US5532188A
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Global planarization of multiple layers
Assignee: Texas Instruments Inc
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Filing: 1994-03-30
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Granted: 1996-07-02
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Expires: 2014-03-30
Abstract
Abstract A method is disclosed for performing global planarization of the top layer of a structure having multiple patterned layers, during fabrication of an integrated circuit (10). An integrated circuit fabricated using the method is also disclosed. The method involves globally planarizing an integrated circuit (10) having a plurality of patterned layers (14, 18) interleaved with a plurality of unpatterned layers (16, 20). Each of the patterned layers (14, 18) is associated with a pattern mask (22, 24). The topmost layer (20) can be an unpatterned layer. Next, the pattern masks (22, 24) are combined to form a planarizing block mask (44) by merging a weighted inverse spatial interpolation of each pattern mask (22, 24). A planarizing block layer (60) is then formed on top of the topmost layer (20) using the planarizing block mask (44). Next, an unpatterned planarizing film layer (62) is formed on top of the planarizing block layer (60). Finally, the film layer (62), the block layer (60) and the topmost layer (20) are etched to cause global planarization of the topmost layer (20).
Inventors
- 👤 Peter J. Wright
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 12:15
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/092; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/943
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
167 words
A method for performing global planarization of the top layer of a structure having multiple patterned layers, during fabrication of an integrated circuit having a plurality of patterned layers interleaved with a plurality of unpatterned layers wherein each of said patterned layers is associated with a pattern mask and wherein one of the layers is a topmost layer, comprising the steps of: forming a planarizing block mask, said planarizing block mask being a combined weighted inverse spatial interpolation of each said pattern mask, said planarizing block mask being formed by ANDing the inverse of each of said pattern masks with an associated layer template mask to form weighted inverse masks and overlaying said weighted inverse masks; forming a planarizing block layer on top of said topmost layer using said planarizing block mask; forming an unpatterned planarizing film layer on top of said planarizing block layer; and etching said unpatterned planarizing film layer, said planarizing block layer, and said topmost layer to cause planarization of said topmost layer.
Claim 2
Independent Claim
167 words
A method for performing global planarization of the top layer of a structure having multiple patterned layers, during fabrication of an integrated circuit having a plurality of patterned layers interleaved with a plurality of unpatterned layers wherein each of said patterned layers is associated with a pattern mask and wherein one of the layers is a topmost layer, comprising the steps of: forming a planarizing block mask, said planarizing block mask being a combined weighted inverse spatial interpolation of each said pattern mask, said planarizing block mask being formed by ANDing the inverse of each of said pattern masks with an associated layer template mask to form weighted inverse masks and overlaying said weighted inverse masks; forming a planarizing block layer on top of said topmost layer using said planarizing block mask; forming an unpatterned planarizing film layer on top of said planarizing block layer; and etching said unpatterned planarizing film layer, said planarizing block layer, and said topmost layer to cause planarization of said topmost layer.
Claim 3
Dependent Claim
187 words
The method of claim 1 wherein said step of forming a planarizing block mask comprises the steps of: creating a global template mask comprising a grid of similarly shaped units wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer and wherein each subunit is associated with only one patterned layer; creating layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; creating said weighted inverse masks, said weighted inverse masks created for a particular patterned layer by taking the logical `and` between the inverse of said pattern mask and said layer template mask associated with said particular patterned layer; and summing said weighted inverse masks to form said planarizing block mask.
Claim 4
Dependent Claim
196 words
The method of claim 1 wherein said step of forming a planarizing block mask comprises the steps of: creating a global template mask comprising a grid of similarly shaped units wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer and wherein each subunit is associated with only one patterned layer and wherein said similarly shaped units are rectangles; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; creating said weighted inverse mask, said weighted inverse mask created for a particular patterned layer by taking the logical `and` between the inverse of said pattern mask and said layer template mask associated with said particular patterned layer; and summing said weighted inverse masks to form said planarizing block mask.
Claim 5
Dependent Claim
195 words
The method of claim 1 wherein said step of forming a planarizing block mask comprises the steps of: creating a global template mask comprising a grid of similarly shaped units wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer and wherein each subunit is associated with only one patterned layer and wherein said subunits have equal area; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; creating said weighted inverse mask, said weighted inverse mask created for a particular patterned layer by taking the logical `and` between the inverse of said pattern mask and said layer template mask associated with said particular patterned layer; and summing said weighted inverse masks to form said planarizing block mask.
Claim 6
Dependent Claim
250 words
The method of claim 1 wherein said step of forming a planarizing block mask comprises the steps of: creating a global template mask comprising a grid of similarly shaped units wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer and wherein each subunit is associated with only one patterned layer wherein said subunits have an area proportional to the area of said unit such that the ratio of the area of a particular subunit to the area of said unit is substantially equal to the ratio of the thickness of the patterned layer with which said particular subunit is associated to the sum of the thicknesses of said plurality of patterned layers; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; creating said weighted inverse mask, said weighted inverse mask created for a particular patterned layer by taking the logical `and` between the inverse of said pattern mask and said layer template mask associated with said particular patterned layer; and summing said weighted inverse masks to form said planarizing block mask.
Claim 7
Dependent Claim
228 words
The method of claim 1 wherein said step of forming a planarizing block mask comprises the steps of: creating a global template mask comprising a grid of similarly shaped units wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer and wherein each subunit is associated with only one patterned layer; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; creating said weighted inverse mask, said weighted inverse mask created for a particular patterned layer by taking the logical `and` between the inverse of said pattern mask and said layer template mask associated with said particular patterned layer; summing said weighted inverse masks to form a planarizing block mask; and wherein step of taking the inverse of said pattern masks further comprises the steps of: enlarging positive areas on each of said patterned masks to form enlarged masks; and taking the inverse of said enlarged masks to form inverse masks.
Claim 8
Independent Claim
150 words
A method for performing global planarization of the top layer of a structure having multiple patterned layers, during fabrication of an integrated circuit having a plurality of patterned layers interleaved with a plurality of unpatterned layers wherein each of said patterned layers is associated with a pattern mask and wherein one of the layers is a topmost layer, comprising the steps of; creating a weighted spatial interpolation of each of said pattern masks; taking the inverse of each of said weighted spatial interpolations to form inverse interpolation masks; forming a planarizing block mask by multiplying said inverse interpolation masks; forming a planarizing block layer on top of said topmost layer using said planarizing block mask; forming an unpatterned planarizing film layer on top of said planarizing block layer; and etching said unpatterned planarizing film layer, said planarizing block layer, and said topmost layer to cause planarization of said topmost layer.
Claim 9
Independent Claim
150 words
A method for performing global planarization of the top layer of a structure having multiple patterned layers, during fabrication of an integrated circuit having a plurality of patterned layers interleaved with a plurality of unpatterned layers wherein each of said patterned layers is associated with a pattern mask and wherein one of the layers is a topmost layer, comprising the steps of; creating a weighted spatial interpolation of each of said pattern masks; taking the inverse of each of said weighted spatial interpolations to form inverse interpolation masks; forming a planarizing block mask by multiplying said inverse interpolation masks; forming a planarizing block layer on top of said topmost layer using said planarizing block mask; forming an unpatterned planarizing film layer on top of said planarizing block layer; and etching said unpatterned planarizing film layer, said planarizing block layer, and said topmost layer to cause planarization of said topmost layer.
Claim 10
Dependent Claim
185 words
The method of claim 7 wherein said step of creating a weighted spatial interpolation of each of said pattern masks comprises the steps of: creating a global template mask comprising a grid of similarly shaped units, wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer, and wherein each subunit is associated with only one patterned layer; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; and creating a weighted spatial interpolation of each said pattern mask, said weighted spatial interpolation created for a particular patterned layer by taking the logical `and` between the pattern mask and the layer template mask associated with said particular patterned layer.
Claim 11
Dependent Claim
192 words
The method of claim 7 wherein said step of creating a weighted spatial interpolation of each of said pattern masks comprises the steps of: creating a global template mask comprising a grid of similarly shaped units, wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer, and wherein each subunit is associated with only one patterned layer wherein said similarly shaped units are rectangles; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; and creating a weighted spatial interpolation of each said pattern mask, said weighted spatial interpolation created for a particular patterned layer by taking the logical `and` between the pattern mask and the layer template mask associated with said particular patterned layer.
Claim 12
Dependent Claim
191 words
The method of claim 7 wherein said step of creating a weighted spatial interpolation of each of said pattern masks comprises the steps of: creating a global template mask comprising a grid of similarly shaped units, wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer, and wherein each subunit is associated with only one patterned layer wherein said subunits have equal area; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; and creating a weighted spatial interpolation of each said pattern mask, said weighted spatial interpolation created for a particular patterned layer by taking the logical `and` between the pattern mask and the layer template mask associated with said particular patterned layer.
Claim 13
Dependent Claim
248 words
The method of claim 7 wherein said step of creating a weighted spatial interpolation of each of said pattern masks comprises the steps of: creating a global template mask comprising a grid of similarly shaped units, wherein each said unit has been subdivided into a plurality of subunits, wherein each unit has at least one subunit associated with each patterned layer, and wherein each subunit is associated with only one patterned layer and wherein said subunits have an area proportional to the area of said unit such that the ratio of the area of a particular subunit to the area of said unit is approximately equal to the ratio of the thickness of the patterned layer with which said particular subunit is associated to the sum of the thicknesses of said plurality of patterned layers; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer comprising a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for boolean values associated with those subunits that were associated with said specific patterned layer when creating said global template mask; and creating a weighted spatial interpolation of each said pattern mask, said weighted spatial interpolation created for a particular patterned layer by taking the logical `and` between the pattern mask and the layer template mask associated with said particular patterned layer.
Claim 14
Independent Claim
156 words
A method for performing global planarization of the top layer of a structure having multiple patterned layers, during fabrication of an integrated circuit having a plurality of patterned layers interleaved with a plurality of unpatterned layers wherein each of said patterned layers is associated with a pattern mask and wherein one of the layers is a topmost layer, comprising the steps of: combining said pattern masks to form a planarizing block mask said combining step further comprising, summing a weighted spatial interpolation of each said pattern mask to form an intermediate mask; taking the inverse of said intermediate mask to form said planarizing block mask; forming a planarizing block layer on top of said topmost layer using said planarizing block mask; forming an unpatterned planarizing film layer on top of said planarizing block layer; and etching said unpatterned planarizing film layer, said planarizing block layer, and said topmost layer to cause planarization of said topmost layer.
Claim 15
Independent Claim
156 words
A method for performing global planarization of the top layer of a structure having multiple patterned layers, during fabrication of an integrated circuit having a plurality of patterned layers interleaved with a plurality of unpatterned layers wherein each of said patterned layers is associated with a pattern mask and wherein one of the layers is a topmost layer, comprising the steps of: combining said pattern masks to form a planarizing block mask said combining step further comprising, summing a weighted spatial interpolation of each said pattern mask to form an intermediate mask; taking the inverse of said intermediate mask to form said planarizing block mask; forming a planarizing block layer on top of said topmost layer using said planarizing block mask; forming an unpatterned planarizing film layer on top of said planarizing block layer; and etching said unpatterned planarizing film layer, said planarizing block layer, and said topmost layer to cause planarization of said topmost layer.
Claim 16
Dependent Claim
188 words
The method of claim 12 wherein the summing step comprises the steps of: creating a global template mask comprising a grid of similarly shaped units wherein each said unit has been subdivided into a plurality of subunits wherein each unit has at least one subunit associated with each patterned layer and wherein each subunit is associated with one and only one patterned layer; creating a layer template mask associated with each said patterned layer, said layer template mask for a specific patterned layer consisting of a series of boolean values associated with each said subunit of said global template mask wherein all boolean values in a layer template mask have a value of false except for said boolean values associated with said subunits that were associated with said specific patterned layer when creating said global template mask; creating a weighted spatial interpolation of each said pattern mask, said weighted spatial interpolation created for a particular patterned layer by taking the logical `and` between the pattern mask and the layer template mask associated with said particular patterned layer; and summing said weighted spatial interpolations to form an intermediate mask.
Claim 17
Dependent Claim
12 words
The method of claim 13 wherein said similarly shaped units are rectangles.
Claim 18
Dependent Claim
11 words
The method of claim 13 wherein said subunits have equal area.
Claim 19
Dependent Claim
67 words
The method of claim 13 wherein said subunits have an area proportional to the area of said unit such that the ratio of the area of a particular subunit to the area of said unit is approximately equal to the ratio of the thickness of the patterned layer with which said particular subunit is associated to the sum of the thicknesses of said plurality of patterned layers.
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1999-07-02 | 2000-01-01 | 2000-07-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-07-02 | 2004-01-01 | 2004-07-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-07-02 | 2008-01-01 | 2008-07-02 | $7700.00 | Window Closed / Lapsed |