Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
81 words
A semiconductor wafer, comprising: a) a plurality of semiconductor chip regions, comprising: (1) device regions to form a device structure thereon, the device structure having electrodes electrically connected to active regions provided therein; and (2) a buffer region provided on a periphery of the device region; and b) an insulating layer having moisture permeability for electrically insulating the electrodes therebetween, the insulating layer being formed over the device regions while being removed from a buffer region of the semiconductor chip regions.
Claim 2
Dependent Claim
81 words
A semiconductor wafer, comprising: a) a plurality of semiconductor chip regions, comprising: (1) device regions to form a device structure thereon, the device structure having electrodes electrically connected to active regions provided therein; and (2) a buffer region provided on a periphery of the device region; and b) an insulating layer having moisture permeability for electrically insulating the electrodes therebetween, the insulating layer being formed over the device regions while being removed from a buffer region of the semiconductor chip regions.
Claim 3
Dependent Claim
30 words
A semiconductor wafer according to claim 1, further comprising: (c) scribe regions provided between the plurality of semiconductor chip regions, the buffer region being separately provided from the scribe regions.
Claim 4
Dependent Claim
18 words
A semiconductor wafer according to claim 1, wherein the buffer region has a width of about 50 micrometers.
Claim 5
Dependent Claim
59 words
A semiconductor wafer according to claim 1, wherein the insulating layer comprising: (1) a first insulating layer deposited over the device region; (2) a second insulating layer deposited over the insulating layer and having moisture permeability, wherein the second insulating layer being removed in the buffer region; and (3) a third insulating layer deposited over the second insulating layer.
Claim 6
Dependent Claim
17 words
A semiconductor wafer according to claim 4, wherein the first and third insulating layer comprise silicon dioxide.
Claim 7
Dependent Claim
14 words
A semiconductor wafer according to claim 4, wherein the second insulating layer comprises spin-on-glass.
Claim 8
Dependent Claim
99 words
A semiconductor wafer comprising: (a) a plurality of semiconductor chip regions, comprising: (1) device regions to form a device structure thereon; and (2) a buffer region provided on a periphery of the device regions; and (b) a laminated insulating layer structure formed over the semiconductor chip regions, but not over the buffer region, said laminated insulating layer structure comprising: (1) a first insulating sublayer deposited over the semiconductor region: (2) a second insulating sublayer deposited over the first insulating sublayer, the second insulating sublayer having moisture permeability; and (3) a third insulating sublayer deposited over the second insulating sublayer.
Claim 9
Dependent Claim
99 words
A semiconductor wafer comprising: (a) a plurality of semiconductor chip regions, comprising: (1) device regions to form a device structure thereon; and (2) a buffer region provided on a periphery of the device regions; and (b) a laminated insulating layer structure formed over the semiconductor chip regions, but not over the buffer region, said laminated insulating layer structure comprising: (1) a first insulating sublayer deposited over the semiconductor region: (2) a second insulating sublayer deposited over the first insulating sublayer, the second insulating sublayer having moisture permeability; and (3) a third insulating sublayer deposited over the second insulating sublayer.
Claim 10
Dependent Claim
29 words
A semiconductor wafer according to claim 7, further comprising: (c) scribe regions provided between the plurality of semiconductor-chip regions, the buffer region being separately provided from the scribe regions.
Claim 11
Dependent Claim
18 words
A semiconductor wafer according to claim 7, wherein the buffer region has a width of about 50 micrometer.
Claim 12
Dependent Claim
17 words
A semiconductor wafer according to claim 7, wherein the first and third insulating layers comprise silicon dioxide.
Claim 13
Dependent Claim
14 words
A semiconductor wafer according to claim 7, wherein the second insulating layer comprises spin-on-glass.