Article comprising heteroepitaxial III-V nitride semiconductor material on a substrate
Abstract
Abstract We have discovered advantageous substrates for III-V nitride semiconductors such as GaN. The substrate material is of the YbFe 2 O 4 or InFeO 3 (ZnO) n structure type and has general composition RAO 3 (MO) n , where R is one or more of Sc, In, Y and the lanthanides (atomic number 67-71); A is one or more of Fe(III), Ga, and Al; M is one or more of Mg, Mn, Fe(II), Co, Cu, Zn and Cd; and n is an integer≧1, typically<9. Furthermore, the substrate material is selected to have a lattice constant that provides less than ±5% lattice mismatch with the III-V nitride semiconductor material that is to be deposited thereon. At least some of the substrate materials (e.g., ScMgAlO 4 ) typically can be readily and relatively cheaply produced in single crystal form, are readily clearable on the basal plane, and do essentially not interact chemically with the III-V nitride under typical deposition conditions. Use of the novel substrate materials for opto-electronic device manufacture is contemplated.
Inventors
- 👤 Charles D. Brandle, Jr.
- 👤 Denis N. Buchanan
- 👤 Elliot H. Hartford, Jr.
- 👤 Eric S. Hellman
- 👤 Lynn F. Schneemeyer
Bibliographic Details
Claims Analysis
Total Claims: 10References Cited (Backward Citations)
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