US5629225A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of making a cylindrical electrode
Assignee: Texas Instruments Inc
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Filing: 1995-06-07
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Granted: 1997-05-13
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Expires: 2015-06-07
Abstract
Abstract A manufacturing method for a dynamic RAM containing a screen-type structure cylindrical stack cell capacitor. An SiO 2 layer 22 is formed on a polysilicon layer 11 (or a semiconductor substrate 1) to serve as a preform or spacer. A nitride layer 31 is stacked on this SiO 2 layer, and nitride layer 31 and SiO 2 layer 22 are worked into virtually the same pattern. Then the outside surface of SiO 2 layer 22 is etched using nitride layer 31 as a mask, causing the nitride layer 31 to form a lateral projection structure 31A in the region removed by the etching. A polysilicon layer 23 is adhered to the top of silicon layer 11, which serves as a capacitor lower electrode, from the top of nitride layer 31 and SiO 2 layer 22, including this projected portion. Polysilicon layer 23 is etched to leave a portion of polysilicon layer 23 on the outside surface of SiO 2 layer 22 directly beneath the projecting portion 31A of nitride layer 31.
Inventors
- 👤 Takashi Iwakiri
- 👤 Kiyomi Hirose
- 👤 Hiroto Shinozuka
- 👤 Osaomi Enomoto
- 👤 Yasuhiro Okumoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 05:45
CPC Classifications
H; H10; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/03; H10B12/033; H10B12/30; H10B12/31; H10B12/318; H10D; H10D1/00; H10D1/01; H10D1/041; H10D1/042; H10D1/60; H10D1/68; H10D1/692; H10D1/711; H10D1/716; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/0144
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
196 words
A semiconductor manufacturing method for a cylindrical electrode, comprising the steps of: providing a base layer; depositing a preform layer of SiO 2 of depth h on the base layer; depositing a working layer of Si 3 N 4 on the preform layer; etching the working and preform layers into an island so the working and preform layers each have a respective peripheral surface; using the working layer as a mask, acid etching the peripheral surface of the preform layer so that a projecting portion of the working layer projects over the preform layer a distance w; CVD depositing a first electrode layer of amorphous silicon to cover the working and preform layers, including the projecting portion of the working layer, and the base layer, and heating the first electrode layer to convert its amorphous silicon to conducting polysilicon; direct dry etching away the first electrode layer so that only a remainder portion of height h and thickness w remains on the peripheral surface of the preform layer beneath the projecting portion of the working layer; and successively acid etching away the working and preform layers to expose the remainder portion of the first electrode layer.
Claim 2
Dependent Claim
196 words
A semiconductor manufacturing method for a cylindrical electrode, comprising the steps of: providing a base layer; depositing a preform layer of SiO 2 of depth h on the base layer; depositing a working layer of Si 3 N 4 on the preform layer; etching the working and preform layers into an island so the working and preform layers each have a respective peripheral surface; using the working layer as a mask, acid etching the peripheral surface of the preform layer so that a projecting portion of the working layer projects over the preform layer a distance w; CVD depositing a first electrode layer of amorphous silicon to cover the working and preform layers, including the projecting portion of the working layer, and the base layer, and heating the first electrode layer to convert its amorphous silicon to conducting polysilicon; direct dry etching away the first electrode layer so that only a remainder portion of height h and thickness w remains on the peripheral surface of the preform layer beneath the projecting portion of the working layer; and successively acid etching away the working and preform layers to expose the remainder portion of the first electrode layer.
Claim 3
Dependent Claim
60 words
The method of claim 1 wherein the base layer is provided with a nonconductive protective base layer having a level differential portion, covered by a conductive base layer; and the step of direct dry etching the first electrode layer also cleanly removes the conductive base layer from the level differential portion of the nonconductive protective layer without leaving a residue.
Claim 4
Dependent Claim
92 words
The method of claim 1, further comprising the steps of: after CVD depositing and heating the first electrode layer, depositing a protective layer of SiO 2 over the electrode layer; etching the entire surface of the protective layer so that a remainder portion of the protective layer remains indented on a peripheral surface of the first electrode layer which is beneath the projecting portion of the working layer; and during the step of successively acid etching away the working and preform layers, also etching away the remainder portion of the protective layer.
Claim 5
Dependent Claim
58 words
The method of claim 1 further comprising the steps of: after successively acid etching away the working and preform layers, forming a dielectric layer over the remainder portion of the first electrode layer; and depositing a second electrode layer of conducting material on the dielectric layer; whereby the first electrode, dielectric layer, and second electrode form a capacitor.
References Cited (Backward Citations)
US5164337A
Cited
US5436187A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-05-12 | 2000-11-11 | 2001-05-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-05-12 | 2004-11-11 | 2005-05-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-05-12 | 2008-11-11 | 2009-05-13 | $7700.00 | Window Closed / Lapsed |