US5547884A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of manufacturing a semiconductor memory device having a common source region
Assignee: Toshiba Corp
•
Filing: 1994-11-30
•
Granted: 1996-08-20
•
Expires: 2014-11-30
Abstract
Abstract Field oxide films are formed on a semiconductor substrate of first conductivity type to be spaced from each other in the stripe shape. Gate insulating films are formed on the semiconductor substrate between the field oxide films. Word lines or control gate electrodes are formed on the field oxide films and the gate insulating films to be spaced from each other in the stripe shape along a direction perpendicular to the field oxide films. Grooves are formed in the gate insulating films and the field oxide films sandwiched by the word lines. Source regions of second conductivity type are formed in the semiconductor substrate in the grooves formed in the gate insulating films. A common source wiring region of second conductivity type for electrically connecting the respective source regions is formed in the semiconductor substrate in the grooves formed in the field oxide films. The impurity concentration of the common source wiring region is higher than that of the source regions, and the diffusion depth of the common source wiring region is deeper than that of the source regions.
Inventors
- 👤 Yoshiko Yamaguchi
- 👤 Yoichi Ohshima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 23:42
CPC Classifications
H; H10; H10B; H10B69/00
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
237 words
A method for manufacturing a semiconductor device comprising the steps of: forming a plurality of striped field oxide films on a semiconductor substrate of a first conductivity type, said field oxide films being spaced apart from each other along a first direction; forming a gate insulating film on a main surface of said semiconductor substrate between said field oxide films; forming a plurality of striped conductive layers on said field oxide films and said gate insulating film, said conductive layers being spaced apart from each other along a second direction crossing said first direction; forming grooves be removing said gate insulating film and said field oxide films between said conductive layers to a depth reaching the main surface of said semiconductor substrate wherein said conductive layers are used as apart of a mask, at least portions of said grooves formed in said field oxide films having a bottom portion being wider than an opening portion and than a space between said conductive layers; introducing impurity of a second conductivity type into said semiconductor substrate in the portions of said grooves formed in said field oxide films, and forming common source wiring regions; and subsequently introducing impurity of the second conductivity type into said semiconductor substrate in portions of said grooves formed in said gate insulating film, and forming source regions, wherein said common source wiring regions electrically connect said source regions to thereby form common source regions.
Claim 2
Independent Claim
237 words
A method for manufacturing a semiconductor device comprising the steps of: forming a plurality of striped field oxide films on a semiconductor substrate of a first conductivity type, said field oxide films being spaced apart from each other along a first direction; forming a gate insulating film on a main surface of said semiconductor substrate between said field oxide films; forming a plurality of striped conductive layers on said field oxide films and said gate insulating film, said conductive layers being spaced apart from each other along a second direction crossing said first direction; forming grooves be removing said gate insulating film and said field oxide films between said conductive layers to a depth reaching the main surface of said semiconductor substrate wherein said conductive layers are used as apart of a mask, at least portions of said grooves formed in said field oxide films having a bottom portion being wider than an opening portion and than a space between said conductive layers; introducing impurity of a second conductivity type into said semiconductor substrate in the portions of said grooves formed in said field oxide films, and forming common source wiring regions; and subsequently introducing impurity of the second conductivity type into said semiconductor substrate in portions of said grooves formed in said gate insulating film, and forming source regions, wherein said common source wiring regions electrically connect said source regions to thereby form common source regions.
Claim 3
Dependent Claim
70 words
The method for manufacturing the semiconductor device according to claim 1, wherein the step of introducing impurity of the second conductivity type into said semiconductor substrate in the portions of said grooves formed in said field oxide films introduces impurity with higher concentration than the step of introducing impurity of the second conductivity type into said semiconductor substrate in the portions of said grooves formed in said gate insulating film.
Claim 4
Dependent Claim
72 words
The method for manufacturing the semiconductor device according to claim 1, wherein the step of introducing impurity of the second conductivity type into said semiconductor substrate in the portions of said grooves formed in said field oxide films introduces impurity having a larger junction depth than the step of introducing impurity of the second conductivity type into said semiconductor substrate in the portions of said grooves formed in said gate insulating film.
Claim 5
Dependent Claim
50 words
The method for manufacturing the semiconductor device according to claim 1, wherein the step of forming grooves includes a step of performing anisotoropic etching using an ion beam obliquely radiated on the main surface of said semiconductor substrate wherein said conductive layers are used as a part of the mask.
Claim 6
Dependent Claim
87 words
The method for manufacturing the semiconductor device according to claim 1, wherein the step of forming grooves includes a step of ion-implanting impurity to have a peak of concentration in a region close to said semiconductor substrate in said field oxide films wherein said conductive layers are used as a part of the mask, and a step of performing anisotoropic etching using an ion beam radiated perpendicularly to the main surface of said semiconductor substrate wherein said conductive layers are used as a part of the mask.
Claim 7
Dependent Claim
118 words
The method for manufacturing the semiconductor device according to claim 1, wherein the step of introducing impurity of a second conductivity type into said semiconductor substrate in the portions of said grooves formed in said field oxide films includes a first step of implanting the impurity at a tilt angle of 10° to 40° relative to the normal to the main surface of said semiconductor substrate wherein said conductive layers are used as a part of the mask, and a second step of implanting the impurity at a tilt angle of -10° to -40° relative to the normal to the main surface of said semiconductor substrate wherein said conductive layers are used as a part of the mask.
Claim 8
Dependent Claim
36 words
The method for manufacturing the semiconductor device according to claim 1, further comprising a step of forming a metal layer on said semiconductor substrate in said grooves after the step of forming said common source regions.
Claim 9
Dependent Claim
22 words
The method for manufacturing the semiconductor device according to claim 7, wherein said metal layer is formed by a selective epitaxial growth.
Claim 10
Dependent Claim
48 words
The method for manufacturing the semiconductor device according to claim 1, further comprising a step of forming a silicide layer on said semiconductor substrate in said grooves after the step of forming said common source regions; and the step of forming a metal layer on said silicide layer.
Claim 11
Dependent Claim
39 words
The method for manufacturing the semiconductor device according to claim 1, further comprising a step of forming a silicide layer on the surface of said semiconductor substrate in said grooves after the step of forming said common source regions.
Claim 12
Dependent Claim
44 words
The method for manufacturing the semiconductor device according to claim 1, further comprising forming a silicon layer having an impurity of the second conductivity type on the surface of said semiconductor substrate in said grooves after the step of forming said common source regions.
References Cited (Backward Citations)
US4500899A
Cited
US5019527A
Cited
GB2243718A
Cited
US5103274A
Cited
US5346842A
Cited
US5318921A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-08-20 | 2000-02-19 | 2000-08-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-08-20 | 2004-02-19 | 2004-08-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-08-20 | 2008-02-19 | 2008-08-20 | $7700.00 | Window Closed / Lapsed |