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US5610684A Expired / Lapsed US ⏱️ 0.0 years remaining

Projection exposure apparatus

Assignee: Nikon Corp
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Filing: 1995-02-09
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Granted: 1997-03-11
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Expires: 2015-02-09
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Abstract

Abstract A projection exposure apparatus having an illuminating optical system for irradiating a mask having a pattern with illuminating light for exposure, and a projection optical system which is composed of a plurality of optical elements and arranged to take in light emanating from the pattern of the mask and to project an image of the pattern on a photosensitive substrate with predetermined image-forming characteristics. The projection exposure apparatus is provided with a movable retaining member for causing at least one of a plurality of lens elements constituting the projection optical system to move relative to the entire projection optical system in accordance with exchange, loading or unloading of an optical corrector plate, e.g., a pupil filter, which is disposed on a Fourier transform plane of the projection optical system.

Inventors

  • 👤 Naomasa Shiraishi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 13:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/70; G03F7/70216; G03F7/70308; G03F7/70241; G03F7/70325; G03F7/70333; G03F7/70358; G03F7/708; G03F7/70858

Claims Analysis

Total Claims: 26
Claim 1
Independent Claim 146 words
A projection exposure apparatus having an illuminating optical system for irradiating a mask having a pattern with illuminating light for exposure, and a projection optical system which is composed of a plurality of optical elements and arranged along an optical axis of said projection optical system to receive light emanating from the pattern of said mask and to project an image of said pattern on a photosensitive substrate with predetermined image-forming characteristics, said projection exposure apparatus comprising: an optical corrector plate inserting device whereby an optical corrector plate which changes a specific factor in said image-forming characteristics is removably inserted into a space including a Fourier transform plane of said projection optical system; and an optical element moving device for causing at least one of said optical elements to move relative to the entire projection optical system in accordance with insertion of said optical corrector plate.
Claim 2
Dependent Claim 146 words
A projection exposure apparatus having an illuminating optical system for irradiating a mask having a pattern with illuminating light for exposure, and a projection optical system which is composed of a plurality of optical elements and arranged along an optical axis of said projection optical system to receive light emanating from the pattern of said mask and to project an image of said pattern on a photosensitive substrate with predetermined image-forming characteristics, said projection exposure apparatus comprising: an optical corrector plate inserting device whereby an optical corrector plate which changes a specific factor in said image-forming characteristics is removably inserted into a space including a Fourier transform plane of said projection optical system; and an optical element moving device for causing at least one of said optical elements to move relative to the entire projection optical system in accordance with insertion of said optical corrector plate.
Claim 3
Dependent Claim 41 words
A projection exposure apparatus according to claim 1, wherein said optical corrector plate inserting device is an exchanging device that exchangeably inserts into said space one of a plurality of optical filters which are different in optical effect from one another.
Claim 4
Dependent Claim 39 words
A projection exposure apparatus according to claim 2, wherein one of said optical filters changes at least either one of transmittance and phase of transmitted light at a part of the Fourier transform plane in said projection optical system.
Claim 5
Dependent Claim 47 words
A projection exposure apparatus according to claim 2 or 3, wherein one of said optical filters reduces coherence between light passing through a specific region of the Fourier transform plane in said projection optical system and light passing through the other region of the Fourier transform plane.
Claim 6
Dependent Claim 35 words
A projection exposure apparatus according to claim 2, wherein one of said optical filters causes no change to transmittance, phase or coherence of light passing through the Fourier transform plane in said projection optical system.
Claim 7
Dependent Claim 66 words
A projection exposure apparatus according to claim 1, wherein said optical corrector plate inserting device has a first movable member for supporting said optical corrector plate and for removably inserting it into said space, and said optical element moving device has a second movable member for supporting said at least one optical element and for causing it to move relative to the entire projection optical system.
Claim 8
Dependent Claim 116 words
A projection exposure apparatus according to claim 6, wherein said projection optical system is arranged so that another factor in said image-forming characteristics becomes most desirable in one of two states, that is, a first state where said optical corrector plate is out of an image-forming optical path, and a second state where said optical corrector plate lies in the image-forming optical path, said projection exposure apparatus further comprising a controller for driving said first and second movable members in association with each other so that said at least one optical element is moved by a predetermined amount to compensate for a change of said another factor in the other of said first and second states.
Claim 9
Dependent Claim 28 words
A projection exposure apparatus according to claim 6 or 7, wherein said specific factor in said image-forming characteristics is image depth, and said another factor is image aberration.
Claim 10
Dependent Claim 61 words
A projection exposure apparatus according to claim 8, wherein said optical corrector plate is formed from a light-transmitting disk having a radius not less than an effective radius r 0 of the Fourier transform plane of said projection optical system, said light-transmitting disk being arranged to radially change optical characteristics of bundles of image-forming rays distributed over said Fourier transform plane.
Claim 11
Dependent Claim 31 words
A projection exposure apparatus according to claim 9, wherein said light-transmitting disk radially and continuously changes the optical characteristics of the bundles of image-forming rays distributed over said Fourier transform plane.
Claim 12
Dependent Claim 31 words
A projection exposure apparatus according to claim 9, wherein said light-transmitting disk radially and stepwisely changes the optical characteristics of the bundles of image-forming rays distributed over said Fourier transform plane.
Claim 13
Dependent Claim 78 words
A projection exposure apparatus according to claim 9, wherein said light-transmitting disk has such light-attenuating characteristics that transmittance of a central circular region with a radius r 1 is made zero or lower than transmittance of an annular region with an inner radius r 1 and an outer radius r 0 , said radii r 1 and r 0 being set so as to satisfy the condition of about 0.3r 0 ≦r 1 ≦ about 0.7r 0 .
Claim 14
Dependent Claim 134 words
A projection exposure apparatus according to claim 9, wherein said light-transmitting disk has three regions, i.e., a central circular region with a radius r 1 , an inner annular region with an inner radius r 1 and an outer radius r 2 , and an outer annular region with an inner radius r 2 and an outer radius r 0 , said light-transmitting disk being formed from an optical material which vanishes coherence between at least ray bundles respectively passing through said inner and outer annular regions among the bundles of image-forming rays distributed over said Fourier transform plane, said radii r 0 , r 1 and r 2 being set so as to satisfy the condition of r 1 2 ≈r 2 2 -r 1 2 ≈r 0 2 -r 2 2 .
Claim 15
Dependent Claim 23 words
A projection exposure apparatus according to claim 13, wherein the central circular region of said light-attenuating disk is formed from a light-attenuating material.
Claim 16
Dependent Claim 41 words
A projection exposure apparatus according to claim 13, wherein said light-transmitting disk is formed from an optical material which vanishes coherence between a ray bundle passing through said central circular region and a ray bundle passing through said inner annular region.
Claim 17
Dependent Claim 36 words
A projection exposure apparatus according to claim 9, wherein said light-transmitting disk is formed from an optical phase material which radially varies amplitude transmittance for the bundles of image-forming rays distributed over said Fourier transform plane.
Claim 18
Dependent Claim 38 words
A projection exposure apparatus according to claim 16, wherein said light-transmitting disk is formed from an optical phase material which radially and continuously varies amplitude transmittance for the bundles of image-forming rays distributed over said Fourier transform plane.
Claim 19
Dependent Claim 38 words
A projection exposure apparatus according to claim 16, wherein said light-transmitting disk is formed from an optical phase material which radially and discretely varies amplitude transmittance for the bundles of image-forming rays distributed over said Fourier transform plane.
Claim 20
Dependent Claim 79 words
A projection exposure apparatus according to claim 9, wherein said projection optical system has a plurality of lens elements disposed along an optical axis between said mask and said Fourier transform plane, and a plurality of lens elements disposed along an optical axis between said Fourier transform plane and said photosensitive substrate, said second movable member causing at least one lens element near said Fourier transform plane in said projection optical system to move slightly along the optical axis.
Claim 21
Dependent Claim 95 words
A projection exposure apparatus having a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system for projecting an image of pattern of a mask on a substrate, said projection exposure apparatus comprising: an optical plate that changes image-forming characteristics adapted to be disposed in a space including a Fourier transform plane of said projection optical system; and an adjusting device for moving at least one of said optical elements to adjust an image aberration, wherein said image-forming characteristics include said image aberration.
Claim 22
Dependent Claim 95 words
A projection exposure apparatus having a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system for projecting an image of pattern of a mask on a substrate, said projection exposure apparatus comprising: an optical plate that changes image-forming characteristics adapted to be disposed in a space including a Fourier transform plane of said projection optical system; and an adjusting device for moving at least one of said optical elements to adjust an image aberration, wherein said image-forming characteristics include said image aberration.
Claim 23
Dependent Claim 79 words
A projection exposure method for projecting an image of pattern of a mask on a substrate using a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system, said projection exposure method comprising: inserting an optical plate into a space including a Fourier transform plane of said projection optical system; and moving at least one of said optical elements in accordance with insertion of said optical plate.
Claim 24
Dependent Claim 79 words
A projection exposure method for projecting an image of pattern of a mask on a substrate using a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system, said projection exposure method comprising: inserting an optical plate into a space including a Fourier transform plane of said projection optical system; and moving at least one of said optical elements in accordance with insertion of said optical plate.
Claim 25
Dependent Claim 85 words
A projection exposure method for projecting an image of pattern of a mask on a substrate using a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system, said projection exposure method comprising: moving an optical plate relative to a space including a Fourier transform plane of said projection optical system; and adjusting an image aberration by moving at least one of said optical elements in accordance with movement of said optical plate.
Claim 26
Dependent Claim 85 words
A projection exposure method for projecting an image of pattern of a mask on a substrate using a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system, said projection exposure method comprising: moving an optical plate relative to a space including a Fourier transform plane of said projection optical system; and adjusting an image aberration by moving at least one of said optical elements in accordance with movement of said optical plate.

References Cited (Backward Citations)

US4853756A Cited
US4936665A Cited
US5117255A Cited
US5348837A Cited
US5426521A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-03-10 2000-09-09 2001-03-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-03-10 2004-09-09 2005-03-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-03-10 2008-09-09 2009-03-11 $7700.00 Window Closed / Lapsed

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