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US5578401A
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US
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Photomask for the measurement of resolution of exposure equipment
Assignee: SK Hynix Inc
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Filing: 1995-04-03
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Granted: 1996-11-26
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Expires: 2015-04-03
Abstract
Abstract There are disclosed photomasks for the measurement of resolution of exposure equipment, comprising two superimposed patterns, each of which has a plurality of identical sub-patterns and is symmetric on its central axis, the two being aligned in such a way that the spaces between their opposite, corresponding sub-patterns become wider or narrower, in sequence, or comprising a plurality of concentric patterns which are interconnected by connecting films, the connecting films being formed in the space between the concentric patterns.
Inventors
- 👤 Joon Hwang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 08:53
CPC Classifications
H; H10; H10P; H10P74/00; H10P74/27; H10P74/277; G; G03; G03F; G03F1/00; G03F1/38; G03F1/44; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; G03F7/70483; G03F7/70591; G03F7/70605; G03F7/70616; G03F7/70633; H10P74/20; H10P74/203; H10W; H10W46/00; H10W46/501
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
78 words
A photomask for the measurement of resolution of exposure equipment, comprising; superimposed patterns, having a common central axis, each of the patterns having a plurality of identical and corresponding sub-patterns and being symmetric on the central axis, the patterns being aligned so that spaces separating pairs of the corresponding sub-patterns become wider or narrower for pairs increasingly spaced from the central axis in sequence, wherein resolution measurement may be made using the spacings between the pairs of sub-patterns.
Claim 2
Dependent Claim
78 words
A photomask for the measurement of resolution of exposure equipment, comprising; superimposed patterns, having a common central axis, each of the patterns having a plurality of identical and corresponding sub-patterns and being symmetric on the central axis, the patterns being aligned so that spaces separating pairs of the corresponding sub-patterns become wider or narrower for pairs increasingly spaced from the central axis in sequence, wherein resolution measurement may be made using the spacings between the pairs of sub-patterns.
Claim 3
Dependent Claim
15 words
A photomask in accordance with claim 1, wherein the sub-patterns are of the same width.
Claim 4
Dependent Claim
22 words
A photomask in accordance with claim 2, wherein the width of the sub-patterns is in a range of 5 to 15 μm.
Claim 5
Dependent Claim
28 words
A photomask for the measurement of resolution exposure equipment, comprising a plurality of concentric patterns which are interconnected by connecting films formed in spaces between the concentric patterns.
Claim 6
Dependent Claim
28 words
A photomask for the measurement of resolution exposure equipment, comprising a plurality of concentric patterns which are interconnected by connecting films formed in spaces between the concentric patterns.
Claim 7
Dependent Claim
26 words
A photomask in accordance with claim 4, wherein the concentric patterns have a form of a square, a circle, a "" shape or a "[" shape.
Claim 8
Dependent Claim
18 words
A photomask in accordance with claim 4, wherein two adjacent concentric patterns are of the same line width.
Claim 9
Dependent Claim
114 words
A photomask for use in measuring resolution of exposure equipment, comprising: a transparent substrate; and first and second patterns, each of said first and second patterns having a stepped region symmetrical about a common axis, said first and second patterns being disposed on said substrate with opposing stepped regions, each stepped region comprising a plurality of adjacent sub-patterns, each first sub-pattern which is a part of said first pattern corresponding to a second sub-pattern which is a part of said second pattern, said corresponding first and second sub-patterns being separated by a pair separation, the pair separation increasing for pairs of corresponding first and second sub-patterns spaced further from the common axis in sequence.
Claim 10
Dependent Claim
114 words
A photomask for use in measuring resolution of exposure equipment, comprising: a transparent substrate; and first and second patterns, each of said first and second patterns having a stepped region symmetrical about a common axis, said first and second patterns being disposed on said substrate with opposing stepped regions, each stepped region comprising a plurality of adjacent sub-patterns, each first sub-pattern which is a part of said first pattern corresponding to a second sub-pattern which is a part of said second pattern, said corresponding first and second sub-patterns being separated by a pair separation, the pair separation increasing for pairs of corresponding first and second sub-patterns spaced further from the common axis in sequence.
Claim 11
Dependent Claim
52 words
A photomask for the measurement of resolution of exposure equipment, comprising: a transparent substrate; a plurality of concentric patterns disposed on said substrate for measuring resolution; and connecting films disposed on said substrate between said concentric patterns, for connecting adjacent concentric patterns and preventing peeling of said concentric patterns from the substrate.
Claim 12
Dependent Claim
52 words
A photomask for the measurement of resolution of exposure equipment, comprising: a transparent substrate; a plurality of concentric patterns disposed on said substrate for measuring resolution; and connecting films disposed on said substrate between said concentric patterns, for connecting adjacent concentric patterns and preventing peeling of said concentric patterns from the substrate.
Claim 13
Dependent Claim
26 words
A photomask in accordance with claim 8, wherein said concentric patterns are formed of adjacent pairs of concentric sub-patterns, sub-patterns in a pair having identical widths.
Claim 14
Dependent Claim
46 words
A photomask in accordance with claim 9, further comprising a first spacing distance between a first adjacent pair of concentric sub-patterns and a second spacing distance between a second adjacent pair of concentric sub-patterns, wherein said first spacing distance is greater than said second spacing distance.
References Cited (Backward Citations)
US4881257A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-11-26 | 2000-05-27 | 2000-11-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-11-26 | 2004-05-27 | 2004-11-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-11-26 | 2008-05-27 | 2008-11-26 | $7700.00 | Window Closed / Lapsed |