Patent US1639351A successfully refreshed from Google Patents.
Patent US5654222A successfully refreshed from Google Patents.
US5654222A
Expired / Lapsed
US
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Method for forming a capacitor with electrically interconnected construction
Assignee: Micron Technology Inc
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Filing: 1995-05-17
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Granted: 1997-08-05
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Expires: 2015-05-17
Abstract
Abstract A method of forming a capacitor includes, a) providing a node to which electrical connection to a capacitor is to be made; b) providing an electrically conductive first layer over the node; c) providing an electrically insulative barrier second layer over the first conductive layer; d) providing a third layer over the electrically insulative barrier layer, the third layer comprising a material which is either electrically conductive and resistant to oxidation, or forms an electrically conductive material upon oxidation; e) providing an insulating inorganic metal oxide dielectric layer over the electrically conductive third layer; f) providing an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; and g) providing an electrically conductive interconnect to extend over the second insulative layer and electrically interconnect the first and third conductive layers. A capacitor construction having such a dielectric layer in combination with the barrier layer and electrical interconnect of a first capacitor plate is disclosed.
Inventors
- 👤 Gurtej S. Sandhu
- 👤 Paul Schuele
- 👤 Wayne Kinney
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 15:08
CPC Classifications
H; H10; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/03; H10B53/00; H10B53/30; H10D; H10D1/00; H10D1/60; H10D1/68; H10B12/033
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
115 words
A method of forming a capacitor comprising the following steps: providing a node to which electrical connection to a capacitor is to be made; providing an electrically conductive first layer over the node; providing an electrically insulative barrier second layer over the first conductive layer; providing a third layer over the electrically insulative barrier layer, the third layer comprising a material which is electrically conductive; providing an insulating inorganic metal oxide dielectric layer over the electrically conductive third layer; providing an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; and providing an electrically conductive interconnect to extend over the second insulative layer and electrically interconnect the first and third conductive layers.
Claim 2
Independent Claim
115 words
A method of forming a capacitor comprising the following steps: providing a node to which electrical connection to a capacitor is to be made; providing an electrically conductive first layer over the node; providing an electrically insulative barrier second layer over the first conductive layer; providing a third layer over the electrically insulative barrier layer, the third layer comprising a material which is electrically conductive; providing an insulating inorganic metal oxide dielectric layer over the electrically conductive third layer; providing an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; and providing an electrically conductive interconnect to extend over the second insulative layer and electrically interconnect the first and third conductive layers.
Claim 3
Dependent Claim
54 words
The method of forming a capacitor of claim 1 wherein the first layer comprises a material which is reactable to form an electrically insulating material, and the barrier second layer restricts reaction of the first electrically conductive layer to an insulating material during the step of providing the insulating inorganic metal oxide dielectric layer.
Claim 4
Dependent Claim
32 words
The method of forming a capacitor of claim 1 wherein the barrier second layer forms a diffusion barrier to out-diffusion of components of the first electrically conductive layer to the third layer.
Claim 5
Dependent Claim
98 words
The method of forming a capacitor of claim 1 wherein, the first layer comprises a material which is reactable to form an electrically insulating material; and the barrier second layer comprises a composite of discrete fifth and sixth electrically insulative layers, one of the fifth and sixth layers restricting reaction of the first electrically conductive layer to an insulating material during the step of providing the insulating inorganic metal oxide dielectric layer, the other of the fifth and sixth layers forming a diffusion barrier to out-diffusion of components of the first electrically conductive layer to the third layer.
Claim 6
Dependent Claim
17 words
The method of forming a capacitor of claim 1 wherein the first layer comprises conductively doped polysilicon.
Claim 7
Dependent Claim
39 words
The capacitor of claim 1 wherein the electrically insulative oxidation barrier layer is selected from the group consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , SiO 2 and AlN, and mixtures thereof.
Claim 8
Dependent Claim
21 words
The method of forming a capacitor of claim 1 wherein the insulating inorganic metal oxide dielectric layer comprises a ferroelectric material.
Claim 9
Dependent Claim
35 words
The method of forming a capacitor of claim 1 wherein the insulating inorganic metal oxide dielectric layer comprises a material selected from the group consisting of titanates, zirconates, niobates, tantalates and nitrates, and mixtures thereof.
Claim 10
Dependent Claim
56 words
The method of forming a capacitor of claim 1 wherein the electrically insulative oxidation barrier second layer is selected from the group consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , SiO 2 and AlN, and mixtures thereof, and the insulating inorganic metal oxide dielectric layer comprises a ferroelectric material.
Claim 11
Dependent Claim
16 words
The method of forming a capacitor of claim 1 wherein the third layer comprises elemental platinum.
Claim 12
Dependent Claim
25 words
The method of forming a capacitor of claim 1 wherein the third layer comprises elemental Ru which upon oxidation is transformed to RuO 2 .
Claim 13
Dependent Claim
20 words
The method of forming a capacitor of claim 1 wherein the third layer as initially provided comprises RuO 2 .
Claim 14
Dependent Claim
24 words
The method of forming a capacitor of claim 1 wherein the first layer comprises conductively doped polysilicon, and the third layer comprises elemental platinum.
Claim 15
Dependent Claim
26 words
The method of forming a capacitor of claim 1 wherein the first layer comprises conductively doped polysilicon, and the third layer ultimately comprises RuO 2 .
Claim 16
Dependent Claim
58 words
The method of forming a capacitor of claim 1 wherein the electrically insulative oxidation barrier second layer is selected from the group consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , SiO 2 and AlN, and mixtures thereof; the first layer comprises conductively doped polysilicon, and the third layer comprises elemental platinum.
Claim 17
Dependent Claim
65 words
The method of forming a capacitor of claim 1 wherein the electrically insulative oxidation barrier second layer is selected from the group consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , and AlN, and mixtures thereof; the first layer comprises conductively doped polysilicon, and the third layer comprises elemental Ru which upon oxidation is transformed to RuO 2 .
Claim 18
Dependent Claim
16 words
The method of forming a capacitor of claim 1 wherein the electrically conductive interconnect comprises TiN.
Claim 19
Dependent Claim
62 words
The method of forming a capacitor of claim 1 wherein the step of providing the electrically conductive interconnect comprises: undercut etching the insulative barrier second layer selectively relative to the first and third layers to expose the first and third layers; and depositing a conformal electrically conductive layer over the exposed first and third layers for definition of the electrically conductive interconnect.
Claim 20
Dependent Claim
26 words
The method of forming a capacitor of claim 1 wherein the step of providing the electrically conductive interconnect occurs last in the stated claim 1 steps.
Claim 21
Dependent Claim
71 words
The method of forming a capacitor of claim 1 wherein the step of providing the electrically conductive interconnect occurs last in the stated claim 1 steps, and comprises: undercut etching the insulative barrier second layer selectively relative to the first and third layers to expose the first and third layers; and depositing a conformal electrically conductive layer over the exposed first and third layers for definition of the electrically conductive interconnect.
Claim 22
Independent Claim
209 words
A method of forming a capacitor comprising the following steps: providing a node to which electrical connection to a capacitor is to be made; forming an electrically conductive first layer over the node, the first layer comprising a material which is reactable to form an electrically insulating material; forming an electrically insulative barrier second layer over the first conductive layer, the second layer comprising a composite of discrete layers of electrically insulative material, one of the discrete material layers restricting reaction of the first electrically conductive layer to an insulating material, and another of the discrete layers forming a diffusion barrier to out-diffusion of components of the first electrically conductive layer; forming a third layer of electrically conductive material over the second electrically insulative layer; forming an insulating inorganic metal oxide dielectric layer over the electrically conductive third layer, the insulating inorganic metal oxide dielectric layer comprising a ferroelectric material selected from the group consisting of titanates, zirconates, niobates, tantalates, and nitrates, and mixtures thereof; forming an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; and forming an electrically conductive interconnect which extends over the second insulative layer and electrically interconnects the first and third conductive layers, and wherein the electrically conductive interconnect comprises TiN.
Claim 23
Independent Claim
209 words
A method of forming a capacitor comprising the following steps: providing a node to which electrical connection to a capacitor is to be made; forming an electrically conductive first layer over the node, the first layer comprising a material which is reactable to form an electrically insulating material; forming an electrically insulative barrier second layer over the first conductive layer, the second layer comprising a composite of discrete layers of electrically insulative material, one of the discrete material layers restricting reaction of the first electrically conductive layer to an insulating material, and another of the discrete layers forming a diffusion barrier to out-diffusion of components of the first electrically conductive layer; forming a third layer of electrically conductive material over the second electrically insulative layer; forming an insulating inorganic metal oxide dielectric layer over the electrically conductive third layer, the insulating inorganic metal oxide dielectric layer comprising a ferroelectric material selected from the group consisting of titanates, zirconates, niobates, tantalates, and nitrates, and mixtures thereof; forming an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; and forming an electrically conductive interconnect which extends over the second insulative layer and electrically interconnects the first and third conductive layers, and wherein the electrically conductive interconnect comprises TiN.
Claim 24
Independent Claim
219 words
A method of forming a capacitor, comprising: providing a node to which electrical connection is to be made; forming a first conductively doped polysilicon layer over the node; forming an electrically insulative barrier second layer over the first layer, the second layer comprising a composite of discrete layers of electrically insulative material selected from the groups consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , SiO 2 and AlN and mixtures thereof, one of the discrete insulative material layers restricting reaction of the first conductively doped polysilicon layer to an insulating material, and another of the discrete layers forming a diffusion barrier to out-diffusion of components of the first conductively doped polysilicon layer; forming a third layer of elemental platinum over the second electrically insulative layer; forming an insulating inorganic metal oxide dielectric layer over the elemental platinum third layer, the insulating metal oxide dielectric layer selected from the group consisting of titanates, zirconates, niobates, tantalates, nitrates, and mixtures thereof; forming an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; and forming an electrically conductive interconnect which extends over the electrically insulative barrier second layer and electrically interconnects the first conductively doped polysilicon layer with the third layer of elemental platinum, and wherein the electrically conductive interconnect comprises TiN.
Claim 25
Independent Claim
219 words
A method of forming a capacitor, comprising: providing a node to which electrical connection is to be made; forming a first conductively doped polysilicon layer over the node; forming an electrically insulative barrier second layer over the first layer, the second layer comprising a composite of discrete layers of electrically insulative material selected from the groups consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , SiO 2 and AlN and mixtures thereof, one of the discrete insulative material layers restricting reaction of the first conductively doped polysilicon layer to an insulating material, and another of the discrete layers forming a diffusion barrier to out-diffusion of components of the first conductively doped polysilicon layer; forming a third layer of elemental platinum over the second electrically insulative layer; forming an insulating inorganic metal oxide dielectric layer over the elemental platinum third layer, the insulating metal oxide dielectric layer selected from the group consisting of titanates, zirconates, niobates, tantalates, nitrates, and mixtures thereof; forming an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; and forming an electrically conductive interconnect which extends over the electrically insulative barrier second layer and electrically interconnects the first conductively doped polysilicon layer with the third layer of elemental platinum, and wherein the electrically conductive interconnect comprises TiN.
Claim 26
Independent Claim
242 words
A method of forming a capacitor, comprising; providing a node to which electrical connection is to be made; forming a first conductively doped polysilicon layer over the node; forming an electrically insulative oxidation barrier second layer over the first layer, the second layer comprising a composite of discrete layers of electrically insulative material selected from the group consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , SiO 2 and AlN and mixtures thereof, one of the discrete insulative material layers restricting reaction of the first conductively doped polysilicon layer to an insulating material and another of the discrete layers forming a diffusion barrier to out-diffusion of components of the first conductively doped polysilicon layer; forming a third layer of RuO 2 over the second electrically insulative layer; forming an insulating inorganic metal oxide dielectric layer over the third layer of RuO 2 , the insulating inorganic metal oxide dielectric layer selected from the group consisting of titanates, zirconates, niobates, tantalates, nitrates, and mixtures thereof; forming an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; undercut etching the oxidation barrier second layer selectively relative to the first conductively doped polysilicon layer and the third layer of RuO 2 to expose the first and third layers; and depositing a conformed electrically conductive layer over the exposed first and third layers to form an electrically conductive interconnect and wherein the electrically conductive interconnect comprises TiN.
Claim 27
Independent Claim
242 words
A method of forming a capacitor, comprising; providing a node to which electrical connection is to be made; forming a first conductively doped polysilicon layer over the node; forming an electrically insulative oxidation barrier second layer over the first layer, the second layer comprising a composite of discrete layers of electrically insulative material selected from the group consisting of Al 2 O 3 , TiO 2 , Si 3 N 4 , SiO 2 and AlN and mixtures thereof, one of the discrete insulative material layers restricting reaction of the first conductively doped polysilicon layer to an insulating material and another of the discrete layers forming a diffusion barrier to out-diffusion of components of the first conductively doped polysilicon layer; forming a third layer of RuO 2 over the second electrically insulative layer; forming an insulating inorganic metal oxide dielectric layer over the third layer of RuO 2 , the insulating inorganic metal oxide dielectric layer selected from the group consisting of titanates, zirconates, niobates, tantalates, nitrates, and mixtures thereof; forming an electrically conductive fourth layer over the insulating inorganic metal oxide dielectric layer; undercut etching the oxidation barrier second layer selectively relative to the first conductively doped polysilicon layer and the third layer of RuO 2 to expose the first and third layers; and depositing a conformed electrically conductive layer over the exposed first and third layers to form an electrically conductive interconnect and wherein the electrically conductive interconnect comprises TiN.
References Cited (Backward Citations)
US5102820A
Cited
US5053351A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2000-08-04 | 2001-02-03 | 2001-08-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-08-04 | 2005-02-03 | 2005-08-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-08-04 | 2009-02-03 | 2009-08-05 | $7700.00 | Window Closed / Lapsed |