US5589224A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for full wafer deposition
Assignee: Applied Materials Inc
•
Filing: 1994-09-22
•
Granted: 1996-12-31
•
Expires: 2014-09-22
Abstract
Abstract The present invention provides a shield arrangement that prevents deposition in the area of the chamber surrounding the substrate. This shield arrangement is equipped with a wall-like member which surrounds a substrate, and includes a projecting annular flange and a substrate support which extends in the horizontal direction beyond the substrate, and includes a groove therein. The annular flange is received in the groove to shield the deposition region of the chamber from the remainder of the chamber.
Inventors
- 👤 Avi Tepman
- 👤 Takeshi Jinbo
- 👤 Hiroyuki Takahama
- 👤 Akihiko Saito
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:25
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/4401; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4585
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
134 words
A deposition shield arrangement for limiting the deposition of deposition materials on internal chamber components during the processing of a substrate in the deposition chamber, comprising: a substrate support member disposed in the chamber and selectively positionable in the chamber to receive a substrate thereon; a shield member extending circumferentially around the substrate support member and cooperating with said substrate support member to prevent deposition on the deposition chamber interior surfaces shielded by said shield member and said substrate support member during the processing of a substrate in the chamber; said support member including a circumferential groove extending inwardly of the substrate receiving portion thereof; and said shield member including a circumferential, downwardly extending portion received in said groove when said support member is positioned for the processing of a substrate in the chamber.
Claim 2
Dependent Claim
134 words
A deposition shield arrangement for limiting the deposition of deposition materials on internal chamber components during the processing of a substrate in the deposition chamber, comprising: a substrate support member disposed in the chamber and selectively positionable in the chamber to receive a substrate thereon; a shield member extending circumferentially around the substrate support member and cooperating with said substrate support member to prevent deposition on the deposition chamber interior surfaces shielded by said shield member and said substrate support member during the processing of a substrate in the chamber; said support member including a circumferential groove extending inwardly of the substrate receiving portion thereof; and said shield member including a circumferential, downwardly extending portion received in said groove when said support member is positioned for the processing of a substrate in the chamber.
Claim 3
Dependent Claim
25 words
The shield arrangement of claim 1, wherein the chamber includes a cover, and said shield member extends from said cover and inwardly of the chamber.
Claim 4
Dependent Claim
14 words
The shield arrangement of claim 2, wherein said shield member is a one-piece member.
Claim 5
Dependent Claim
45 words
The shield arrangement of claim 3, wherein said shield member is stationary; and said support member may be moved between a retracted position for receipt of a substrate thereon, and an extended position whereby said extending portion of said shield is received in said groove.
Claim 6
Dependent Claim
18 words
The shield arrangement of claim 1, wherein said groove circumscribes the substrate receiving region of the support member.
Claim 7
Dependent Claim
20 words
The shield arrangement of claim 1, wherein said groove extends inwardly of the substrate receiving region of said support member.
Claim 8
Dependent Claim
35 words
The shield arrangement of claim 1, further including a spacer means for spacing a substrate received on said support member from said surface of support member during the deposition of deposition materials on the substrate.
Claim 9
Dependent Claim
31 words
The arrangement of claim 1, further including a secondary groove provided in said support member and positioned to be located under the edge of a substrate received on the support member.
Claim 10
Dependent Claim
37 words
The shield arrangement of claim 1, further including a space between the terminus of said circumferential, downwardly extending portion and said groove when said support member is positioned for the processing of a substrate in the chamber.
Claim 11
Independent Claim
106 words
A method of shielding the interior surfaces of a processing chamber from a deposition environment maintained within the chamber, comprising the steps of; providing a moveable substrate support member, having a substrate receiving surface and an extending portion extending outwardly from said substrate receiving surface, in the chamber; providing a shield member extending inwardly of the chamber and spaced from the chamber walls said support member and said shield cooperating to shield portions of the chamber from the deposition environment maintained in the chamber; providing a groove in the extending portion of the support member; and extending a portion of the shield member into the groove.
Claim 12
Independent Claim
106 words
A method of shielding the interior surfaces of a processing chamber from a deposition environment maintained within the chamber, comprising the steps of; providing a moveable substrate support member, having a substrate receiving surface and an extending portion extending outwardly from said substrate receiving surface, in the chamber; providing a shield member extending inwardly of the chamber and spaced from the chamber walls said support member and said shield cooperating to shield portions of the chamber from the deposition environment maintained in the chamber; providing a groove in the extending portion of the support member; and extending a portion of the shield member into the groove.
Claim 13
Dependent Claim
14 words
The method of claim 10, wherein said groove and said shield do not contact.
Claim 14
Dependent Claim
22 words
The method of claim 10, wherein said groove extends partially under a substrate when the substrate is received on the support member.
Claim 15
Dependent Claim
19 words
The method of claim 10, wherein said substrate is supported from the support member on a plurality of pins.
References Cited (Backward Citations)
JPS6096755A
Cited
US5228501A
Cited
JPS63238263A
Cited
JPS63246814A
Cited
US5065698A
Cited
JPH02141575A
Cited
US5169684A
Cited
US5135629A
Cited
US5213650A
Cited
US5238499A
Cited
US5094885A
Cited
US5192371A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-12-31 | 2000-07-01 | 2000-12-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-12-31 | 2004-07-01 | 2004-12-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-12-31 | 2008-07-01 | 2008-12-31 | $7700.00 | Window Closed / Lapsed |