Patent US5589002A successfully refreshed from Google Patents.
US5589002A
Expired / Lapsed
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Gas distribution plate for semiconductor wafer processing apparatus with means for inhibiting arcing
Assignee: Applied Materials Inc
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Filing: 1994-03-24
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Granted: 1996-12-31
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Expires: 2014-03-24
Abstract
Abstract A gas distribution plate for a semiconductor wafer process chamber has a symmetrical pattern of non-circular openings formed therein for the passage of gas therethrough. The smaller axis of the non-circular openings should be at least about 127 μm (5 mils), and preferably at least about 254 μm (10 mils), but less than about 762 μm (30 mils), and preferably less than about 635 μm (25 mils). The larger axis is greater than the smaller axis, preferably at least about 635 μm (25 mils), and most preferably at least about 762 μm (30 mils). At least some of the walls of the non-circular openings are preferably not perpendicular to the plane of the face of the gas distribution plate, but are rather slanted, at an angle of from at least 30° to less than 90°, toward the center or axis of the outer face of the circular gas distribution plate which faces the wafer. Arcing on the face of the gas distribution plate may be further inhibited by providing peripheral conductive means on the face of the gas distribution plate electrically connected to grounded or neutral portions of the processing chamber to thereby provide a conductive path for unstable plasma at the surface of the gas distribution plate.
Inventors
- 👤 Yuh-Jia Su
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:06
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H01J37/32009; H01J37/32055
Claims Analysis
Total Claims: 37
Claim 1
Independent Claim
86 words
A gas distribution plate for a semiconductor processing apparatus which permits the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during plasma processing comprising a plurality of non-circular openings in said gas distribution plate, each of said non-circular openings having: a) a width: i) smaller than the diameter at which arcing will occur with circular openings; but ii) at least about 254 μm (10 mils) to inhibit blockage by a halogen-containing plasma; and b) a length greater than said width.
Claim 2
Dependent Claim
86 words
A gas distribution plate for a semiconductor processing apparatus which permits the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during plasma processing comprising a plurality of non-circular openings in said gas distribution plate, each of said non-circular openings having: a) a width: i) smaller than the diameter at which arcing will occur with circular openings; but ii) at least about 254 μm (10 mils) to inhibit blockage by a halogen-containing plasma; and b) a length greater than said width.
Claim 3
Dependent Claim
49 words
The gas distribution plate of claim 1 wherein said plurality of non-circular openings in said gas distribution plate for inhibiting arcing adjacent said plate during said plasma processing further comprises a symmetrical pattern of said non-circular openings in said plate through which gas may flow into said processing apparatus.
Claim 4
Dependent Claim
25 words
The gas distribution plate of claim 1 wherein each of said non-circular openings in said plate has a width less than 762 μm (30 mils).
Claim 5
Dependent Claim
27 words
The gas distribution plate of claim 1 wherein each of said non-circular openings in said plate has a width of less than about 635 μm (25 mils).
Claim 6
Dependent Claim
95 words
A generally circular planar gas distribution plate for a semiconductor processing apparatus having structure for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of elongated slots in said plate through which gas may flow into said processing apparatus, each of said elongated slots having a major axis and a minor axis smaller than said major axis, said minor axis having a length: a) smaller than the diameter at which arcing will occur with circular openings; and b) larger than the diameter at which a halogen-containing plasma will block said circular openings.
Claim 7
Dependent Claim
95 words
A generally circular planar gas distribution plate for a semiconductor processing apparatus having structure for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of elongated slots in said plate through which gas may flow into said processing apparatus, each of said elongated slots having a major axis and a minor axis smaller than said major axis, said minor axis having a length: a) smaller than the diameter at which arcing will occur with circular openings; and b) larger than the diameter at which a halogen-containing plasma will block said circular openings.
Claim 8
Dependent Claim
27 words
The gas distribution plate of claim 5 wherein said major axis of at least a portion of said elongated slots intersect a midpoint of said circular plate.
Claim 9
Dependent Claim
35 words
The gas distribution plate of claim 5 wherein at least a portion of said non-circular openings comprise elongated slots having a major axis generally perpendicular to a line intersecting a midpoint of said circular plate.
Claim 10
Dependent Claim
39 words
The gas distribution plate of claim 7 wherein said elongated slots having a major axis perpendicular to a line intersecting a midpoint of said circular plate comprise arcuate slots lying in one or more circles coaxial to said midpoint.
Claim 11
Dependent Claim
71 words
The gas distribution plate of claim 5 wherein a portion of said elongated slots comprise first elongated slots having a major axis intersecting a midpoint of said circular plate; a portion of said elongated slots comprise second elongated slots having a major axis generally perpendicular to a line intersecting said midpoint of said circular plate; and each of said first elongated slots intersects at least one of said second elongated slots.
Claim 12
Dependent Claim
25 words
The gas distribution plate of claim 9 wherein said second elongated slots comprise arcuate slots arranged in circles coaxial to said midpoint of said plate.
Claim 13
Dependent Claim
83 words
A generally circular gas distribution plate for a semiconductor processing apparatus having structure for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of non-circular openings in said plate through which gas may flow into said processing apparatus, each of said non-circular openings having a first dimension smaller than about 762 μm (30 mils) to inhibit arcing, but at least about 508 μ(10 mils) to inhibit blockage by a halogen-containing plasma; and a second dimension larger than said first dimension.
Claim 14
Dependent Claim
83 words
A generally circular gas distribution plate for a semiconductor processing apparatus having structure for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of non-circular openings in said plate through which gas may flow into said processing apparatus, each of said non-circular openings having a first dimension smaller than about 762 μm (30 mils) to inhibit arcing, but at least about 508 μ(10 mils) to inhibit blockage by a halogen-containing plasma; and a second dimension larger than said first dimension.
Claim 15
Dependent Claim
31 words
The gas distribution plate of claim 11 wherein said non-circular openings comprise a plurality of elongated slots wherein said second dimension of each slot is greater than 762 μm (30 mils).
Claim 16
Dependent Claim
28 words
The gas distribution plate of claim 11 wherein said non-circular openings comprise a plurality of elongated slots lying along lines which intersect a midpoint of said circular plate.
Claim 17
Dependent Claim
31 words
The gas distribution plate of claim 11 wherein said non-circular openings comprise a plurality of arcuate slots lying in one or more circles coaxial with a midpoint of said circular plate.
Claim 18
Dependent Claim
64 words
The gas distribution plate of claim 11 wherein said non-circular openings comprise: a) a plurality of elongated slots lying along lines which intersect a midpoint of said circular plate; and b) a plurality of arcuate slots lying in one or more circles coaxial with a midpoint of said circular plate; wherein each of said elongated slots crosses at least one of said arcuate slots.
Claim 19
Dependent Claim
18 words
The gas distribution plate of claim 11 wherein said non-circular openings comprise a plurality of crossed elongated slots.
Claim 20
Dependent Claim
99 words
A generally circular gas distribution plate for a semiconductor processing apparatus having means for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of non-circular openings in said plate through which gas may flow into said processing apparatus, each of said non-circular openings in said plate having a width smaller than the minimum diameter of a circular hole, in a symmetrical pattern of circular holes, at which arcing will occur but larger than the maximum diameter of a circular hole, in a symmetrical pattern of such holes, at which a halogen-containing plasma will block such openings.
Claim 21
Dependent Claim
99 words
A generally circular gas distribution plate for a semiconductor processing apparatus having means for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of non-circular openings in said plate through which gas may flow into said processing apparatus, each of said non-circular openings in said plate having a width smaller than the minimum diameter of a circular hole, in a symmetrical pattern of circular holes, at which arcing will occur but larger than the maximum diameter of a circular hole, in a symmetrical pattern of such holes, at which a halogen-containing plasma will block such openings.
Claim 22
Dependent Claim
30 words
The gas distribution plate of claim 17 wherein at least a portion of said non-circular openings comprise arcuate slots coaxially arranged around a midpoint on a face of said plate.
Claim 23
Dependent Claim
55 words
A generally circular planar gas distribution plate for a semiconductor processing apparatus having means for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of non-metallic electrically conductive members arranged on a face of said plate adjacent the periphery, each of said conductive members electrically connected to metallic portions of said plate.
Claim 24
Dependent Claim
55 words
A generally circular planar gas distribution plate for a semiconductor processing apparatus having means for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of non-metallic electrically conductive members arranged on a face of said plate adjacent the periphery, each of said conductive members electrically connected to metallic portions of said plate.
Claim 25
Dependent Claim
94 words
A generally circular planar gas distribution plate for a semiconductor plasma processing apparatus to permit the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during said plasma processing which comprises symmetrical pattern of non-circular openings in said plate, at least a portion of which said openings comprise elongated arcuate slots having a major axis generally perpendicular to a line intersecting a midpoint on a face of said circular plate, and sidewalls of said arcuate slots parallel to said major axis are slanted toward said midpoint of said plate.
Claim 26
Dependent Claim
94 words
A generally circular planar gas distribution plate for a semiconductor plasma processing apparatus to permit the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during said plasma processing which comprises symmetrical pattern of non-circular openings in said plate, at least a portion of which said openings comprise elongated arcuate slots having a major axis generally perpendicular to a line intersecting a midpoint on a face of said circular plate, and sidewalls of said arcuate slots parallel to said major axis are slanted toward said midpoint of said plate.
Claim 27
Dependent Claim
39 words
The gas distribution plate of claim 20 wherein said sidewalls of said elongated arcuate slots are slanted toward said midpoint at an angle, with respect to said face of said plate, ranging from about 30° to less than 90°.
Claim 28
Dependent Claim
150 words
A generally circular planar gas distribution plate for a semiconductor plasma processing apparatus to permit the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during said plasma processing which comprises a symmetrical pattern of non-circular openings in said plate, comprising: a) first elongated slots comprising arcuate slots lying in circles coaxial to a midpoint on a face of said circular plate and having a major axis generally perpendicular to a line intersecting said midpoint on said face of said circular plate; and b) second elongated slots having a major axis intersecting said midpoint on said face of said circular plate, each of said second elongated slots intersecting at least one of said first elongated slots; wherein said sidewalls of said first elongated arcuate slots parallel to said major axis of said first slots are slanted toward said midpoint of said face on said plate.
Claim 29
Dependent Claim
150 words
A generally circular planar gas distribution plate for a semiconductor plasma processing apparatus to permit the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during said plasma processing which comprises a symmetrical pattern of non-circular openings in said plate, comprising: a) first elongated slots comprising arcuate slots lying in circles coaxial to a midpoint on a face of said circular plate and having a major axis generally perpendicular to a line intersecting said midpoint on said face of said circular plate; and b) second elongated slots having a major axis intersecting said midpoint on said face of said circular plate, each of said second elongated slots intersecting at least one of said first elongated slots; wherein said sidewalls of said first elongated arcuate slots parallel to said major axis of said first slots are slanted toward said midpoint of said face on said plate.
Claim 30
Dependent Claim
26 words
The gas distribution plate of claim 22 wherein said elongated arcuate slots are arranged in circles coaxial to said midpoint of said face of said plate.
Claim 31
Dependent Claim
46 words
The generally circular planar gas distribution plate for a semiconductor plasma processing apparatus of claim 23 wherein said non-circular openings comprising elongated slots have a first dimension smaller than about 762 μm (30 mils) to inhibit arcing; and a second dimension larger than said first dimension.
Claim 32
Dependent Claim
33 words
The gas distribution plate of claim 24 wherein sidewalls of said arcuate slots parallel to a major axis of said arcuate slots are slanted toward a midpoint on a face of said plate.
Claim 33
Dependent Claim
65 words
A generally circular planar gas distribution plate for a semiconductor plasma processing apparatus to permit the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during said plasma processing which comprises: a) a symmetrical pattern of non-circular openings in said plate; and b) conductive structure on a face of said plate to inhibit arcing on said face of said plate.
Claim 34
Dependent Claim
65 words
A generally circular planar gas distribution plate for a semiconductor plasma processing apparatus to permit the flow of process gas into said processing apparatus while inhibiting arcing adjacent said plate during said plasma processing which comprises: a) a symmetrical pattern of non-circular openings in said plate; and b) conductive structure on a face of said plate to inhibit arcing on said face of said plate.
Claim 35
Dependent Claim
24 words
The gas distribution plate of claim 26 wherein said conductive structure comprise non-metallic means generally symmetrically arranged adjacent the periphery of said circular plate.
Claim 36
Dependent Claim
156 words
A generally circular planar gas distribution plate for a semiconductor processing apparatus having structure for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of elongated slots in said plate through which gas may flow into said processing apparatus, each of said elongated slots having a major axis and a minor axis smaller than said major axis, said minor axis having a length: a) smaller than the diameter at which arcing will occur with circular openings; and b) larger than the diameter at which a halogen-containing plasma will block said circular openings; said elongated slots further comprising: a) first elongated slots having a major axis parallel to a line intersecting a midpoint of said circular plate; and b) second elongated slots having a major axis perpendicular to said line intersecting said midpoint of said circular plate; and c) each of said first elongated slots intersects at least one of said second elongated slots.
Claim 37
Dependent Claim
156 words
A generally circular planar gas distribution plate for a semiconductor processing apparatus having structure for inhibiting arcing adjacent said plate during plasma processing comprising a symmetrical pattern of elongated slots in said plate through which gas may flow into said processing apparatus, each of said elongated slots having a major axis and a minor axis smaller than said major axis, said minor axis having a length: a) smaller than the diameter at which arcing will occur with circular openings; and b) larger than the diameter at which a halogen-containing plasma will block said circular openings; said elongated slots further comprising: a) first elongated slots having a major axis parallel to a line intersecting a midpoint of said circular plate; and b) second elongated slots having a major axis perpendicular to said line intersecting said midpoint of said circular plate; and c) each of said first elongated slots intersects at least one of said second elongated slots.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-12-31 | 2000-07-01 | 2000-12-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-12-31 | 2004-07-01 | 2004-12-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-12-31 | 2008-07-01 | 2008-12-31 | $7700.00 | Window Closed / Lapsed |