US5523258A
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US
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Method for avoiding lithographic rounding effects for semiconductor fabrication
Assignee: Callahan Cellular LLC
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Filing: 1994-04-29
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Granted: 1996-06-04
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Expires: 2014-04-29
Abstract
Abstract The use of separate masks to pattern the same layer of material formed over a semiconductor substrate serves to reduce or avoid lithographic rounding effects. A layer of material formed over a semiconductor substrate may be patterned in accordance with separate masks. A first mask may have a feature which is substantially perpendicular to a feature of a separate second mask. Where the layer is patterned to form transistor gates, the minimum amount each transistor gate should extend over the edge of its active region under the endcap rule may be reduced. In this regard, a line pattern mask and a gap mask are used to avoid lithographic rounding effects in forming the transistor gates. Semiconductor devices may thus be fabricated with higher packing densities as transistors may be placed closer to one another.
Inventors
- 👤 Christopher J. Petti
- 👤 Andre N. Stolmeijer
- 👤 Mark A. Helm
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 08:47
CPC Classifications
H; H10; H10D; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/02; H10D84/03; H10D84/038; H10W; H10W20/00; H10W20/01; Y; Y10; Y10S; Y10S148/00; Y10S148/102; Y10S438/00; Y10S438/942; Y10S438/948
Claims Analysis
Total Claims: 38
Claim 1
Independent Claim
157 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of; (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the pattering step (c), wherein the first material comprises a conductive material and wherein the patterning step (d) patterns the first layer to form transistor gates over the semiconductor substrate.
Claim 2
Independent Claim
157 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of; (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the pattering step (c), wherein the first material comprises a conductive material and wherein the patterning step (d) patterns the first layer to form transistor gates over the semiconductor substrate.
Claim 3
Independent Claim
147 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of: (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the second material comprises a material selected from the group consisting of oxide and nitride.
Claim 4
Independent Claim
147 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of: (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the second material comprises a material selected from the group consisting of oxide and nitride.
Claim 5
Independent Claim
210 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a second layer comprising a second material; (c) patterning the second layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of; (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the patterning step (c) comprises the step of forming a gap in the mask layer; wherein the method further comprises the step of forming spacers in the gap of the mask layer; and wherein the patterning step (d) comprises the step of patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c) and after the spacers have been formed in the gap of the mask layer.
Claim 6
Independent Claim
210 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a second layer comprising a second material; (c) patterning the second layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of; (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the patterning step (c) comprises the step of forming a gap in the mask layer; wherein the method further comprises the step of forming spacers in the gap of the mask layer; and wherein the patterning step (d) comprises the step of patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c) and after the spacers have been formed in the gap of the mask layer.
Claim 7
Independent Claim
167 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a second layer comprising a second material; (c) patterning the second layer in accordance with a first pattern; (d) forming a mask layer comprising a third material over the second layer after the second layer has been patterned in the patterning step (c); (e) patterning the mask layer in accordance with a second pattern and a third pattern, wherein the patterning step (e) includes the steps of: (i) using the second pattern for defining the mask layer, and (ii) using the third pattern for defining the mask layer after the second pattern has been used in the using step (e)(i); (iii) patterning the mask layer in accordance with the second and third patterns; and (f) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (e).
Claim 8
Independent Claim
167 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a second layer comprising a second material; (c) patterning the second layer in accordance with a first pattern; (d) forming a mask layer comprising a third material over the second layer after the second layer has been patterned in the patterning step (c); (e) patterning the mask layer in accordance with a second pattern and a third pattern, wherein the patterning step (e) includes the steps of: (i) using the second pattern for defining the mask layer, and (ii) using the third pattern for defining the mask layer after the second pattern has been used in the using step (e)(i); (iii) patterning the mask layer in accordance with the second and third patterns; and (f) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (e).
Claim 9
Dependent Claim
56 words
The method of claim 4, wherein the using step (e)(i) comprises the step of patterning the mask layer in accordance with the second pattern; and wherein the using step (e)(ii) comprises the step of patterning the mask layer in accordance with the third pattern after the mask layer has been patterned in the using step (e)(i).
Claim 10
Dependent Claim
28 words
The method of claim 4, wherein the second pattern comprises a first feature and wherein the third pattern comprises a second feature substantially perpendicular to the first feature.
Claim 11
Dependent Claim
28 words
The method of claim 5, wherein the second pattern comprises a first feature and wherein the third pattern comprises a second feature substantially perpendicular to the first feature.
Claim 12
Dependent Claim
31 words
The method of claim 6, wherein the first material comprises a conductive material and wherein the patterning step (f) patterns the first layer to form transistor gates over the semiconductor substrate.
Claim 13
Dependent Claim
31 words
The method of claim 7, wherein the first material comprises a conductive material and wherein the patterning step (f) patterns the first layer to form transistor gates over the semiconductor substrate.
Claim 14
Dependent Claim
12 words
The method of claim 4, wherein the third material comprises photosensitive material.
Claim 15
Dependent Claim
21 words
The method of claim 5, wherein the third material comprises a material selected from the group consisting of oxide and nitride.
Claim 16
Dependent Claim
21 words
The method of claim 4, further comprising the step of forming a silicide layer over exposed portions of the first layer.
Claim 17
Dependent Claim
91 words
The method of claim 4, wherein the patterning step (c) comprises the step of forming a gap in the second layer; wherein the method further comprises the step of forming spacers in the gap of the second layer; and wherein the patterning step (f) comprises the step of patterning the first layer in accordance with the mask layer and in accordance with the second layer after the second layer has been patterned in the patterning step (c) and after the spacers have been formed in the gap of the second layer.
Claim 18
Independent Claim
153 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of: (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the patterning step (c) patterns the mask layer to form a patterned mask layer having a pattern separated by a gap.
Claim 19
Independent Claim
153 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of: (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the patterning step (c) patterns the mask layer to form a patterned mask layer having a pattern separated by a gap.
Claim 20
Independent Claim
148 words
A method for use in semiconductor fabrication comprising the steps of; (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of: (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the first pattern comprises a line pattern and wherein the second pattern comprises a gap pattern.
Claim 21
Independent Claim
148 words
A method for use in semiconductor fabrication comprising the steps of; (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of: (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i); (iii) patterning the mask layer in accordance with the first and second patterns; and (d) patterning the first layer in accordance with the mask layer after the mask layer has been patterned in the patterning step (c), wherein the first pattern comprises a line pattern and wherein the second pattern comprises a gap pattern.
Claim 22
Dependent Claim
27 words
The method of claim 4, wherein the patterning step (e) pattern the mask layer to form a patterned mask layer having a pattern separated by a gap.
Claim 23
Dependent Claim
22 words
The method of claim 4, wherein the second pattern comprises a line pattern and wherein the third pattern comprise a gap pattern.
Claim 24
Dependent Claim
21 words
The method of claim 4, wherein the second material comprises a material selected from the group consisting of oxide and nitride.
Claim 25
Independent Claim
139 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of; (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i), and (iii) patterning the mask layer in accordance with the first and the second patterns, wherein the first pattern comprises a line pattern and wherein the second pattern comprises a gap pattern; and; (d) patterning the first layer in accordance with the patterned mask layer.
Claim 26
Independent Claim
139 words
A method for use in semiconductor fabrication comprising the steps of: (a) forming over a semiconductor substrate a first layer comprising a first material; (b) forming over the semiconductor substrate a mask layer comprising a second material; (c) patterning the mask layer in accordance with a first pattern and a second pattern, wherein the patterning step (c) includes the steps of; (i) using the first pattern for defining the mask layer, and (ii) using the second pattern for defining the mask layer after the first pattern has been used in the using step (c)(i), and (iii) patterning the mask layer in accordance with the first and the second patterns, wherein the first pattern comprises a line pattern and wherein the second pattern comprises a gap pattern; and; (d) patterning the first layer in accordance with the patterned mask layer.
Claim 27
Dependent Claim
28 words
The method of claim 19, wherein the first pattern comprises a first feature and wherein the second pattern comprises a second feature substantially perpendicular to the first feature.
Claim 28
Dependent Claim
11 words
The methods of claim 19, wherein the second material comprises photoresist.
Claim 29
Dependent Claim
13 words
The method of claim 19, wherein the first material comprises a conductive material.
Claim 30
Dependent Claim
22 words
The method of claim 22, wherein the patterning step (d) patterns the first layer to form transistor gates over the semiconductor substrate.
Claim 31
Independent Claim
79 words
A method for use in semiconductor fabrication comprising the step of: depositing a first layer on a substrate; depositing a photosensitive layer on said first layer; exposing said photosensitive layer to a first pattern having a first feature; and exposing said photosensitive layer to a second pattern having a second feature, wherein at least a portion of one of said first and said second features overlaps at least a portion of the other of said first said second features.
Claim 32
Independent Claim
79 words
A method for use in semiconductor fabrication comprising the step of: depositing a first layer on a substrate; depositing a photosensitive layer on said first layer; exposing said photosensitive layer to a first pattern having a first feature; and exposing said photosensitive layer to a second pattern having a second feature, wherein at least a portion of one of said first and said second features overlaps at least a portion of the other of said first said second features.
Claim 33
Dependent Claim
20 words
The method of claim 24 further comprising the step of developing said photosensitive layer to form a patterned photosensitive layer.
Claim 34
Dependent Claim
63 words
The method as described in claim 25 wherein said step of developing said photosensitive layer is performed after said steps of exposing said photosensitive layer to said first pattern and exposing said photosensitive layer to said second pattern, without a development step between said steps of exposing said photosensitive layer to said first pattern and exposing said photosensitive layer to said second pattern.
Claim 35
Dependent Claim
49 words
The method as described in claim 25 wherein said step of developing said photosensitive layer comprises developing said photosensitive layer after said step of exposing said photosensitive layer to said first pattern and developing said photosensitive layer after said step of exposing said photosensitive layer to said second pattern.
Claim 36
Dependent Claim
18 words
The method as described in claim 24 wherein said first feature is substantially perpendicular to said second feature.
Claim 37
Dependent Claim
17 words
The method as described in claim 25 wherein said patterned photosensitive layer comprises a transistor gate pattern.
Claim 38
Dependent Claim
17 words
The method as described in claim 26 wherein said patterned photosensitive layer comprises a transistor gate pattern.
References Cited (Backward Citations)
US4792534A
Cited
US5023203A
Cited
US5039625A
Cited
US5320932A
Cited
US5208124A
Cited
US5316878A
Cited
US5264718A
Cited
JPH05105948A
Cited
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