Patent US5518552A successfully refreshed from Google Patents.
US5518552A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for scrubbing and cleaning substrate
Assignee: Tokyo Electron Ltd
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Filing: 1994-06-29
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Granted: 1996-05-21
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Expires: 2014-06-29
Abstract
Abstract A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.
Inventors
- 👤 Kouichi Tanoue
- 👤 Shinzi Kitamura
- 👤 Noriyuki Anai
- 👤 Takami Satoh
- 👤 Takayuki Tomoeda
- 👤 Tatsuya Iwasaki
- 👤 Kengo Mizosaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 15:08
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P72/0411; H10P72/0414; G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; H10P72/0412
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
114 words
A method for scrubbing and cleaning a substrate comprising the steps of: carrying a substrate to rotatable scrubbing means; scrubbing both surfaces of the substrate by the rotatable scrubbing means with said substrate substantially horizontal while applying a cleaning solution onto said both surfaces when the substrate is being carried substantially in a horizontal direction and wherein the substrate is linearly reciprocated during scrubbing both surfaces to have both surfaces of the substrate scrubbed by said rotatable scrubbing means; rinsing the substrate by applying a rinsing solution or rinsing water to the substrate; and rotating the substrate to remove solution adhered from the substrate by centrifugal force so as to make the substrate dry.
Claim 2
Independent Claim
114 words
A method for scrubbing and cleaning a substrate comprising the steps of: carrying a substrate to rotatable scrubbing means; scrubbing both surfaces of the substrate by the rotatable scrubbing means with said substrate substantially horizontal while applying a cleaning solution onto said both surfaces when the substrate is being carried substantially in a horizontal direction and wherein the substrate is linearly reciprocated during scrubbing both surfaces to have both surfaces of the substrate scrubbed by said rotatable scrubbing means; rinsing the substrate by applying a rinsing solution or rinsing water to the substrate; and rotating the substrate to remove solution adhered from the substrate by centrifugal force so as to make the substrate dry.
Claim 3
Dependent Claim
30 words
The method according to claim 1, wherein rinsing the substrate includes pressurizing the rinsing solution or rinsing water to 10-20 Kg/cm 2 and spraying the rinsing solution or rinsing water.
Claim 4
Dependent Claim
24 words
The method according to claim 1, wherein rinsing the substrate includes jetting pressurized water to the substrate after scrubbing both surfaces of the substrate.
Claim 5
Dependent Claim
30 words
The method according to claim 1, wherein rinsing the substrate includes spraying water, to which ultrasonic waves have been applied, to the substrate after scrubbing both surfaces of the substrate.
Claim 6
Dependent Claim
38 words
The method according to claim 1, wherein rinsing the substrate includes jetting pressurized water to the substrate while also spraying water, to which ultrasonic waves have been applied, to the substrate after scrubbing both surfaces of the substrate.
Claim 7
Dependent Claim
31 words
The method according to claim 1, wherein the cleaning solution is sprayed to the substrate through the rotatable scrubbing means to clean the substrate when the scrubbing means is left inoperative.
Claim 8
Dependent Claim
49 words
The method according to claim 1, wherein a rotatable brush having an axis perpendicular to the surface of the substrate is used as said rotatable scrubbing means in scrubbing both surfaces of the substrate, said brush revolving on its own axis and not being moved in a horizontal direction.
Claim 9
Dependent Claim
34 words
The method according to claim 1, wherein said substrate is rectangular having two short sides and is carried such that said two short sides of the substrate are substantially parallel with a carrying direction.
Claim 10
Dependent Claim
25 words
The method according to claim 8, wherein both of said short sides of the substrate are held by arm means when the substrate is carried.
Claim 11
Dependent Claim
23 words
The method according to claim 8, wherein both surfaces of the substrate are held by rotatable roller means when the substrate is carried.
References Cited (Backward Citations)
US3479222A
Cited
US4178188A
Cited
US4109337A
Cited
JPS57130580A
Cited
JPS61249582A
Cited
JPH0329919A
Cited
US5092011A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-05-21 | 1999-11-20 | 2000-05-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-05-21 | 2003-11-20 | 2004-05-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-05-21 | 2007-11-20 | 2008-05-21 | $7700.00 | Window Closed / Lapsed |