Patent US5585301A successfully refreshed from Google Patents.
US5585301A
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US
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Method for forming high resistance resistors for limiting cathode current in field emission displays
Assignee: Micron Technology Inc
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Filing: 1995-07-14
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Granted: 1996-12-17
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Expires: 2015-07-14
Abstract
Abstract A method for forming resistors for regulating current in a field emission display comprises integrating a high resistance resistor into circuitry for the field emission display. The resistor is in electrical communication with emitter sites for the field emission display and with other circuit components such as ground. The high resistance resistor can be formed as a layer of a high resistivity material, such as intrinsic polycrystalline silicon, polycrystalline silicon doped with a conductivity-degrading dopant, lightly doped polysilicon, titanium oxynitride, tantalum oxynitride or a glass type material deposited on a baseplate of the field emission display. Contacts are formed in the high resistivity material to establish electrical communication between the resistor and the emitter sites and between the resistor and the other circuit components. The contacts can be formed as low resistance contacts (e.g., ohmic contacts) or as high resistance contacts (e.g., Schottky contacts).
Inventors
- 👤 John K. Lee
- 👤 David A. Cathey, Jr.
- 👤 Kevin Tjaden
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 09:37
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/40; H10D1/47; H10D1/474; H01; H01J; H01J9/00; H01J9/02; H01J9/022; H01J9/025; H01J2201/00; H01J2201/30; H01J2201/319
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
61 words
A method for forming a resistor for a field emission display, comprising: forming a baseplate having a conductivity region; forming an emitter site on the conductivity region; depositing a resistive layer on the baseplate; and forming a first contact on the resistive layer in electrical communication with the conductivity region and a second contact in electrical communication with another circuit component.
Claim 2
Independent Claim
61 words
A method for forming a resistor for a field emission display, comprising: forming a baseplate having a conductivity region; forming an emitter site on the conductivity region; depositing a resistive layer on the baseplate; and forming a first contact on the resistive layer in electrical communication with the conductivity region and a second contact in electrical communication with another circuit component.
Claim 3
Dependent Claim
33 words
The method as recited in claim 1 and wherein the baseplate includes a layer of single crystal silicon and the conductivity region is formed by implanting a dopant into the layer of silicon.
Claim 4
Dependent Claim
43 words
The method as recited in claim 1 and wherein the resistive layer is formed of a material selected from the group consisting of intrinsic polysilicon, polysilicon doped with a conductivity-degrading dopant, lightly doped polysilicon, titanium oxynitride, tantalum oxynitride and a glass type material.
Claim 5
Dependent Claim
28 words
The method as recited in claim 1 and wherein the resistive layer is formed of a silicon based material and the contacts are formed as low resistance contacts.
Claim 6
Dependent Claim
28 words
The method as recited in claim 1 and wherein the resistive layer is formed of a glass type material and the contacts are formed as high resistance contacts.
Claim 7
Dependent Claim
39 words
The method as recited in claim 1 and wherein the resistive layer is formed of a silicon based material and at least one of the contacts is an ohmic contact formed by diffusion of dopants from the conductivity region.
Claim 8
Dependent Claim
34 words
The method as recited in claim 1 and wherein the resistive layer is formed of a lightly doped silicon containing material and at least one of the contacts is formed as a Schottky contact.
Claim 9
Dependent Claim
28 words
The method as recited in claim 1 and wherein the baseplate includes a glass substrate and the conductivity region comprises an isolated silicon island formed on the substrate.
Claim 10
Dependent Claim
28 words
The method as recited in claim 8 and wherein the resistive layer is formed of a silicon based material and the contacts are formed as low resistance contacts.
Claim 11
Dependent Claim
28 words
The method as recited in claim 8 and wherein the resistive layer is formed of a glass type material and the contacts are formed as high resistance contacts.
Claim 12
Dependent Claim
25 words
The method as recited in claim 1 and wherein the second contact is in electrical communication with an isolated conductivity region formed in the baseplate.
Claim 13
Independent Claim
132 words
A method for forming a resistor for a field emission display, said method comprising: forming an emitter site on a conductivity region of a baseplate; forming a resistive layer by depositing a resistive material on the baseplate; forming a first contact in the resistive material in electrical communication with the conductivity region and with a resistance of (R C1 ); forming a second contact in the resistive material in electrical communication with a circuit component of the field emission display and with a resistance of (R C2 ); such that a total resistance (R T ) of the resistor is equal to a sheet resistance (R S ) of the resistive layer plus the resistance (R C1 ) of the first contact plus the resistance (R C2 ) of the second contact.
Claim 14
Independent Claim
132 words
A method for forming a resistor for a field emission display, said method comprising: forming an emitter site on a conductivity region of a baseplate; forming a resistive layer by depositing a resistive material on the baseplate; forming a first contact in the resistive material in electrical communication with the conductivity region and with a resistance of (R C1 ); forming a second contact in the resistive material in electrical communication with a circuit component of the field emission display and with a resistance of (R C2 ); such that a total resistance (R T ) of the resistor is equal to a sheet resistance (R S ) of the resistive layer plus the resistance (R C1 ) of the first contact plus the resistance (R C2 ) of the second contact.
Claim 15
Dependent Claim
43 words
The method as recited in claim 12 and wherein the resistive material is a material selected from the group consisting of intrinsic polycrystalline silicon, polycrystalline silicon doped with a conductivity-degrading dopant, lightly doped polysilicon, titanium oxynitride, tantalum oxynitride and a glass type material.
Claim 16
Dependent Claim
39 words
The method as recited in claim 12 and wherein the resistive material is a silicon based material and the first contact is formed as an ohmic contact formed by diffusing a dopant from the conductivity region into the resistor.
Claim 17
Dependent Claim
23 words
The method as recited in claim 12 and wherein the second contact is electrically connected to an interconnect formed of a conductive material.
Claim 18
Dependent Claim
24 words
The method as recited in claim 12 and wherein the conductivity region is doped N+ and the resistive layer is doped N- or P-.
Claim 19
Dependent Claim
24 words
The method as recited in claim 12 and wherein the second contact is electrically connected to a second conductivity region formed in the baseplate.
Claim 20
Dependent Claim
26 words
The method as recited in claim 12 and wherein the resistive material is a glass type material and the contacts are formed as high resistance contacts.
Claim 21
Dependent Claim
21 words
The method as recited in claim 12 and wherein the conductivity region is formed of a layer of single crystal silicon.
Claim 22
Dependent Claim
24 words
The method as recited in claim 12 and wherein the conductivity region is formed as an isolated silicon island formed on a glass substrate.
Claim 23
Dependent Claim
25 words
The method as recited in claim 20 and wherein the resistive layer is electrically connected to a second isolated silicon island formed on the substrate.
Claim 24
Independent Claim
140 words
A method for forming a resistor for a field emission display, said method comprising: forming a baseplate including a glass substrate; forming a conductivity region comprising an isolated silicon containing island formed on the substrate; forming an emitter site on the conductivity region; forming a resistive layer on the baseplate; forming a first contact with a resistance of (R C1 ) to establish electrical communication between said resistive layer and said conductivity region; and forming a second contact with a resistance of (R C2 ) to establish electrical communication between said resistor and another circuit component; such that a total resistance (R T ) of the resistor is equal to a sheet resistance (R S ) of the resistive layer plus the resistance (R C1 ) of the first contact plus the resistance (R C2 ) of the second contact.
Claim 25
Independent Claim
140 words
A method for forming a resistor for a field emission display, said method comprising: forming a baseplate including a glass substrate; forming a conductivity region comprising an isolated silicon containing island formed on the substrate; forming an emitter site on the conductivity region; forming a resistive layer on the baseplate; forming a first contact with a resistance of (R C1 ) to establish electrical communication between said resistive layer and said conductivity region; and forming a second contact with a resistance of (R C2 ) to establish electrical communication between said resistor and another circuit component; such that a total resistance (R T ) of the resistor is equal to a sheet resistance (R S ) of the resistive layer plus the resistance (R C1 ) of the first contact plus the resistance (R C2 ) of the second contact.
Claim 26
Dependent Claim
34 words
The method as recited in claim 22 and wherein the resistive layer is a silicon containing material doped N- and the first and second contacts are doped N+ to form an N+/N-/N+ resistor structure.
Claim 27
Dependent Claim
34 words
The method as recited in claim 22 and wherein the resistive layer is a silicon containing material doped P- and the first and second contacts are doped N+ to form an N+/P-/N+ resistor structure.
Claim 28
Dependent Claim
35 words
The method as recited in claim 22 and wherein the resistive layer is a silicon containing material doped N- and the first and second contacts are doped N- to form a continuous N- resistor structure.
Claim 29
Dependent Claim
29 words
The method as recited in claim 22 and wherein the resistive material is a silicon containing material and the first and second contacts are formed as low resistance contacts.
Claim 30
Dependent Claim
27 words
The method as recited in claim 26 and wherein the resistive material is a glass type material and the first and second contacts are high resistance contacts.
Claim 31
Dependent Claim
34 words
The method as recited in claim 22 and wherein the second contact is electrically connected to an interconnect electrically connected to a second conductivity region formed in the baseplate as an isolated silicon island.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-12-17 | 2000-06-17 | 2000-12-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-12-17 | 2004-06-17 | 2004-12-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-12-17 | 2008-06-17 | 2008-12-17 | $7700.00 | Window Closed / Lapsed |