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Patent US5522936A successfully refreshed from Google Patents.
US5522936A
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US
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Thin film deposition apparatus
Assignee: Canon Anelva Corp
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Filing: 1995-08-28
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Granted: 1996-06-04
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Expires: 2015-08-28
Abstract
Abstract A thin film deposition apparatus forms a thin film onto substrates by use of a plasma gas and a material gas. In this apparatus, generation of particles in a deposition chamber can be reduced and hence a high quality thin film with fewer surface defects can be formed. The apparatus comprises a bell jar, a power-supply unit for supplying electric power to the bell jar, a deposition chamber, a vacuum pumping unit for evacuating the deposition chamber, a first gas introduction unit for introducing a gas used for generating plasma, and a second gas introduction unit for introducing a material gas used for forming the thin film, and further a blocking member for preventing either or both of the material gas and the plasma from entering a space between a gas supply end-portion of the second introduction unit and an interior surface of the deposition chamber. The blocking member is shaped to have relatively large curvature.
Inventors
- 👤 Takahiro Tamura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 06:26
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/4558; H; H10; H10P; H10P14/00; H10P14/20; C23C16/4401; C23C16/50; C23C16/505; C23C16/507; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H01J37/32623; H01J37/32633; H01J2237/00; H01J2237/02; H01J2237/022
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
124 words
A thin film deposition apparatus comprising a plasma generating chamber, a power-supply unit for supplying electric power to said plasma generating chamber, a deposition chamber spatially connected with said plasma generating chamber, a vacuum pumping unit for evacuating said plasma generating chamber and deposition chamber, a first gas introduction unit for introducing a gas used for generating plasma into said deposition chamber, and a second gas introduction unit for introducing a material gas used for forming a thin film on a substrate into said deposition chamber, comprising: a blocking means for preventing either or both of said material gas and said plasma from entering a space between a gas supply end-portion of said second introduction unit and an interior surface of said deposition chamber.
Claim 2
Dependent Claim
124 words
A thin film deposition apparatus comprising a plasma generating chamber, a power-supply unit for supplying electric power to said plasma generating chamber, a deposition chamber spatially connected with said plasma generating chamber, a vacuum pumping unit for evacuating said plasma generating chamber and deposition chamber, a first gas introduction unit for introducing a gas used for generating plasma into said deposition chamber, and a second gas introduction unit for introducing a material gas used for forming a thin film on a substrate into said deposition chamber, comprising: a blocking means for preventing either or both of said material gas and said plasma from entering a space between a gas supply end-portion of said second introduction unit and an interior surface of said deposition chamber.
Claim 3
Dependent Claim
21 words
A thin film deposition apparatus according to claim 1, wherein said blocking means is arranged so as to cover said space.
Claim 4
Dependent Claim
20 words
A thin film deposition apparatus according to claim 1, wherein said blocking means has a shape having relatively large curvature.
Claim 5
Dependent Claim
42 words
A thin film deposition apparatus according to claim 1, wherein members disposed in the space between said gas supply end-portion and said interior surface, each of which has portions of relatively small curvature or sharp angle, are covered by said blocking means.
Claim 6
Dependent Claim
24 words
A thin film deposition apparatus according to claim 1, wherein said blocking means is electrically insulated from said deposition chamber by means of insulators.
Claim 7
Dependent Claim
69 words
A thin film deposition apparatus according to claim 1, wherein said blocking means has an annular shape whose exterior portion is opened to have a vertical section like a letter "U" turned sideways and gas outlets that are located in positions respectively identical to positions of gas outlets formed in said gas supply end-portion, and is arranged so as to cover said gas supply end-portion together with said space.
Claim 8
Dependent Claim
20 words
A thin film deposition apparatus according to claim 6, wherein said blocking means has a shape having relatively large curvature.
Claim 9
Dependent Claim
42 words
A thin film deposition apparatus according to claim 6, wherein members disposed in the space between said gas supply end-portion and said interior surface, each of which has portions of relatively small curvature or sharp angle, are covered by said blocking means.
Claim 10
Dependent Claim
30 words
A thin film deposition apparatus according to claim 6, wherein two exterior edges of said blocking means are electrically insulated from said deposition chamber by means of two ring-shaped insulators.
References Cited (Backward Citations)
US4401054A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-06-04 | 1999-12-04 | 2000-06-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-06-04 | 2003-12-04 | 2004-06-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-06-04 | 2007-12-04 | 2008-06-04 | $7700.00 | Window Closed / Lapsed |