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US5667923A
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US
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Charged particle beam exposure compensating proximity effect
Assignee: Fujitsu Ltd
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Filing: 1996-04-29
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Granted: 1997-09-16
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Expires: 2016-04-29
Abstract
Abstract A subject pattern and a lower layer pattern are divided into small regions of a constant dimension using identical mesh of division. Considering of the spreading of charged particle beam due to backward scattering, the small region is set to be, for example, a few μm square. An irradiation energy on each small region is determined by taking backward scattering from lower level pattern into account. Calculation is simplified because a pattern is represented by a pattern areal density. A region with a lower level pattern and a region without a lower level pattern can be exposured by charged particle beam with a comparable accuracy.
Inventors
- 👤 Hiroyuki Kanata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 08:55
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3174; H10; H10P; H10P76/00; B; B82; B82Y; B82Y10/00; B82Y40/00; H01J37/302; H01J37/3023; H01J37/3026; H01J2237/00; H01J2237/30; H01J2237/317; H01J2237/3175; H01J2237/31761; H01J2237/31764; H01J2237/31769; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
172 words
A charged particle beam exposure method for exposing a pattern with a charged particle beam, comprising the steps of: dividing data of a pattern to be exposed on a surface layer of a substrate into small regions of a predetermined dimension; calculating area density of the pattern within each divided small region; dividing data of a pattern of a lower level structure into small regions of a predetermined dimension, the lower level pattern being formed within the substrate having the surface layer which is to be patterned; calculating area density of the lower level pattern within each divided small region; calculating a main exposure intensity for irradiating a pattern on the surface layer for each small region based on total scattering intensity depending on the area density of the pattern on the surface layer and the area density of the pattern on the lower level layer; and exposing each small region of the surface layer with a charged particle beam based on the calculated main exposure intensity for the charged particle beam.
Claim 2
Dependent Claim
172 words
A charged particle beam exposure method for exposing a pattern with a charged particle beam, comprising the steps of: dividing data of a pattern to be exposed on a surface layer of a substrate into small regions of a predetermined dimension; calculating area density of the pattern within each divided small region; dividing data of a pattern of a lower level structure into small regions of a predetermined dimension, the lower level pattern being formed within the substrate having the surface layer which is to be patterned; calculating area density of the lower level pattern within each divided small region; calculating a main exposure intensity for irradiating a pattern on the surface layer for each small region based on total scattering intensity depending on the area density of the pattern on the surface layer and the area density of the pattern on the lower level layer; and exposing each small region of the surface layer with a charged particle beam based on the calculated main exposure intensity for the charged particle beam.
Claim 3
Dependent Claim
54 words
A charged particle beam exposure method according to claim 1, wherein the width of said small pattern is at least equal to 5 A when forward scattering of charged particle beam is approximated by exp(-r 2 /A 2 ) where r is a distance from the point of incidence and A is a coefficient.
Claim 4
Dependent Claim
36 words
A charged particle beam exposure method according to claim 1, wherein the surface layer and the lower level layer are divided into small regions at a mesh common to both surface layer and lower level layer.
Claim 5
Dependent Claim
41 words
A charged particle beam exposure method according to claim 1, wherein a total backward scattering intensity is calculated by sampling patterns on the lower level layer which are present in the same small region where there is a main exposure pattern.
References Cited (Backward Citations)
US4500789A
Cited
US5278419A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-09-15 | 2001-03-17 | 2001-09-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-09-15 | 2005-03-17 | 2005-09-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-09-15 | 2009-03-17 | 2009-09-16 | $7700.00 | Window Closed / Lapsed |