of claim 34, further comprising the step of: connecting a first terminal of an impedance matching circuit to said energy source; and, connecting a second terminal of said impedance matching circuit to a first lead of said substantially planar induction coil, whereby a current is caused to flow from said first lead of said coil to said second lead of said coil.
Claim 43
Dependent Claim
22 words
The method of claim 37, further comprising the step of connecting a second lead of said substantially planar induction coil to ground.
Claim 44
Dependent Claim
62 words
The method of claim 34, further comprising the steps of: connecting a first terminal of an impedance matching circuit to said energy source; connecting a second terminal of said impedance matching circuit to a first lead of said substantially planar induction coil; and, connecting a third terminal of said impedance matching circuit to said second lead of said substantially planar induction coil.
Claim 45
Dependent Claim
82 words
The method of claim 39, further comprising the step of connecting said substantially planar induction coil through said impedance matching circuit to ground at said point about which said at least two spiral portions of said substantially planar induction coil are symmetrical, whereby a first current flows from said first lead of said substantially planar induction coil towards said impedance matching circuit and a second current flows from said second lead of said substantially planar induction coil towards said impedance matching circuit.
Claim 46
Independent Claim
191 words
An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising: a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma; and, a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil, a first portion of which comprises a first spiral, and a second portion of which comprises a second spiral, wherein said first and second spiral portions are substantially identical and form a continuous "S-shape", and wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
Claim 47
Independent Claim
191 words
An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising: a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma; and, a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising: a dielectric plate having a first surface forming part of an inner wall of said processing chamber; a substantially planar induction coil, a first portion of which comprises a first spiral, and a second portion of which comprises a second spiral, wherein said first and second spiral portions are substantially identical and form a continuous "S-shape", and wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.
References Cited (Backward Citations)
US4422896A
Cited
US4990229A
Cited
US5091049A
Cited
US4948458A
Cited
US5304279A
Cited
US5280219A
Cited
US5226967A
Cited
US5401350A
Cited
US5529657A
Cited
US5513765A
Cited
US5540824A
Cited
US5558722A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-09-22 | 2001-03-24 | 2001-09-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-09-22 | 2005-03-24 | 2005-09-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-09-22 | 2009-03-24 | 2009-09-23 | $7700.00 | Window Closed / Lapsed |