US5592358A
Expired / Lapsed
US
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Electrostatic chuck for magnetic flux processing
Assignee: Applied Materials Inc
•
Filing: 1994-07-18
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Granted: 1997-01-07
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Expires: 2014-07-18
Abstract
Abstract An electrostatic chuck 20 for holding substrates 42 in a process chamber 40 containing a magnetic flux 43 comprises a base 22 having an upper surface adapted to support a substrate 42 thereon. An insulator 26 with an electrode 24 therein, is on the base 22. A magnetic shunt 34 comprising a ferromagnetic material is positioned (i) either on the base 22, or (ii) in the insulator 26, or (iii) directly below, and contiguous to, the base 22.
Inventors
- 👤 Shamouil Shamouilian
- 👤 John F. Cameron
- 👤 Chandra Deshpandey
- 👤 Yuh-Jia Su
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 21:43
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/70; H10P72/72; H10P72/722; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
87 words
An electrostatic chuck for holding a substrate in a process chamber during processing of the substrate in a magnetic flux, the electrostatic chuck comprising: (a) a base; (b) an insulator on the base, the insulator having a top surface for supporting the substrate thereon; (c) at least one non-ferromagnetic electrode in the insulator, the electrode capable of electrostatically holding the substrate; and (d) a ferromagnetic shunt in the insulator, the shunt capable of reducing the magnetic flux above the shunt to allow uniform processing of the substrate.
Claim 2
Dependent Claim
87 words
An electrostatic chuck for holding a substrate in a process chamber during processing of the substrate in a magnetic flux, the electrostatic chuck comprising: (a) a base; (b) an insulator on the base, the insulator having a top surface for supporting the substrate thereon; (c) at least one non-ferromagnetic electrode in the insulator, the electrode capable of electrostatically holding the substrate; and (d) a ferromagnetic shunt in the insulator, the shunt capable of reducing the magnetic flux above the shunt to allow uniform processing of the substrate.
Claim 3
Dependent Claim
29 words
The electrostatic chuck of claim 1, wherein the non-ferromagnetic electrode is positioned below a central portion of the substrate, and the ferromagnetic shunt is disposed circumferentially about the electrode.
Claim 4
Dependent Claim
32 words
The electrostatic chuck of claim 1, wherein the ferromagnetic shunt comprises a planar ring positioned below a periphery of the substrate to reduce the magnetic flux above the periphery of the substrate.
Claim 5
Dependent Claim
15 words
The electrostatic chuck of claim 3, wherein the planar ring extends continuously about the electrode.
Claim 6
Dependent Claim
20 words
The electrostatic chuck of claim 3, wherein the planar ring comprises a thickness ranging from about 100 to 1000 microns.
Claim 7
Dependent Claim
15 words
The electrostatic chuck of claim 3, wherein the planar ring comprises segments having differing thicknesses.
Claim 8
Dependent Claim
25 words
The electrostatic chuck of claim 1, wherein the ferromagnetic shunt is made from ferromagnetic material having a relative magnetic permeability of at least about 1000.
Claim 9
Dependent Claim
26 words
The electrostatic chuck of claim 1, wherein the ferromagnetic shunt is made from material selected from the group consisting of iron, nickel, cobalt, and alloys thereof.
Claim 10
Dependent Claim
52 words
The electrostatic chuck of claim 1, wherein the non-ferromagnetic electrode and the ferromagnetic shunt comprise a unitary member comprising (i) non-ferromagnetic material disposed below a central portion of the substrate to serve as the electrode, and (ii) ferromagnetic material concentrated preferentially below a periphery of the substrate to serve as the shunt.
Claim 11
Dependent Claim
36 words
A process chamber for processing substrates in a magnetic flux, the process chamber comprising: (a) a magnetic flux generator for generating a magnetic flux in the process chamber; and (b) the electrostatic chuck of claim 1.
Claim 12
Dependent Claim
49 words
The process chamber of claim 10, wherein the magnetic field generator generates a magnetic flux having a component substantially parallel to the substrate surface, and wherein the ferromagnetic shunt in the electrostatic chuck is shaped and sized to deplete the magnetic flux component at a periphery of the substrate.
Claim 13
Dependent Claim
19 words
The process chamber of claim 10, wherein the magnetic field generator comprises a coil wrapped around the process chamber.
Claim 14
Dependent Claim
113 words
An electrostatic chuck for holding a substrate having a periphery, in a process chamber during processing of the substrate in a magnetic flux, the electrostatic chuck comprising: (a) a base including a peripheral wall extending downwardly from the base to define a cavity therein; (b) an insulator on the base, the insulator having (i) a top surface for supporting the substrate thereon, and (ii) at least one non-ferromagnetic electrode in the insulator, the electrode provided for electrostatically holding the substrate; and (c) a continuous ferromagnetic planar ring in the cavity of the base, the planar ring extending continuously below the periphery of the substrate, and disposed directly below, and contiguous to the base.
Claim 15
Dependent Claim
113 words
An electrostatic chuck for holding a substrate having a periphery, in a process chamber during processing of the substrate in a magnetic flux, the electrostatic chuck comprising: (a) a base including a peripheral wall extending downwardly from the base to define a cavity therein; (b) an insulator on the base, the insulator having (i) a top surface for supporting the substrate thereon, and (ii) at least one non-ferromagnetic electrode in the insulator, the electrode provided for electrostatically holding the substrate; and (c) a continuous ferromagnetic planar ring in the cavity of the base, the planar ring extending continuously below the periphery of the substrate, and disposed directly below, and contiguous to the base.
Claim 16
Dependent Claim
20 words
The electrostatic chuck of claim 13, wherein the planar ring comprises a thickness ranging from about 100 to 1000 microns.
Claim 17
Dependent Claim
15 words
The electrostatic chuck of claim 13, wherein the planar ring comprises segments having differing thicknesses.
Claim 18
Dependent Claim
26 words
The electrostatic chuck of claim 13, wherein the ferromagnetic planar ring is made from ferromagnetic material having a relative magnetic permeability of at least about 1000.
Claim 19
Dependent Claim
27 words
The electrostatic chuck of claim 13, wherein the ferromagnetic planar ring is made from material selected from the group consisting of iron, nickel, cobalt, and alloys thereof.
Claim 20
Dependent Claim
81 words
The electrostatic chuck of claim 13, wherein the base comprises an electrical connector support extending inwardly from the peripheral wall, the connector support provided for supporting an electrical connector connected to the electrode to supply a voltage to the electrode from a voltage supply terminal in the process chamber, wherein the electrical connector support and base define a gap therebetween, and wherein a portion of the continuous ferromagnetic planar ring extends into the gap between the connector support and the base.
Claim 21
Dependent Claim
18 words
The electrostatic chuck of claim 18, wherein the base and electrical connector support are made from non-ferromagnetic material.
Claim 22
Dependent Claim
36 words
A process chamber for processing substrates in a magnetic flux, the process chamber comprising: (a) a magnetic flux generator for generating a magnetic flux in the process chamber; and (b) the electrostatic chuck of claim 13.
Claim 23
Dependent Claim
19 words
The process chamber of claim 20, wherein the magnetic field generator comprises a coil wrapped around the process chamber.
Claim 24
Dependent Claim
137 words
An electrostatic chuck for holding a substrate in a process chamber during processing of the substrate in a magnetic flux, the electrostatic chuck comprising: (a) a base comprising a substrate support having (i) peripheral walls extending upwardly from the base, (ii) a top surface, and (iii) a cavity defined by the peripheral walls and top surface; (b) an insulator on the top surface of the substrate support, the insulator having (i) a surface for supporting the substrate thereon, and (ii) at least one non-ferromagnetic electrode in the insulator, the electrode provided for electrostatically holding the substrate; and (c) a continuous ferromagnetic planar ring in the cavity of the substrate support, the planar ring extending continuously along the peripheral walls of the substrate support, and disposed directly below, and contiguous to the top surface of the substrate support.
Claim 25
Dependent Claim
137 words
An electrostatic chuck for holding a substrate in a process chamber during processing of the substrate in a magnetic flux, the electrostatic chuck comprising: (a) a base comprising a substrate support having (i) peripheral walls extending upwardly from the base, (ii) a top surface, and (iii) a cavity defined by the peripheral walls and top surface; (b) an insulator on the top surface of the substrate support, the insulator having (i) a surface for supporting the substrate thereon, and (ii) at least one non-ferromagnetic electrode in the insulator, the electrode provided for electrostatically holding the substrate; and (c) a continuous ferromagnetic planar ring in the cavity of the substrate support, the planar ring extending continuously along the peripheral walls of the substrate support, and disposed directly below, and contiguous to the top surface of the substrate support.
Claim 26
Dependent Claim
20 words
The electrostatic chuck of claim 22, wherein the planar ring comprises a thickness ranging from about 100 to 1000 microns.
Claim 27
Dependent Claim
15 words
The electrostatic chuck of claim 22, wherein the planar ring comprises segments having differing thicknesses.
Claim 28
Dependent Claim
26 words
The electrostatic chuck of claim 22, wherein the ferromagnetic planar ring is made from ferromagnetic material having a relative magnetic permeability of at least about 1000.
Claim 29
Dependent Claim
27 words
The electrostatic chuck of claim 22, wherein the ferromagnetic planar ring is made from material selected from the group consisting of iron, nickel, cobalt, and alloys thereof.
Claim 30
Dependent Claim
36 words
A process chamber for processing substrates in a magnetic flux, the process chamber comprising: (a) a magnetic flux generator for generating a magnetic flux in the process chamber; and (b) the electrostatic chuck of claim 22.
Claim 31
Dependent Claim
19 words
The process chamber of claim 27 wherein the magnetic field generator comprises a coil wrapped around the process chamber.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-01-07 | 2000-07-08 | 2001-01-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-01-07 | 2004-07-08 | 2005-01-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-01-07 | 2008-07-08 | 2009-01-07 | $7700.00 | Window Closed / Lapsed |