US5545919A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor device and method of fabricating the same
Assignee: Panasonic Holdings Corp
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Filing: 1995-07-03
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Granted: 1996-08-13
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Expires: 2015-07-03
Abstract
Abstract Metal wires are formed side by side over a semiconductor substrate, with an interlayer insulating film interposed between the metal interconnections and the semiconductor substrate. The metal interconnections are covered with a passivation film composed of a lower silicon oxide film and an upper silicon nitride film. The silicon oxide film is deposited so that the maximum thickness of the portions of the silicon oxide film on the side faces of the metal interconnections is less than half of the minimum space between the metal interconnections. The silicon nitride film is deposited so as to be interposed between the portions of the silicon oxide film on the side faces of the adjacent metal interconnections.
Inventors
- 👤 Satoshi Ueda
- 👤 Tetsuya Ueda
- 👤 Atsuhiro Yamano
- 👤 Kousaku Yano
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 17:57
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/10; H10W74/131; H10W74/137; H10W20/00; H10W20/40; H10W20/45; H10W20/48
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
160 words
A semiconductor device comprising: a plurality of metal interconnections, each having a width and side faces, formed side by side on a semiconductor substrate with a space S between said metal interconnections; a silicon oxide film formed on said semiconductor substrate so as to cover said metal interconnections; and a silicon nitride film formed on said silicon oxide film, wherein said silicon oxide film and said silicon nitride film constitute a passivation film and the width of each of said metal interconnections and said space between said interconnections are 0.7 μm or less, said silicon oxide is deposited so that the maximum thickness of portions of the silicon oxide film formed on the side faces of said metal interconnections is less than half of a minimum space between the metal interconnections, and said silicon nitride film is deposited so as to be interposed between the portions of said silicon oxide film formed on the side faces of said metal interconnections.
Claim 2
Dependent Claim
160 words
A semiconductor device comprising: a plurality of metal interconnections, each having a width and side faces, formed side by side on a semiconductor substrate with a space S between said metal interconnections; a silicon oxide film formed on said semiconductor substrate so as to cover said metal interconnections; and a silicon nitride film formed on said silicon oxide film, wherein said silicon oxide film and said silicon nitride film constitute a passivation film and the width of each of said metal interconnections and said space between said interconnections are 0.7 μm or less, said silicon oxide is deposited so that the maximum thickness of portions of the silicon oxide film formed on the side faces of said metal interconnections is less than half of a minimum space between the metal interconnections, and said silicon nitride film is deposited so as to be interposed between the portions of said silicon oxide film formed on the side faces of said metal interconnections.
Claim 3
Dependent Claim
136 words
A semiconductor device comprising: a plurality of metal interconnections having a height H and formed side by side on a semiconductor substrate with a space S between said interconnections; a silicon oxide film formed on said semiconductor substrate so as to cover said metal interconnections; and a silicon nitride film formed on said silicon oxide film, wherein said silicon oxide film and said silicon nitride film constitute a passivation film having a thickness T and the width of each of said interconnections and said space between said metal interconnections are 0.7 μm or less, and said passivation film is deposited so that the relationship among the thickness T of the passivation film, the height H of said metal interconnections and the minimum space S between the metal interconnections is: T<(H 2 +S 2 /2) 1/2 .
Claim 4
Dependent Claim
136 words
A semiconductor device comprising: a plurality of metal interconnections having a height H and formed side by side on a semiconductor substrate with a space S between said interconnections; a silicon oxide film formed on said semiconductor substrate so as to cover said metal interconnections; and a silicon nitride film formed on said silicon oxide film, wherein said silicon oxide film and said silicon nitride film constitute a passivation film having a thickness T and the width of each of said interconnections and said space between said metal interconnections are 0.7 μm or less, and said passivation film is deposited so that the relationship among the thickness T of the passivation film, the height H of said metal interconnections and the minimum space S between the metal interconnections is: T<(H 2 +S 2 /2) 1/2 .
Claim 5
Dependent Claim
94 words
The semiconductor device of claim 2, wherein said silicon oxide is deposited so that the maximum thickness of portions of the silicon oxide film formed on the side faces of said metal interconnections is less than half of a minimum space between the metal interconnections and the width of each of said interconnections and said space between said metal interconnections are 0.7 μM or less, and said silicon nitride film is deposited so as to be interposed between the portions of said silicon oxide film formed on the side faces of said metal interconnections.
References Cited (Backward Citations)
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