US5621235A
Expired / Lapsed
US
⏱️ 0.0 years remaining
TiSi2 /TiN clad interconnect technology
Assignee: Texas Instruments Inc
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Filing: 1995-06-07
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Granted: 1997-04-15
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Expires: 2015-06-07
Abstract
Abstract A TiSi2/TiN clad LI strap process and structure are disclosed which combine the advantages of both TiSi2 and TiN LI processes. According to the invention, the retention of a thin TiN layer between the local interconnect and contacts provides a diffusion barrier against counterdoping and relaxes the thermal budget for subsequent processing.
Inventors
- 👤 Shin-puu Jeng
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 13:49
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/064; H10W20/066; H10W20/0698; H10W20/40; H10W20/41; H10W20/44; H10W20/4403; H10W20/4437; H10W20/4441; Y; Y10; Y10S; Y10S257/00; Y10S257/915
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
62 words
A local interconnect structure comprising: a local interconnect strap; a barrier region adjacent said strap; a first conductive region adjacent a first portion of said barrier layer region; and a second conductive region adjacent a second portion of said barrier layer region, said barrier layer region and said local interconnect strap extending from said first conductive region to said second conductive region.
Claim 2
Dependent Claim
62 words
A local interconnect structure comprising: a local interconnect strap; a barrier region adjacent said strap; a first conductive region adjacent a first portion of said barrier layer region; and a second conductive region adjacent a second portion of said barrier layer region, said barrier layer region and said local interconnect strap extending from said first conductive region to said second conductive region.
Claim 3
Dependent Claim
16 words
A local interconnect structure as recited in claim 1 wherein said barrier layer region comprises TiN.
Claim 4
Dependent Claim
18 words
A local interconnect structure as recited in claim 1 wherein said local interconnect strap comprises TiSi 2 .
Claim 5
Dependent Claim
16 words
The local interconnect structure of claim 1, wherein said first and second conductive regions comprise silicide.
References Cited (Backward Citations)
US4746219A
Cited
JPS6358943A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-04-14 | 2000-10-14 | 2001-04-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-04-14 | 2004-10-14 | 2005-04-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-04-14 | 2008-10-14 | 2009-04-15 | $7700.00 | Window Closed / Lapsed |