Patent US5616208A successfully refreshed from Google Patents.
US5616208A
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Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus
Assignee: Tokyo Electron Ltd
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Filing: 1994-06-07
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Granted: 1997-04-01
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Expires: 2014-06-07
Abstract
Abstract A vacuum processing apparatus includes a plurality of vacuum processing chambers for processing a target object using a process gas, a vacuum convey chamber, connected to the plurality of vacuum processing chambers, for loading/unloading the target object into/from the processing chambers, an opening/closing means opened/closed to cause the plurality of vacuum processing chambers to communicate with the vacuum convey chamber, and a cleaning gas supply means for supplying a cleaning gas containing ClF3 into at least one of the vacuum convey chamber and the plurality of vacuum processing chambers. The cleaning gas is supplied-into the plurality of vacuum processing chambers and the vacuum convey chamber communicating with each other by opening the opening/closing means to clean the plurality of vacuum processing chambers and the vacuum convey chamber.
Inventors
- 👤 Hideki Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:37
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/34; H10P72/3402; B; B08; B08B; B08B7/00; B08B7/0035; B08B7/0042; C; C23; C23C; C23C14/00; C23C14/22; C23C14/56; C23C14/564; C23C16/00; C23C16/44; C23C16/4401; C23C16/4405; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H01J37/32798; H01J37/32853; H01J37/32862; H10P72/04; H10P72/0402; H10P72/0451; H10P72/0452; H10P72/0454; H10P72/0462; Y; Y10; Y10S; Y10S438/00; Y10S438/905
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
131 words
A processing apparatus comprising: a plurality of vacuum processing chambers for processing a target object using a process gas; a vacuum convey chamber, connected to said plurality of vacuum processing chambers, for loading and unloading the target object into and from said vacuum processing chambers; opening means for opening an interior of said apparatus to atmospheric air; cleaning gas supply means for supplying a cleaning gas containing ClF 3 into said processing chambers and said convey chamber; exhaust means for exhausting the cleaning gas; concentration detection means for detecting Cl and F concentrations in the gas after completion of cleaning using the cleaning gas; and control means for outputting an opening command to said opening means when a detection value of said concentration detection means is smaller than a set value.
Claim 2
Dependent Claim
131 words
A processing apparatus comprising: a plurality of vacuum processing chambers for processing a target object using a process gas; a vacuum convey chamber, connected to said plurality of vacuum processing chambers, for loading and unloading the target object into and from said vacuum processing chambers; opening means for opening an interior of said apparatus to atmospheric air; cleaning gas supply means for supplying a cleaning gas containing ClF 3 into said processing chambers and said convey chamber; exhaust means for exhausting the cleaning gas; concentration detection means for detecting Cl and F concentrations in the gas after completion of cleaning using the cleaning gas; and control means for outputting an opening command to said opening means when a detection value of said concentration detection means is smaller than a set value.
Claim 3
Dependent Claim
58 words
An apparatus according to claim 1, further comprising: a preliminary vacuum chamber connected to said vacuum convey chamber; an object storage chamber for storing the target object; and a second convey chamber, arranged between said preliminary vacuum chamber and said object storage chamber, for conveying the target object between said preliminary vacuum chamber and said object storage chamber.
Claim 4
Independent Claim
129 words
A method for cleaning a vacuum processing apparatus comprising: a plurality of vacuum processing chambers for processing a target object using a process gas; and a vacuum convey chamber, connected to said plurality of vacuum processing chambers, for loading and unloading the target object into and from said processing chambers, said method comprising the steps of: supplying a cleaning gas containing ClF 3 into said plurality of vacuum processing chambers and said vacuum convey chamber to clean said plurality of vacuum processing chambers and said vacuum convey chamber; evacuating said vacuum processing chambers and said vacuum convey chamber upon completion of cleaning; and intermittently supplying an inert gas into said plurality of vacuum processing chambers and said vacuum convey chamber and stopping the supply while the evacuation is performed.
Claim 5
Independent Claim
129 words
A method for cleaning a vacuum processing apparatus comprising: a plurality of vacuum processing chambers for processing a target object using a process gas; and a vacuum convey chamber, connected to said plurality of vacuum processing chambers, for loading and unloading the target object into and from said processing chambers, said method comprising the steps of: supplying a cleaning gas containing ClF 3 into said plurality of vacuum processing chambers and said vacuum convey chamber to clean said plurality of vacuum processing chambers and said vacuum convey chamber; evacuating said vacuum processing chambers and said vacuum convey chamber upon completion of cleaning; and intermittently supplying an inert gas into said plurality of vacuum processing chambers and said vacuum convey chamber and stopping the supply while the evacuation is performed.
Claim 6
Dependent Claim
80 words
A vacuum processing apparatus comprising: a vacuum processing chamber for processing a target object using a process gas; cleaning gas supply means for supplying a cleaning gas into said vacuum processing chamber; and replacement command means, prestoring an amount of wear or damage of a component part of said processing chamber caused by the cleaning gas, for commanding replacement of said component part on the basis of a value of the amount of wear and a number of cleaning cycles.
Claim 7
Dependent Claim
80 words
A vacuum processing apparatus comprising: a vacuum processing chamber for processing a target object using a process gas; cleaning gas supply means for supplying a cleaning gas into said vacuum processing chamber; and replacement command means, prestoring an amount of wear or damage of a component part of said processing chamber caused by the cleaning gas, for commanding replacement of said component part on the basis of a value of the amount of wear and a number of cleaning cycles.
Claim 8
Dependent Claim
115 words
A vacuum processing apparatus comprising: a plurality of vacuum processing chambers for processing a target object using a process gas; a vacuum convey chamber, connected to said plurality of vacuum processing chambers, for loading and unloading the target object into and from said vacuum processing chambers; cleaning gas supply means for supplying a cleaning gas into said plurality of vacuum processing chambers and said vacuum convey chamber; and replacement command means, prestoring an amount of wear or damage of a component part of said processing chamber caused by the cleaning gas, for commanding replacement of said component part on the basis of a value of the amount of wear and a number of cleaning cycles.
Claim 9
Dependent Claim
115 words
A vacuum processing apparatus comprising: a plurality of vacuum processing chambers for processing a target object using a process gas; a vacuum convey chamber, connected to said plurality of vacuum processing chambers, for loading and unloading the target object into and from said vacuum processing chambers; cleaning gas supply means for supplying a cleaning gas into said plurality of vacuum processing chambers and said vacuum convey chamber; and replacement command means, prestoring an amount of wear or damage of a component part of said processing chamber caused by the cleaning gas, for commanding replacement of said component part on the basis of a value of the amount of wear and a number of cleaning cycles.
Claim 10
Dependent Claim
76 words
A vacuum processing method using a vacuum processing apparatus for processing a target object using a process gas, comprising the steps of: processing the target object using said vacuum processing apparatus; cleaning said vacuum processing apparatus with a cleaning gas; and recognizing a number of cleaning cycles for replacement of a component part on the basis of the amount of wear or damage of the component part of said processing apparatus caused by the cleaning gas.
Claim 11
Dependent Claim
76 words
A vacuum processing method using a vacuum processing apparatus for processing a target object using a process gas, comprising the steps of: processing the target object using said vacuum processing apparatus; cleaning said vacuum processing apparatus with a cleaning gas; and recognizing a number of cleaning cycles for replacement of a component part on the basis of the amount of wear or damage of the component part of said processing apparatus caused by the cleaning gas.
Claim 12
Dependent Claim
14 words
A method according to claim 6, wherein said cleaning gas contains ClF 3 .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-03-31 | 2000-09-30 | 2001-04-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-03-31 | 2004-09-30 | 2005-04-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-03-31 | 2008-09-30 | 2009-04-01 | $7700.00 | Window Closed / Lapsed |