Patent US5624858A successfully refreshed from Google Patents.
US5624858A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of manufacturing a semiconductor device with increased breakdown voltage
Assignee: Mitsubishi Electric Corp
•
Filing: 1995-12-21
•
Granted: 1997-04-29
•
Expires: 2015-12-21
Abstract
Abstract A low concentration impurity region 6 of a second conductivity type is formed to cover lower portion of a high concentration impurity region 8 of the second conductivity type. Consequently, impurity concentration gradient between the high concentration impurity region 8 of the second conductivity type and the low concentration impurity layer 2 of a first conductivity type can be made moderate to relax the electric field, which leads to provision of higher breakdown voltage of the semiconductor device. Further, the depth of impurity diffusion of the low concentration impurity region 6 of the second conductivity type from the main surface of the low concentration impurity layer 2 of the first conductivity type is made at least three times the depth of impurity diffusion of the high concentration impurity region 8 of the second conductivity type from the main surface of the low concentration impurity layer 2 of the first conductivity type. Therefore, minimum dimensions necessary for suppressing the electric field can be set in the semiconductor device, and therefore the semiconductor device comes to have higher breakdown voltage efficiently while not preventing miniaturization.
Inventors
- 👤 Tomohide Terashima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 17:28
CPC Classifications
H; H10; H10W; H10W15/00; H10D; H10D62/00; H10D62/10; H10D62/17; H10D62/351; H10D62/357; H10D62/364; H10D62/371; H10D84/00; H10D84/80; H10D84/82; H10D84/83; H10D84/85; H10D84/858; H10W15/01
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
217 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said first mask is positioned displaced from the interface of said low concentration impurity layer of the first conductivity type by a distance which is equal to the depth of impurity diffusion of said low concentration impurity region of the second conductivity type from said main surface of the low concentration impurity layer of the first conductivity type, in accordance with a log scale.
Claim 2
Independent Claim
217 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said first mask is positioned displaced from the interface of said low concentration impurity layer of the first conductivity type by a distance which is equal to the depth of impurity diffusion of said low concentration impurity region of the second conductivity type from said main surface of the low concentration impurity layer of the first conductivity type, in accordance with a log scale.
Claim 3
Independent Claim
220 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said second mask is positioned displaced from a position where a quadratic differential of the impurity concentration assumes a positive maximum value by a distance which is equal to the depth of impurity diffusion of said high concentration impurity region of the second conductivity type from said main surface of said low concentration impurity layer of said first conductivity type, in accordance with a log scale.
Claim 4
Independent Claim
220 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said second mask is positioned displaced from a position where a quadratic differential of the impurity concentration assumes a positive maximum value by a distance which is equal to the depth of impurity diffusion of said high concentration impurity region of the second conductivity type from said main surface of said low concentration impurity layer of said first conductivity type, in accordance with a log scale.
Claim 5
Independent Claim
259 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said low concentration impurity region of the second conductivity type and said step of forming said high concentration impurity region of the second conductivity type include the step of introducing impurities such that depth of diffusion of impurities from said main surface of said low concentration impurity region of the first conductivity type to said low concentration impurity region of the second conductivity type is at least three times the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said high concentration impurity region of the second conductivity type.
Claim 6
Independent Claim
259 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said low concentration impurity region of the second conductivity type and said step of forming said high concentration impurity region of the second conductivity type include the step of introducing impurities such that depth of diffusion of impurities from said main surface of said low concentration impurity region of the first conductivity type to said low concentration impurity region of the second conductivity type is at least three times the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said high concentration impurity region of the second conductivity type.
Claim 7
Independent Claim
239 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said high concentration impurity region of the second conductivity type includes the step of forming the high concentration impurity region of the second conductivity type such that it has a closed planar pattern including corners, each corner having an arch which has a diameter of at least three times the depth of diffusion of impurities from the main surface of said low concentration impurity layer of the first conductivity type to said high concentration impurity region of the second conductivity type.
Claim 8
Independent Claim
239 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said high concentration impurity region of the second conductivity type includes the step of forming the high concentration impurity region of the second conductivity type such that it has a closed planar pattern including corners, each corner having an arch which has a diameter of at least three times the depth of diffusion of impurities from the main surface of said low concentration impurity layer of the first conductivity type to said high concentration impurity region of the second conductivity type.
Claim 9
Independent Claim
238 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said low concentration impurity region of the second conductivity type includes the step of forming the low concentration impurity region of the second conductivity type such that it has a closed planar pattern including corners, each corner having an arch which has a diameter of at least three times the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said low concentration impurity region of the second conductivity type.
Claim 10
Independent Claim
238 words
A method of manufacturing a semiconductor device, comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity layer of the first conductivity type by using a second mask having prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said low concentration impurity region of the second conductivity type includes the step of forming the low concentration impurity region of the second conductivity type such that it has a closed planar pattern including corners, each corner having an arch which has a diameter of at least three times the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said low concentration impurity region of the second conductivity type.
Claim 11
Independent Claim
315 words
A method of manufacturing a semiconductor device comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity, layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said high concentration impurity region of the second conductivity type and said step of forming said low concentration impurity region of the second conductivity type includes the step of forming these regions such that these regions each have closed planar pattern including corners, each corner having an arch of a prescribed diameter, and that difference in diameter of the arch at the corner of said high concentration impurity region of the second conductivity type and said low concentration impurity region of said second conductivity type is made larger than the difference between the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said low concentration impurity region of the second conductivity type and the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said high concentration impurity region of the second conductivity type.
Claim 12
Independent Claim
315 words
A method of manufacturing a semiconductor device comprising the steps of: introducing impurities of a second conductivity type to a prescribed region of a main surface of a low concentration impurity layer of a first conductivity type by using a first mask having a prescribed pattern to form a low concentration impurity region of a second conductivity type; introducing impurities of the second conductivity type to a prescribed region of the main surface of said low concentration impurity, layer of the first conductivity type by using a second mask having a prescribed pattern so as to form a high concentration impurity region of a second conductivity type with its lower portion covered by said low concentration impurity region of the second conductivity type; and forming a low concentration impurity layer of the second conductivity type by epitaxial growth on the main surface of said low concentration impurity layer of the first conductivity type, wherein said step of forming said high concentration impurity region of the second conductivity type and said step of forming said low concentration impurity region of the second conductivity type includes the step of forming these regions such that these regions each have closed planar pattern including corners, each corner having an arch of a prescribed diameter, and that difference in diameter of the arch at the corner of said high concentration impurity region of the second conductivity type and said low concentration impurity region of said second conductivity type is made larger than the difference between the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said low concentration impurity region of the second conductivity type and the depth of diffusion of impurities from said main surface of said low concentration impurity layer of the first conductivity type to said high concentration impurity region of the second conductivity type.
References Cited (Backward Citations)
US3460006A
Cited
US3622842A
Cited
JPS5411682A
Cited
US5218228A
Cited
JPH0271526A
Cited
JPH02170571A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-04-28 | 2000-10-28 | 2001-04-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-04-28 | 2004-10-28 | 2005-04-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-04-28 | 2008-10-28 | 2009-04-29 | $7700.00 | Window Closed / Lapsed |