US5579147A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Scanning light exposure apparatus
Assignee: Nikon Corp
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Filing: 1994-12-06
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Granted: 1996-11-26
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Expires: 2014-12-06
Abstract
Abstract A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
Inventors
- 👤 Susumu Mori
- 👤 Tsuyoshi Naraki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 11:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/7005; G03F7/70216; G03F7/70241; G03F7/70275; G03F7/70358; G03F7/70425; G03F7/70475; G03F7/70691; G03F7/70791
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
143 words
A scanning light exposure apparatus comprising: a plurality of illumination optical systems for irradiating light beams to a corresponding plurality of sub-areas in a pattern area of a mask; a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by respective light beams transmitted through the mask onto a photo-sensitive substrate; each illumination optical system having a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in said illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate; scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical system; and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
Claim 2
Dependent Claim
143 words
A scanning light exposure apparatus comprising: a plurality of illumination optical systems for irradiating light beams to a corresponding plurality of sub-areas in a pattern area of a mask; a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by respective light beams transmitted through the mask onto a photo-sensitive substrate; each illumination optical system having a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in said illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate; scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical system; and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
Claim 3
Dependent Claim
51 words
A scanning light exposure apparatus according to claim 1 further comprising: a light intensity sensor for detecting intensities of the light beams on a substantially same plane as that of the photo-sensitive substrate; the width of the aperture being changed in accordance with the detection result of said light intensity sensor.
Claim 4
Dependent Claim
41 words
A scanning light exposure apparatus according to claim 1 wherein the sub-area is a polygon having a side at a predetermined angle to the direction transverse to the predetermined direction, and the predetermined angle changes with the change of the width.
Claim 5
Dependent Claim
67 words
A scanning light exposure apparatus according to claim 1 wherein the sub-area is a polygon having a first side at a predetermined angle to the direction transverse to the predetermined direction and a second side extending along the predetermined direction, and the width is changed such that a component for the predetermined direction at a crosspoint of the first side and the second side is kept unchanged.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-11-26 | 2000-05-27 | 2000-11-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-11-26 | 2004-05-27 | 2004-11-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-11-26 | 2008-05-27 | 2008-11-26 | $7700.00 | Window Closed / Lapsed |