US5534069A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of treating active material
Assignee: Canon Inc
•
Filing: 1993-07-19
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Granted: 1996-07-09
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Expires: 2013-07-19
Abstract
Abstract An active substance treating method is characterized in that an active substance is caused to react with an inactivating substance in an exhaust system for a thin film forming apparatus. A thin film forming apparatus includes a common chamber having a region where plasma CVD is carried out and a region where thermal CVD is carried out, a device provided in the chamber for pressing a substrate onto a holder, a lamp for illuminating light having a component of a wavelength of 1 μm or above to heat the substrate, an introducing port for separately introducing two active substances to a vicinity of the substrate, a vaporizing device in which at least two bubblers are series-connected to vaporize the active substances, and an exhaust system which is divided into two systems each of which has a heater and which has a port for introducing an inactivating substance into an exhaust pump.
Inventors
- 👤 Hideshi Kuwabara
- 👤 Yasushi Kawasumi
- 👤 Tetsuo Asaba
- 👤 Kenji Makino
- 👤 Yuzo Kataoka
- 👤 Yasuhiro Sekine
- 👤 Shigeru Nishimura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 22:08
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; B; B01; B01D; B01D53/00; B01D53/34; B01D53/46; B01D53/72; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4412; H01J37/32798; H01J37/32816; H01J37/32834; H01J37/32844; Y; Y02; Y02C; Y02C20/00; Y02C20/30
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
73 words
An active substance treating device for a film forming apparatus which comprises: an exhaust pump a reaction chamber for forming said film, said reaction chamber having means for supplying organic metal material an exhaust path between said exhaust pump and said reaction chamber; means for introducing an inactivating substance in vapor form to react with said organic metal material into said exhaust pump, wherein the reaction is carried out in said exhaust pump.
Claim 2
Dependent Claim
73 words
An active substance treating device for a film forming apparatus which comprises: an exhaust pump a reaction chamber for forming said film, said reaction chamber having means for supplying organic metal material an exhaust path between said exhaust pump and said reaction chamber; means for introducing an inactivating substance in vapor form to react with said organic metal material into said exhaust pump, wherein the reaction is carried out in said exhaust pump.
Claim 3
Dependent Claim
23 words
The active substance treating device according to claim 1, wherein the reaction occurs when the active substance is caused to react with oxygen.
Claim 4
Dependent Claim
23 words
The active substance treating device according to claim 1, wherein the reaction is carried out in a plurality of parallel disposed exhaust systems.
Claim 5
Dependent Claim
45 words
The active substance treating device according to claim 1, wherein said film forming apparatus has introducing pipes for introducing gas containing Al atoms and gas containing Si atoms separately into a chamber, an opening of each of said introducing pipes being located near a substrate.
Claim 6
Dependent Claim
27 words
The active substance treating device according to claim 1, further comprising means for supplying the active substance in vapor, said means including at least two series-connected bubblers.
Claim 7
Dependent Claim
37 words
The active substance treating device according to claim 1, wherein said film forming apparatus has a substrate holder and means for placing a substrate on said substrate holder and for pressing the substrate on the substrate holder.
Claim 8
Dependent Claim
35 words
The active substance treating device according to claim 1, wherein said film forming apparatus has a lamp for generating light containing a component having a wavelength of 1 μm or above to heat a substrate.
Claim 9
Dependent Claim
36 words
The active substance treating device according to claim 1, wherein said film forming apparatus includes a common chamber having a region where plasma CVD is carried out and a region where thermal CVD is carried out.
Claim 10
Dependent Claim
18 words
The active substance treating device according to claim 1, wherein the active substance is coated on a substrate.
Claim 11
Dependent Claim
126 words
A film forming apparatus including a common chamber having a region where plasma CVD is carried out and a region where thermal CVD is carried out, means provided in said chamber for pressing a substrate onto a holder, a lamp for illuminating light having a component of a wavelength of 1 μm or above to heat the substrate, introducing ports for separately introducing two active substances to a vicinity of the substrate, at least two bubblers series-connected to vaporize the active substances, an active substance treating device comprising: means for introducing an inactivating substance in vapor form into a pump provided in an exhaust system to react with said active substance, and said exhaust system is divided into two systems each of which has a heater.
Claim 12
Dependent Claim
126 words
A film forming apparatus including a common chamber having a region where plasma CVD is carried out and a region where thermal CVD is carried out, means provided in said chamber for pressing a substrate onto a holder, a lamp for illuminating light having a component of a wavelength of 1 μm or above to heat the substrate, introducing ports for separately introducing two active substances to a vicinity of the substrate, at least two bubblers series-connected to vaporize the active substances, an active substance treating device comprising: means for introducing an inactivating substance in vapor form into a pump provided in an exhaust system to react with said active substance, and said exhaust system is divided into two systems each of which has a heater.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-07-09 | 2000-01-08 | 2000-07-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-07-09 | 2004-01-08 | 2004-07-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-07-09 | 2008-01-08 | 2008-07-09 | $7700.00 | Window Closed / Lapsed |