Method for manufacturing offset polysilicon thin-film transistor

Claim 1

A method of manufacturing an offset polysilicon thin-film transistor having a silicide covered polysilicon gate disposed between source and drain regions formed in an active semiconductor layer, comprising the steps of: forming a polysilicon gate having a first thickness over the active semiconductor layer; covering the polysilicon gate with a metal layer having a second thickness; forming the source and drain regions on opposite sides of the metal covered polysilicon gate by implanting a high concentration of ions in the active layer using the metal covered polysilicon gate as a mask; after forming the source and drain region, heating the metal covered polysilicon gate to form a silicide layer having a third thickness by reaction of the polysilicon gate and the metal layer; removing a residual portion of the metal layer having a fourth thickness to expose offset regions having a width equal to the fourth thickness; and, implanting a low concentration of ions in the offset regions.

Claim 2

A method of manufacturing an offset polysilicon thin-film transistor having a silicide covered polysilicon gate disposed between source and drain regions formed in an active semiconductor layer, comprising the steps of: forming a polysilicon gate having a first thickness over the active semiconductor layer; covering the polysilicon gate with a metal layer having a second thickness; forming the source and drain regions on opposite sides of the metal covered polysilicon gate by implanting a high concentration of ions in the active layer using the metal covered polysilicon gate as a mask; after forming the source and drain region, heating the metal covered polysilicon gate to form a silicide layer having a third thickness by reaction of the polysilicon gate and the metal layer; removing a residual portion of the metal layer having a fourth thickness to expose offset regions having a width equal to the fourth thickness; and, implanting a low concentration of ions in the offset regions.

Claim 6

A method of manufacturing a polysilicon thin-film transistor, comprising the steps of: forming an active layer over a substrate; forming a gate insulating layer over the active layer; forming a polysilicon gate over the gate insulating layer; forming a metal layer over the polysilicon gate to form a metal covered polysilicon gate; forming source and drain regions in the active layer on opposite sides of the metal covered polysilicon gate by implanting a high concentration of ions in the active layer using the metal covered polysilicon gate as a mask; after forming the source and drain regions, thermally treating the structure formed by the metal layer overlying the polysilicon gate to form a silicide layer from the polysilicon gate and the metal layer; removing a residual portion of the metal layer from the silicide layer to form a silicide covered polysilicon gale; forming offset regions in the active layer between the drain region and one side of the silicide covered polysilicon gate, and between the source region and another side of the silicide covered polysilicon gate by implanting a low concentration of ions in the active layer, such that the offset regions have a width corresponding to the thickness of the residual portion of the metal layer which was removed.

Claim 7

A method of manufacturing a polysilicon thin-film transistor, comprising the steps of: forming an active layer over a substrate; forming a gate insulating layer over the active layer; forming a polysilicon gate over the gate insulating layer; forming a metal layer over the polysilicon gate to form a metal covered polysilicon gate; forming source and drain regions in the active layer on opposite sides of the metal covered polysilicon gate by implanting a high concentration of ions in the active layer using the metal covered polysilicon gate as a mask; after forming the source and drain regions, thermally treating the structure formed by the metal layer overlying the polysilicon gate to form a silicide layer from the polysilicon gate and the metal layer; removing a residual portion of the metal layer from the silicide layer to form a silicide covered polysilicon gale; forming offset regions in the active layer between the drain region and one side of the silicide covered polysilicon gate, and between the source region and another side of the silicide covered polysilicon gate by implanting a low concentration of ions in the active layer, such that the offset regions have a width corresponding to the thickness of the residual portion of the metal layer which was removed.