Patent US3926752A successfully refreshed from Google Patents.
Patent US5529632A successfully refreshed from Google Patents.
US5529632A
Expired / Lapsed
US
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Microwave plasma processing system
Assignee: Nippon Steel Corp
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Filing: 1995-06-13
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Granted: 1996-06-25
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Expires: 2015-06-13
Abstract
Abstract A microwave plasma processing system has heating means for heating the wall of a reaction chamber, and an adhesion preventing member in which a cylinder disposed so as to be in contact with the inner face of a wall of the reaction chamber and a microwave reflecting plate having a gas discharge hole are integrally formed. A microwave plasma processing system has heating means for heating the wall of a reaction chamber, and a microwave reflecting plate which is attached to the inner face of a wall of the reaction chamber and which has a gas discharge hole.
Inventors
- 👤 Katsuo Katayama
- 👤 Kyoichi Komachi
- 👤 Hiroshi Mabuchi
- 👤 Takeshi Akimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 10:25
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32458; H01J37/32477; H01J37/32504; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; Y; Y10; Y10S; Y10S156/00; Y10S156/916
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
181 words
A microwave plasma processing system comprising: a microwave oscillator; a reactor to which a microwave oscillated by said microwave oscillator and a reactant gas are to be introduced; a waveguide for guiding the microwave to said reactor; a dielectric passage formed on a face of said reactor and connected to said waveguide; a microwave introduction window disposed so as to partition said reactor into said dielectric passage and a reaction chamber; a sample holder disposed in said reaction chamber; means for applying an electric field to said sample holder; means for supplying the reactant gas to said reaction chamber; means for controlling a wall temperature of said reaction chamber; and an adhesion preventing member in which a cylinder disposed in contact with an inner face of the wall of said reaction chamber, and a microwave reflecting plate are integrally formed, said reflecting plate perpendicularly elongating from an inner side face of said cylinder toward a periphery of said sample holder in a manner that said reflecting plate opposes said microwave introduction window, and said reflecting plate having a gas discharge hole.
Claim 2
Dependent Claim
181 words
A microwave plasma processing system comprising: a microwave oscillator; a reactor to which a microwave oscillated by said microwave oscillator and a reactant gas are to be introduced; a waveguide for guiding the microwave to said reactor; a dielectric passage formed on a face of said reactor and connected to said waveguide; a microwave introduction window disposed so as to partition said reactor into said dielectric passage and a reaction chamber; a sample holder disposed in said reaction chamber; means for applying an electric field to said sample holder; means for supplying the reactant gas to said reaction chamber; means for controlling a wall temperature of said reaction chamber; and an adhesion preventing member in which a cylinder disposed in contact with an inner face of the wall of said reaction chamber, and a microwave reflecting plate are integrally formed, said reflecting plate perpendicularly elongating from an inner side face of said cylinder toward a periphery of said sample holder in a manner that said reflecting plate opposes said microwave introduction window, and said reflecting plate having a gas discharge hole.
Claim 3
Dependent Claim
30 words
A microwave plasma processing system according to claim 1, further comprising a conductor which is disposed between said microwave introduction window and said sample holder, and has microwave transmission holes.
Claim 4
Dependent Claim
33 words
A microwave plasma processing system according to claim 1, wherein said adhesion preventing member integrally comprises a conductor which is disposed in contact with said microwave introduction window and has microwave transmission holes.
Claim 5
Dependent Claim
38 words
A microwave plasma processing system according to claim 1, wherein said adhesion preventing member integrally comprises a conductor which is disposed at the midpoint between said microwave introduction window and said sample holder and has microwave transmission holes.
Claim 6
Dependent Claim
156 words
A microwave plasma processing system comprising: a microwave oscillator; a reactor to which a microwave oscillated by said microwave oscillator and a reactant gas are to be introduced; a waveguide for guiding the microwave to said reactor; a dielectric passage formed on a face of said reactor, and connected to said waveguide; a microwave introduction window is disposed so as to partition said reactor into said dielectric passage and a reaction chamber; a sample holder disposed in said reaction chamber; means for applying an electric field to said sample holder; means for supplying the reactant gas to said reaction chamber; means for controlling a wall temperature of said reaction chamber; and a microwave reflecting plate which perpendicularly elongates from an inner face of the wall of said reaction chamber toward a periphery of said sample holder in a manner that said reflecting plate opposes said microwave introduction window, said reflecting plate having a gas discharge hole.
Claim 7
Dependent Claim
156 words
A microwave plasma processing system comprising: a microwave oscillator; a reactor to which a microwave oscillated by said microwave oscillator and a reactant gas are to be introduced; a waveguide for guiding the microwave to said reactor; a dielectric passage formed on a face of said reactor, and connected to said waveguide; a microwave introduction window is disposed so as to partition said reactor into said dielectric passage and a reaction chamber; a sample holder disposed in said reaction chamber; means for applying an electric field to said sample holder; means for supplying the reactant gas to said reaction chamber; means for controlling a wall temperature of said reaction chamber; and a microwave reflecting plate which perpendicularly elongates from an inner face of the wall of said reaction chamber toward a periphery of said sample holder in a manner that said reflecting plate opposes said microwave introduction window, said reflecting plate having a gas discharge hole.
Claim 8
Dependent Claim
30 words
A microwave plasma processing system according to claim 5, further comprising a conductor which is disposed between said microwave introduction window and said sample holder and has microwave transmission holes.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-06-25 | 1999-12-25 | 2000-06-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-06-25 | 2003-12-25 | 2004-06-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-06-25 | 2007-12-25 | 2008-06-25 | $7700.00 | Window Closed / Lapsed |